EP 3872236 A1 20210901 - DISTRIBUTION SYSTEM FOR A PROCESS FLUID FOR CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT OF A SUBSTRATE
Title (en)
DISTRIBUTION SYSTEM FOR A PROCESS FLUID FOR CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT OF A SUBSTRATE
Title (de)
VERTEILUNGSSYSTEM FÜR EINE PROZESSFLÜSSIGKEIT ZUR CHEMISCHEN UND/ODER ELEKTROLYTISCHEN OBERFLÄCHENBEHANDLUNG EINES SUBSTRATS
Title (fr)
SYSTÈME DE DISTRIBUTION D'UN FLUIDE DE TRAITEMENT POUR TRAITEMENT DE SURFACE CHIMIQUE ET/OU ÉLECTROLYTIQUE D'UN SUBSTRAT
Publication
Application
Priority
EP 20160190 A 20200228
Abstract (en)
The invention relates to a distribution system for a process fluid for chemical and/or electrolytic surface treatment of a substrate, a distribution method for a process fluid for chemical and/or electrolytic surface treatment of a substrate and a data processing device.The distribution system for a process fluid for chemical and/or electrolytic surface treatment of a substrate comprises a distribution body and a shield element. The distribution body comprises a plurality of openings for the process fluid. The shield element is configured to at least partially cover at least one of the plurality of openings to limit a flow of the process fluid through the distribution body.
IPC 8 full level
C25D 5/08 (2006.01); C25D 17/00 (2006.01); C25D 21/12 (2006.01)
CPC (source: EP KR US)
C23C 18/1628 (2013.01 - KR); C25D 5/08 (2013.01 - EP KR US); C25D 17/008 (2013.01 - EP KR US); C25D 21/12 (2013.01 - EP KR US)
Citation (applicant)
DE 102010033256 A1 20120202 - FRAUNHOFER GES FORSCHUNG [DE]
Citation (search report)
- [XYI] US 2002179450 A1 20021205 - BARRESE RALPH A [US], et al
- [XYI] US 2017051424 A1 20170223 - FUJISAKI ATSUSHI [KR], et al
- [X] CN 203034115 U 20130703 - PAT INDUSTRY CO LTD
- [XI] KR 101693217 B1 20170105
- [Y] DD 248816 A1 19870819 - UNIV DRESDEN TECH [DD]
- [A] GB 2570268 A 20190724 - SEMSYSCO GMBH [AT]
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
EP 3872236 A1 20210901; EP 3872236 B1 20220216; CN 115244223 A 20221025; CN 115244223 B 20230407; EP 4107312 A1 20221228; JP 2023505619 A 20230209; KR 102553009 B1 20230706; KR 20220118558 A 20220825; PL 3872236 T3 20220613; PT 3872236 T 20220330; TW 202233903 A 20220901; US 2023075605 A1 20230309; WO 2021170851 A1 20210902
DOCDB simple family (application)
EP 20160190 A 20200228; CN 202180016728 A 20210226; EP 2021054934 W 20210226; EP 21707297 A 20210226; JP 2022551800 A 20210226; KR 20227027963 A 20210226; PL 20160190 T 20200228; PT 20160190 T 20200228; TW 110115822 A 20210430; US 202117800287 A 20210226