EP 3976533 A1 20220406 - PROCESS FOR PRODUCING TRICHLOROSILANE WITH STRUCTURE-OPTIMISED SILICON PARTICLES
Title (en)
PROCESS FOR PRODUCING TRICHLOROSILANE WITH STRUCTURE-OPTIMISED SILICON PARTICLES
Title (de)
VERFAHREN ZUR HERSTELLUNG VON TRICHLORSILAN MIT STRUKTUROPTIMIERTEN SILICIUM-PARTIKELN
Title (fr)
PROCÉDÉ DE PRODUCTION DE TRICHLOROSILANE COMPRENANT DES PARTICULES DE SILICIUM À STRUCTURE OPTIMISÉE
Publication
Application
Priority
EP 2019064116 W 20190529
Abstract (en)
[origin: WO2020239228A1] The invention provides a process for producing chlorosilanes which are selected from the general formula (1): HnSiCl4-n and (2): HmCl6-mSi2, in which n denotes values from 0 to 3 and m denotes values from 0 to 4, in a fluidized bed reactor in which a reaction gas comprising hydrogen chloride is reacted using a particulate catalyst material comprising silicon, at temperatures from 280 to 400 °C, wherein the working granulate, denoting the granules or granular mixture introduced into the fluidized bed reactor, comprises 1 mass % of particles S comprising silicon, said particles being described by a structural parameter S, with S having a value of at least 0 and being calculated as follows: equation (1), where φS is the symmetry-weighted sphericity factor, ρSD is the bulk density [g/cm3], and ρF is the mean particulate solids density [g/cm3].
IPC 8 full level
C01B 33/107 (2006.01)
CPC (source: EP KR US)
C01B 33/10742 (2013.01 - EP KR); C01B 33/10763 (2013.01 - EP KR US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2020239228 A1 20201203; CN 113905983 A 20220107; EP 3976533 A1 20220406; JP 2022534930 A 20220804; JP 2024028751 A 20240305; KR 20220013417 A 20220204; TW 202043148 A 20201201; TW I744873 B 20211101; US 2022234901 A1 20220728
DOCDB simple family (application)
EP 2019064116 W 20190529; CN 201980096907 A 20190529; EP 19728926 A 20190529; JP 2021570379 A 20190529; JP 2023199272 A 20231124; KR 20217043171 A 20190529; TW 109113713 A 20200424; US 201917614958 A 20190529