Global Patent Index - EP 3465740 A1

EP 3465740 A1 20190410 - METHOD FOR FORMING A FUNCTIONALISED GUIDE PATTERN FOR A GRAPHOEPITAXY METHOD

Title (en)

METHOD FOR FORMING A FUNCTIONALISED GUIDE PATTERN FOR A GRAPHOEPITAXY METHOD

Title (de)

VERFAHREN ZUR HERSTELLUNG EINES FUNKTIONALISIERTEN FÜHRUNGSMUSTERS FÜR EIN GRAPHOEPITAXIEVERFAHREN

Title (fr)

PROCÉDÉ DE FORMATION D'UN MOTIF DE GUIDAGE FONCTIONNALISÉ POUR UN PROCÉDÉ DE GRAPHO-ÉPITAXIE

Publication

EP 3465740 A1 20190410 (FR)

Application

EP 17726601 A 20170523

Priority

  • FR 1654791 A 20160527
  • EP 2017062455 W 20170523

Abstract (en)

[origin: WO2017202860A1] A method for forming a functionalised guide pattern (4) for the self-assembly of a block copolymer by graphoepitaxy, comprising the following steps: forming, on a substrate (1), a guide pattern (4) made of a first material having a first chemical affinity for the block copolymer, the guide pattern (4) having a cavity (7) with a bottom (6) and side walls (5); grafting a functionalisation layer made of a second polymeric material having a second chemical affinity for the block copolymer, the functionalisation layer having a first portion (11) grafted onto the bottom (6) of the cavity (7) and a second portion grafted onto the side walls (5) of the cavity (7); selectively etching the second portion of the functionalisation layer relative to the first portion (11) of the functionalisation layer, said etching comprising a step of exposure to an ion beam following a direction that intersects the second portion of the functionalisation layer, such that the ion beam does not reach the first portion of the functionalisation layer.

IPC 8 full level

H01L 21/033 (2006.01); B81C 1/00 (2006.01); G03F 7/00 (2006.01); H01L 21/311 (2006.01); H01L 21/3115 (2006.01)

CPC (source: EP KR US)

B81C 1/00031 (2013.01 - EP KR); G03F 7/0002 (2013.01 - EP KR US); G03F 7/0035 (2013.01 - US); G03F 7/0041 (2013.01 - US); G03F 7/0048 (2013.01 - US); G03F 7/0752 (2013.01 - US); G03F 7/11 (2013.01 - US); H01L 21/0337 (2013.01 - EP KR US); H01L 21/31105 (2013.01 - EP US); H01L 21/31111 (2013.01 - EP US); H01L 21/31116 (2013.01 - EP KR US); H01L 21/31127 (2013.01 - EP US); H01L 21/31133 (2013.01 - EP KR US); H01L 21/31155 (2013.01 - KR); B81C 1/00031 (2013.01 - US); H01L 21/31155 (2013.01 - EP US)

Citation (search report)

See references of WO 2017202860A1

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

WO 2017202860 A1 20171130; EP 3465740 A1 20190410; FR 3051965 A1 20171201; JP 2019519106 A 20190704; KR 20190013808 A 20190211; US 10795257 B2 20201006; US 2019278171 A1 20190912

DOCDB simple family (application)

EP 2017062455 W 20170523; EP 17726601 A 20170523; FR 1654791 A 20160527; JP 2018562093 A 20170523; KR 20187035305 A 20170523; US 201716304933 A 20170523