Global Patent Index - EP 3734363 A1

EP 3734363 A1 20201104 - DETERMINING A MARK LAYOUT ACROSS A PATTERNING DEVICE OR SUBSTRATE

Title (en)

DETERMINING A MARK LAYOUT ACROSS A PATTERNING DEVICE OR SUBSTRATE

Title (de)

BESTIMMUNG EINES LAYOUTS VON MARKIERUNGEN AUF EINER STRUKTURIERUNGSVORRICHTUNG ODER EINEM SUBSTRAT

Title (fr)

DÉTERMINATION D'UN AGENCEMENT DE MARQUES SUR UN DISPOSITIF DE STRUCTURATION OU SUR UN SUBSTRAT

Publication

EP 3734363 A1 20201104 (EN)

Application

EP 19171485 A 20190429

Priority

EP 19171485 A 20190429

Abstract (en)

A method for determining a layout of mark positions across a patterning device or substrate, the method comprising: a) obtaining 502 a model configured to model data associated with measurements performed on the patterning device or substrate at one or more mark positions; b) obtaining 504 an initial mark layout 506 comprising initial mark positions; c) reducing 508 the initial mark layout by removal of one or more mark positions to obtain a plurality of reduced mark layouts 510, each reduced mark layout obtained by removal of a different mark position from the initial mark layout; d) determining 512 a model uncertainty metric associated with usage of the model for each reduced mark layout out of said plurality of reduced mark layouts; and e) selecting 514 one or more reduced mark layouts 516 based on its associated model uncertainty metric.

IPC 8 full level

G03F 7/20 (2006.01); G03F 9/00 (2006.01)

CPC (source: EP)

G03F 7/70616 (2013.01); G03F 9/7046 (2013.01)

Citation (applicant)

Citation (search report)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

EP 3734363 A1 20201104

DOCDB simple family (application)

EP 19171485 A 20190429