Global Patent Index - EP 3666928 B1

EP 3666928 B1 20240221 - PROCESS OF FABRICATING A METAL BAND HAVING A CHROMIUM AND CHROMIUM OXIDE COATING USING A TRIVALENT CHROMIUM CONTAINING ELECTROLYTE

Title (en)

PROCESS OF FABRICATING A METAL BAND HAVING A CHROMIUM AND CHROMIUM OXIDE COATING USING A TRIVALENT CHROMIUM CONTAINING ELECTROLYTE

Title (de)

VERFAHREN ZUR HERSTELLUNG EINES MIT EINER BESCHICHTUNG AUS CHROM UND CHROMOXID BESCHICHTETEN METALLBANDS AUF BASIS EINER ELEKTROLYTLÖSUNG MIT EINER DREIWERTIGEN CHROMVERBINDUNG

Title (fr)

PROCÉDÉ DE FABRICATION D'UNE BANDE MÉTALLIQUE AYANT UN REVÊTEMENT DE CHROME ET D'OXYDE DE CHROME AVEC UN ÉLECTROLYTE À BASE DE CHROMIUM TRIVALENT

Publication

EP 3666928 B1 20240221 (DE)

Application

EP 19206952 A 20191104

Priority

DE 102018132074 A 20181213

Abstract (en)

[origin: CA3063790A1] The present invention relates to a method for the production of a metal strip (M) coated with a coating (B), said coating (B) containing chromium metal and chromium oxide and being electrolytically deposited from an electrolyte solution (E) that contains a trivalent chromium compound onto the metal strip (M) by bringing the metal strip (M), which is connected as the cathode, into contact with the electrolyte solution (E). An effective deposition of the coating with a high chromium oxide portion is achieved by successively passing the metal strip (M) at a predefined strip travel speed (v) through a plurality of electrolysis tanks (1a to 1h) arranged successively in a strip travel direction, wherein the first electrolysis tank (1a), as viewed in the strip travel direction, or in a front group of electrolysis tanks (1a, 1b), is set to a low current density (j1); a second electrolysis tank (1c), which follows in the strip travel direction, or a middle group of electrolysis tanks (1c-1f), is set to a medium current density (j2); and a last electrolysis tank (1h), as viewed in the strip travel direction, or a rear group of electrolysis tanks (1g, 1h), is set to a high current density (j3), where j1 <= 12 <13 and the low current density (j1) is greater than 20 A/dm2.

IPC 8 full level

C25D 3/06 (2006.01); C25D 7/06 (2006.01); C25D 9/10 (2006.01); C25D 17/00 (2006.01)

CPC (source: BR CN EP KR US)

C25D 3/06 (2013.01 - BR CN EP KR US); C25D 7/0614 (2013.01 - US); C25D 7/0628 (2013.01 - EP KR); C25D 9/10 (2013.01 - EP); C25D 17/00 (2013.01 - EP); C25D 17/02 (2013.01 - US); C25D 21/02 (2013.01 - CN KR); C25D 21/12 (2013.01 - CN KR); C25D 21/02 (2013.01 - BR); C25D 21/10 (2013.01 - BR); C25D 21/12 (2013.01 - BR)

Citation (examination)

EP 3728701 A1 20201028 - TATA STEEL IJMUIDEN BV [NL]

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DOCDB simple family (publication)

EP 3666928 A1 20200617; EP 3666928 B1 20240221; BR 102019025861 A2 20200623; CA 3063790 A1 20200613; CA 3063790 C 20220927; CN 111321432 A 20200623; CN 111321432 B 20220610; DE 102018132074 A1 20200618; ES 2975322 T3 20240704; JP 2020109204 A 20200716; JP 6949095 B2 20211013; KR 102268790 B1 20210628; KR 20200074030 A 20200624; US 11396713 B2 20220726; US 2020190684 A1 20200618

DOCDB simple family (application)

EP 19206952 A 20191104; BR 102019025861 A 20191206; CA 3063790 A 20191205; CN 201911284086 A 20191213; DE 102018132074 A 20181213; ES 19206952 T 20191104; JP 2019221834 A 20191209; KR 20190165573 A 20191212; US 201916711703 A 20191212