EP 3569730 A4 20201111 - VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK DEVICE, AND METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
Title (en)
VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK DEVICE, AND METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
Title (de)
DAMPFABSCHEIDUNGSMASKE, VERFAHREN ZUR HERSTELLUNG EINER DAMPFABSCHEIDUNGSMASKENVORRICHTUNG UND VERFAHREN ZUR HERSTELLUNG EINER DAMPFABSCHEIDUNGSMASKE
Title (fr)
MASQUE DE DÉPÔT EN PHASE VAPEUR, PROCÉDÉ DE FABRICATION DE DISPOSITIF DE MASQUE DE DÉPÔT EN PHASE VAPEUR ET PROCÉDÉ DE FABRICATION DE MASQUE DE DÉPÔT EN PHASE VAPEUR
Publication
Application
Priority
- JP 2017002157 A 20170110
- JP 2017238092 A 20171212
- JP 2017046751 W 20171226
Abstract (en)
[origin: JP2018111880A] PROBLEM TO BE SOLVED: To provide a vapor deposition mask which allows improved positional accuracy of a through hole in extending.SOLUTION: When a dimension from a point P1 to a point Q1 is represented as X1, a dimension from a point P2 to a point Q2 is represented as X2, and a predetermined value is represented as α, a vapor deposition mask 20 satisfies following equations.SELECTED DRAWING: Figure 9
IPC 8 full level
C23C 14/04 (2006.01); C23C 14/12 (2006.01); C23C 14/24 (2006.01); C23F 1/02 (2006.01); G03F 7/12 (2006.01); H01L 51/00 (2006.01); H01L 51/50 (2006.01); H05B 33/10 (2006.01)
CPC (source: CN EP KR US)
C23C 14/042 (2013.01 - CN EP KR US); C23C 14/12 (2013.01 - EP KR US); C23C 14/24 (2013.01 - CN EP US); C23F 1/02 (2013.01 - EP US); H05B 33/10 (2013.01 - EP); H10K 71/00 (2023.02 - US); H10K 71/164 (2023.02 - US); H10K 71/166 (2023.02 - CN EP KR US); G03F 7/12 (2013.01 - EP)
Citation (search report)
- [XI] JP 2014148743 A 20140821 - DAINIPPON PRINTING CO LTD
- [XI] US 2016237546 A1 20160818 - IKENAGA CHIKAO [JP], et al
- [XI] EP 1426461 A1 20040609 - SAMSUNG NEC MOBILE DISPLAY CO [KR]
- See also references of WO 2018131474A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
US 10991883 B2 20210427; US 2019140178 A1 20190509; CN 208501081 U 20190215; EP 3569730 A1 20191120; EP 3569730 A4 20201111; EP 3569730 B1 20240508; JP 2018111880 A 20180719; JP 2018172799 A 20181108; JP 2019031743 A 20190228; JP 2023099833 A 20230713; JP 6376483 B2 20180822; JP 6424979 B2 20181121; JP 7288594 B2 20230608; KR 102172009 B1 20201030; KR 20180126563 A 20181127; TW 201839504 A 20181101; TW I706218 B 20201001
DOCDB simple family (application)
US 201716096480 A 20171226; CN 201820024716 U 20180108; EP 17891878 A 20171226; JP 2017238092 A 20171212; JP 2018138764 A 20180724; JP 2018192919 A 20181011; JP 2023087262 A 20230526; KR 20187031082 A 20171226; TW 106145886 A 20171227