Global Patent Index - EP 3869535 A1

EP 3869535 A1 20210825 - CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

Title (en)

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

Title (de)

BEURTEILUNGSWERKZEUG FÜR GELADENE PARTIKEL, INSPEKTIONSVERFAHREN

Title (fr)

OUTIL D'ÉVALUATION DE PARTICULES CHARGÉES, PROCÉDÉ D'INSPECTION

Publication

EP 3869535 A1 20210825 (EN)

Application

EP 20158804 A 20200221

Priority

EP 20158804 A 20200221

Abstract (en)

A charged-particle assessment tool comprising: a condenser lens array, a collimator, a plurality of objective lenses and an electric power source. The condenser lens array configured to divide a beam of charged particles into a plurality of sub-beams and to focus each of the sub-beams to a respective intermediate focus. The collimator being at each intermediate focus and configured to deflect a respective sub-beam so that it is incident on the sample substantially normally. The plurality of objective lenses, each configured to project one of the plurality of charged-particle beams onto a sample. Each objective lens comprises: a first electrode; and a second electrode that is between the first electrode and the sample. The electric power source configured to apply first and second potentials to the first and second electrodes respectively such that the respective charged-particle beam is decelerated to be incident on the sample with a desired landing energy.

IPC 8 full level

H01J 37/28 (2006.01); H01J 37/12 (2006.01)

CPC (source: EP)

H01J 37/12 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/04756 (2013.01); H01J 2237/04924 (2013.01); H01J 2237/2817 (2013.01)

Citation (applicant)

Citation (search report)

  • [XY] US 2014014852 A1 20140116 - WIELAND MARCO JAN JACO [NL], et al
  • [Y] VAN HIMBERGEN H ET AL: "High throughput defect detection with multiple parallel electron beams", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, vol. 25, no. 6, 11 December 2007 (2007-12-11), pages 2521 - 2525, XP012105514, ISSN: 1071-1023, DOI: 10.1116/1.2789449
  • [A] ZHANG Y ET AL: "Design of a high brightness multi-electron-beam source", PHYSICS PROCEDIA, ELSEVIER, AMSTERDAM, NL, vol. 1, no. 1, 1 August 2008 (2008-08-01), pages 553 - 563, XP025818228, ISSN: 1875-3892, [retrieved on 20080801], DOI: 10.1016/J.PHPRO.2008.07.138

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

EP 3869535 A1 20210825

DOCDB simple family (application)

EP 20158804 A 20200221