Global Patent Index - EP 3774368 A1

EP 3774368 A1 20210217 - METHOD AND DEVICE FOR FORMING A MATERIAL PATTERN

Title (en)

METHOD AND DEVICE FOR FORMING A MATERIAL PATTERN

Title (de)

VERFAHREN UND VORRICHTUNG ZUR HERSTELLUNG EINES MATERIALMUSTERS

Title (fr)

MÉTHODE ET DISPOSITIF POUR FORMER UN MOTIF DE MATIÈRE

Publication

EP 3774368 A1 20210217 (FR)

Application

EP 19712780 A 20190326

Priority

  • BE 201805210 A 20180328
  • EP 18164492 A 20180328
  • EP 2019057583 W 20190326

Abstract (en)

[origin: WO2019185626A1] The invention concerns a method and a device (3) for depositing a material pattern (61c) from a support (10) onto a substrate part (60). The deposition (202) of the material forming the pattern (61c) is preceded by a prior ejection that ejects material that is adjacent, on the support (10), to the material intended to form the pattern (61c).

IPC 8 full level

B41M 1/12 (2006.01); B29C 64/141 (2017.01); B29C 64/205 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B41M 3/00 (2006.01); B41M 5/025 (2006.01)

CPC (source: EP US)

B22F 3/004 (2013.01 - EP); B22F 10/18 (2021.01 - EP US); B22F 10/47 (2021.01 - EP US); B22F 12/55 (2021.01 - EP US); B29C 64/112 (2017.07 - EP); B29C 64/209 (2017.07 - EP); B33Y 10/00 (2014.12 - EP US); B33Y 30/00 (2014.12 - EP); Y02P 10/25 (2015.11 - EP)

Citation (search report)

See references of WO 2019185626A1

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

WO 2019185626 A1 20191003; EP 3774368 A1 20210217

DOCDB simple family (application)

EP 2019057583 W 20190326; EP 19712780 A 20190326