EP 3947405 A1 20220209 - METAL COMPLEXES FOR GAS-PHASE THIN-FILM DEPOSITION
Title (en)
METAL COMPLEXES FOR GAS-PHASE THIN-FILM DEPOSITION
Title (de)
METALLKOMPLEXE FÜR GASPHASEN-DÜNNSCHICHTABSCHEIDUNG
Title (fr)
COMPLEXES MÉTALLIQUES POUR DÉPÔT DE COUCHE MINCE EN PHASE GAZEUSE
Publication
Application
Priority
- EP 19165935 A 20190328
- EP 2020058865 W 20200327
Abstract (en)
[origin: WO2020193794A1] The invention relates to metal complexes of formula (I): [M(L1)x(L2)y(hydra)z]n formula (I) wherein: M = metal atom of an atomic number selected from the ranges a) to c): a) 12, 21 to 34, with the exception of 30, b) 39 to 52, with the exception of 48, c) 71 to 83, with the exception of 80, L1 = neutral or anionic ligand, with x = 0 or 1, L2 = neutral or anionic ligand, with y = 0 or 1, (hydra) = acetone dimethylhydrazone monoanion, with z = 1, 2 or 3, n = 1 or 2, and the total charge of the complex is 0.
IPC 8 full level
C07F 5/00 (2006.01); C07F 17/02 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01)
CPC (source: EP KR US)
C07F 5/00 (2013.01 - EP KR); C07F 15/0033 (2013.01 - US); C07F 15/0046 (2013.01 - KR US); C07F 17/02 (2013.01 - EP KR); C23C 16/18 (2013.01 - EP KR US); C23C 16/45553 (2013.01 - EP KR US)
Citation (search report)
See references of WO 2020193794A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
EP 3715351 A1 20200930; CN 113631561 A 20211109; EP 3947405 A1 20220209; JP 2022526145 A 20220523; KR 20210144779 A 20211130; TW 202102515 A 20210116; US 2022153768 A1 20220519; WO 2020193794 A1 20201001
DOCDB simple family (application)
EP 19165935 A 20190328; CN 202080024863 A 20200327; EP 2020058865 W 20200327; EP 20713663 A 20200327; JP 2021556803 A 20200327; KR 20217033923 A 20200327; TW 109108962 A 20200318; US 202017599126 A 20200327