EP 3667419 A1 20200617 - RADIATION SENSITIVE COMPOSITION AND RESIST PATTERN FORMING METHOD
Title (en)
RADIATION SENSITIVE COMPOSITION AND RESIST PATTERN FORMING METHOD
Title (de)
STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG UND VERFAHREN ZUR AUSBILDUNG VON RESISTSTRUKTUREN
Title (fr)
COMPOSITION SENSIBLE AU RAYONNEMENT, ET PROCÉDÉ DE FORMATION DE MOTIF DE RÉSERVE
Publication
Application
Priority
- JP 2017156126 A 20170810
- JP 2018027972 W 20180725
Abstract (en)
Provided is a radiation-sensitive composition superior in sensitivity and resolution, and a resist pattern-forming method. The radiation-sensitive composition contains: a polymetalloxane having a structural unit represented by the following formula (1); a radiation-sensitive acid generator; and a solvent. In the following formula (1), M represents a germanium atom, a tin atom or a lead atom; Ar<sup>1</sup>represents a substituted or unsubstituted aryl group having 6 to 20 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms; R<sup>1</sup>represents a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group; and n is 2 or 3.
IPC 8 full level
G03F 7/038 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01)
CPC (source: EP KR US)
C08G 79/00 (2013.01 - US); C08G 79/12 (2013.01 - US); G03F 7/0042 (2013.01 - EP); G03F 7/0043 (2013.01 - EP); G03F 7/0045 (2013.01 - EP KR US); G03F 7/038 (2013.01 - US); G03F 7/0382 (2013.01 - EP); G03F 7/0757 (2013.01 - KR); G03F 7/162 (2013.01 - US); G03F 7/168 (2013.01 - US); G03F 7/2002 (2013.01 - US); G03F 7/2012 (2013.01 - KR); G03F 7/26 (2013.01 - KR); G03F 7/30 (2013.01 - US); G03F 7/38 (2013.01 - US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
EP 3667419 A1 20200617; EP 3667419 A4 20210512; JP WO2019031250 A1 20200702; KR 20200039665 A 20200416; TW 201910391 A 20190316; US 11506976 B2 20221122; US 2020166840 A1 20200528; WO 2019031250 A1 20190214
DOCDB simple family (application)
EP 18845007 A 20180725; JP 2018027972 W 20180725; JP 2019535092 A 20180725; KR 20207002443 A 20180725; TW 107127459 A 20180807; US 202016778166 A 20200131