EP 3559302 A1 20191030 - LINEAR SOURCE FOR VAPOR DEPOSITION WITH HEAT SHIELDS
Title (en)
LINEAR SOURCE FOR VAPOR DEPOSITION WITH HEAT SHIELDS
Title (de)
LINEAREQUELLE ZUR AUFDAMPFUNG MIT HITZESCHILDEN
Title (fr)
SOURCE LINÉAIRE DESTINÉE AU DÉPÔT EN PHASE VAPEUR ÉQUIPÉE D'ÉCRANS THERMIQUES
Publication
Application
Priority
- EP 16206181 A 20161222
- EP 2017081926 W 20171207
Abstract (en)
[origin: WO2018114378A1] A long high-temperature high-output linear evaporation source apparatus (200) for atomic vapor deposition of metal atoms suited for the production of CIGS thin films, comprising at least one elongated horizontal crucible (50) for containing, up to a given level in the crucible (50), material (55) to be melted and evaporated, comprising a heater assembly (100) and at least a nozzle (65), comprising at least one heat shield assembly (80, 90) that at least partially surrounds the crucible (50) and comprises at least one shielding layer (83, 93) made of graphite or carbon foam or felt, so as to reduce radiation of heat away from the linear evaporation source (200). This enables to achieve a more even spatial distribution of the deposited material with less energy expense and the possibility to regulate an evaporation profile.
IPC 8 full level
C23C 14/24 (2006.01); C23C 14/26 (2006.01)
CPC (source: EP)
C23C 14/243 (2013.01); C23C 14/26 (2013.01)
Citation (search report)
See references of WO 2018114378A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
DOCDB simple family (application)
EP 2017081926 W 20171207; EP 17811303 A 20171207