EP 3874497 A4 20220720 - PLASMA NITRIDING WITH PECVD COATINGS USING HOLLOW CATHODE ION IMMERSION TECHNOLOGY
Title (en)
PLASMA NITRIDING WITH PECVD COATINGS USING HOLLOW CATHODE ION IMMERSION TECHNOLOGY
Title (de)
PLASMA-NITRIERUNG MIT PECVD-BESCHICHTUNGEN UNTER VERWENDUNG EINER HOHLKATHODEN-IONEN-TAUCHTECHNOLOGIE
Title (fr)
NITRURATION PAR PLASMA AVEC DES REVÊTEMENTS PECVD À L'AIDE D'UNE TECHNOLOGIE D'IMMERSION D'IONS À CATHODE CREUSE
Publication
Application
Priority
- US 201862754457 P 20181101
- US 201916499669 A 20190930
- US 2019059511 W 20191101
Abstract (en)
[origin: WO2020092988A1] Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.
IPC 8 full level
G11B 5/48 (2006.01); H01J 37/32 (2006.01)
CPC (source: EP)
C21D 1/06 (2013.01); C21D 1/74 (2013.01); C21D 9/0043 (2013.01); C23C 8/02 (2013.01); C23C 8/36 (2013.01); C23C 16/02 (2013.01); C23C 16/0245 (2013.01); C23C 16/0272 (2013.01); C23C 16/0281 (2013.01); C23C 16/045 (2013.01); C23C 16/26 (2013.01); C23C 28/046 (2013.01); H01J 37/32027 (2013.01); H01J 37/3244 (2013.01); H01J 37/32596 (2013.01); H01J 37/32706 (2013.01)
Citation (search report)
- [XY] WO 2018184023 A1 20181004 - DURALAR TECH LLC [US]
- [Y] CN 105839046 B 20180622
- [Y] WO 2008011552 A2 20080124 - SUB ONE TECHNOLOGY INC [US], et al
- [A] US 2006196419 A1 20060907 - TUDHOPE ANDREW W [US], et al
- [Y] D. LUSK ET AL: "Thick DLC films deposited by PECVD on the internal surface of cylindrical substrates", DIAMOND AND RELATED MATERIALS, vol. 17, no. 7-10, 26 January 2008 (2008-01-26), pages 1613 - 1621, XP055007021, ISSN: 0925-9635, DOI: 10.1016/j.diamond.2008.01.051
- See references of WO 2020092988A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2020092988 A1 20200507; EP 3874497 A1 20210908; EP 3874497 A4 20220720
DOCDB simple family (application)
US 2019059511 W 20191101; EP 19877691 A 20191101