Global Patent Index - EP 3927802 A1

EP 3927802 A1 20211229 - COMPOSITION FOR REMOVING CHEMICAL RESIDUES, AND USES THEREOF

Title (en)

COMPOSITION FOR REMOVING CHEMICAL RESIDUES, AND USES THEREOF

Title (de)

ZUSAMMENSETZUNG ZUR ENTFERNUNG VON CHEMISCHEN RÜCKSTÄNDEN UND DEREN VERWENDUNGEN

Title (fr)

COMPOSITION POUR ENLEVER DES RESIDUS CHIMIQUES ET SES UTILISATIONS

Publication

EP 3927802 A1 20211229 (FR)

Application

EP 20710260 A 20200220

Priority

  • FR 1901804 A 20190222
  • FR 2020050319 W 20200220

Abstract (en)

[origin: WO2020169931A1] The invention relates to a composition for removing chemical residues, a process for producing said composition, and the use of said composition for removing residues from material, machines and equipment soiled by any type of chemical product.

IPC 8 full level

C11D 7/10 (2006.01); C11D 7/32 (2006.01); C11D 11/00 (2006.01)

CPC (source: EP US)

C11D 7/10 (2013.01 - EP); C11D 7/3245 (2013.01 - EP US); C11D 2111/20 (2024.01 - EP US)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

WO 2020169931 A1 20200827; AU 2020225431 A1 20210916; BR 112021016547 A2 20211026; CA 3130617 A1 20200827; CL 2021002171 A1 20220211; CN 113454198 A 20210928; EP 3927802 A1 20211229; FR 3093001 A1 20200828; FR 3093001 B1 20220610; MX 2021010147 A 20210914; US 2022186154 A1 20220616

DOCDB simple family (application)

FR 2020050319 W 20200220; AU 2020225431 A 20200220; BR 112021016547 A 20200220; CA 3130617 A 20200220; CL 2021002171 A 20210816; CN 202080015793 A 20200220; EP 20710260 A 20200220; FR 1901804 A 20190222; MX 2021010147 A 20200220; US 202017432209 A 20200220