Global Patent Index - EP 3509089 A4

EP 3509089 A4 20200506 - METHOD FOR CLEANING SEMICONDUCTOR PRODUCTION CHAMBER

Title (en)

METHOD FOR CLEANING SEMICONDUCTOR PRODUCTION CHAMBER

Title (de)

VERFAHREN ZUR REINIGUNG EINER HALBLEITERHERSTELLUNGSKAMMER

Title (fr)

PROCÉDÉ DE NETTOYAGE DE CHAMBRE DE PRODUCTION DE SEMI-CONDUCTEUR

Publication

EP 3509089 A4 20200506 (EN)

Application

EP 17846451 A 20170829

Priority

  • JP 2016169562 A 20160831
  • JP 2017030835 W 20170829

Abstract (en)

[origin: EP3509089A1] A method for effectively removing fluorine atoms remaining in a semiconductor fabrication chamber after cleaning the chamber with chlorine trifluoride is provided. The method includes exposing the inside of the chamber after semiconductor fabrication to chlorine trifluoride to remove an object to be removed remaining in the chamber and then thermally treating the inside of the chamber with at least one gas selected from the group consisting of nitrogen, argon, helium, and hydrogen. It is preferred that the exposure to chlorine trifluoride is carried out while monitoring the chamber inside temperature and that the chlorine trifluoride feed is ceased when the inside temperature decreases to a predetermined temperature.

IPC 8 full level

H01L 21/31 (2006.01); C23C 16/32 (2006.01); C23C 16/44 (2006.01); H01L 21/02 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01)

CPC (source: EP KR US)

B08B 5/00 (2013.01 - US); B08B 9/032 (2013.01 - US); B08B 9/08 (2013.01 - US); B08B 13/00 (2013.01 - US); C23C 16/325 (2013.01 - EP US); C23C 16/4405 (2013.01 - EP US); C23C 16/4412 (2013.01 - EP US); C23C 16/46 (2013.01 - US); H01L 21/02041 (2013.01 - KR); H01L 21/67028 (2013.01 - KR); H01L 21/67098 (2013.01 - KR); H01L 21/67248 (2013.01 - KR); B08B 2209/032 (2013.01 - US); B08B 2209/08 (2013.01 - US); H01L 29/1608 (2013.01 - US)

Citation (search report)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DOCDB simple family (publication)

EP 3509089 A1 20190710; EP 3509089 A4 20200506; CN 109478510 A 20190315; JP WO2018043446 A1 20190725; KR 20190042553 A 20190424; TW 201812091 A 20180401; US 2021285100 A1 20210916; WO 2018043446 A1 20180308

DOCDB simple family (application)

EP 17846451 A 20170829; CN 201780043539 A 20170829; JP 2017030835 W 20170829; JP 2018537281 A 20170829; KR 20197002778 A 20170829; TW 106129473 A 20170830; US 201716323383 A 20170829