EP 3849284 A1 20210714 - PLASMA DISCHARGE APPARATUS AND METHOD OF USING THE SAME
Title (en)
PLASMA DISCHARGE APPARATUS AND METHOD OF USING THE SAME
Title (de)
PLASMAENTLADUNGSVORRICHTUNG UND VERFAHREN ZUR VERWENDUNG DAVON
Title (fr)
APPAREIL À DÉCHARGE DE PLASMA ET SON PROCÉDÉ D'UTILISATION
Publication
Application
Priority
EP 20151015 A 20200109
Abstract (en)
The present invention relates to a plasma discharge apparatus comprising a first electrode structure comprising a plurality of trigger points; a second electrode structure; and a voltage source connected to the first and/or second electrode structures, the voltage source being configured to create a potential difference between the first and second electrode structures such that at least one electrical discharge occurs in a discharge region, wherein each electrical discharge has a discharge path with a first end contacting the first electrode structure and a second end contacting the second electrode structure. The apparatus further comprises a means for exerting force on the at least one electrical discharge, the means being configured to compel the first end of the discharge path to move along the first electrode structure. Each trigger point is a portion of the first electrode structure which has a smaller gap distance to the second electrode structure than adjacent portions of the first electrode structure, such that the at least one electrical discharge is initiated at one of the plurality of trigger points.
IPC 8 full level
H05H 1/48 (2006.01); B01D 53/32 (2006.01); H05H 1/50 (2006.01)
CPC (source: EP)
H05H 1/48 (2013.01); H05H 1/50 (2013.01); F01N 2240/28 (2013.01)
Citation (applicant)
WO 2017021194 A1 20170209 - TERRAPLASMA GMBH [DE]
Citation (search report)
- [XI] US 2012285146 A1 20121115 - IKEDA YUJI [JP], et al
- [X] US 2017298799 A1 20171019 - NARAYANASWAMY KUSHAL [US], et al
- [X] GB 2550176 A 20171115 - ANIL PATEL [GB], et al
- [XI] JP H1193644 A 19990406 - NILES PARTS CO LTD
- [XI] JP 2004089753 A 20040325 - AISIN SEIKI
- [A] US 2016040567 A1 20160211 - VORSMANN CHRISTIAN [DE], et al
- [A] US 8617350 B2 20131231 - SHANG QUANYUAN T [US]
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
DOCDB simple family (application)
EP 20151015 A 20200109