EP 3612608 A4 20210120 - SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANARIZATION
Title (en)
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANARIZATION
Title (de)
SELBSTSTOPPENDE POLIERZUSAMMENSETZUNG UND VERFAHREN ZUR OXIDMASSENPLANARISIERUNG
Title (fr)
COMPOSITION DE POLISSAGE À AUTO-ARRÊT ET PROCÉDÉ DE PLANARISATION D'OXYDE EN MASSE
Publication
Application
Priority
- US 201762486219 P 20170417
- US 2018024067 W 20180323
Abstract (en)
[origin: WO2018194792A1] The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
IPC 8 full level
C09G 1/02 (2006.01); C09G 1/04 (2006.01); C09K 3/14 (2006.01); H01L 21/3105 (2006.01)
CPC (source: CN EP KR)
C09G 1/02 (2013.01 - CN EP KR); C09G 1/04 (2013.01 - CN KR); C09K 3/1409 (2013.01 - CN KR); C09K 3/1463 (2013.01 - EP KR); H01L 21/30625 (2013.01 - KR); H01L 21/31053 (2013.01 - EP); H01L 21/31055 (2013.01 - CN)
Citation (search report)
- [X] WO 2017011451 A1 20170119 - CABOT MICROELECTRONICS CORP [US]
- [X] KR 20140085265 A 20140707 - CHEIL IND INC [KR]
- See also references of WO 2018194792A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2018194792 A1 20181025; CN 110520493 A 20191129; CN 110520493 B 20221122; CN 113637412 A 20211112; EP 3612608 A1 20200226; EP 3612608 A4 20210120; JP 2020517117 A 20200611; JP 7132942 B2 20220907; KR 102671229 B1 20240603; KR 20190132537 A 20191127; TW 201839077 A 20181101; TW I663231 B 20190621
DOCDB simple family (application)
US 2018024067 W 20180323; CN 201880025600 A 20180323; CN 202110855832 A 20180323; EP 18788475 A 20180323; JP 2019556638 A 20180323; KR 20197033492 A 20180323; TW 107110067 A 20180323