EP 4006198 A4 20231018 - SPUTTERING TARGET
Title (en)
SPUTTERING TARGET
Title (de)
SPUTTER-TARGET
Title (fr)
CIBLE DE PULVÉRISATION
Publication
Application
Priority
- JP 2019141696 A 20190731
- JP 2019213592 A 20191126
- JP 2019237867 A 20191227
- JP 2019237870 A 20191227
- JP 2020052166 A 20200324
- JP 2020105160 A 20200618
- JP 2020105165 A 20200618
- JP 2020105166 A 20200618
- JP 2020025277 W 20200626
Abstract (en)
[origin: EP4006196A1] An object of the present disclosure is to provide a sputtering target in which contamination of the sputtering target with a fluorine element as an impurity is suppressed and occurrence of abnormal discharge due to fluorine is suppressed in forming a thin film using the sputtering target to form a thin film having good orientation. The sputtering target according to the present disclosure is a sputtering target including aluminum and either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, and the sputtering target has a fluorine content of 100 ppm or less.
IPC 8 full level
B22F 3/10 (2006.01); C22C 1/04 (2023.01); C22C 1/047 (2023.01); C22C 21/00 (2006.01); C22C 30/00 (2006.01); C23C 14/34 (2006.01); H01J 37/34 (2006.01); B22F 3/105 (2006.01); B22F 3/14 (2006.01); B22F 3/15 (2006.01); B22F 9/08 (2006.01)
CPC (source: CN EP KR US)
B22F 3/10 (2013.01 - EP); B22F 3/105 (2013.01 - US); B22F 3/24 (2013.01 - US); B22F 9/082 (2013.01 - US); C22C 1/04 (2013.01 - CN); C22C 1/0416 (2013.01 - EP US); C22C 1/047 (2023.01 - EP US); C22C 1/05 (2013.01 - US); C22C 14/00 (2013.01 - CN); C22C 16/00 (2013.01 - CN); C22C 21/00 (2013.01 - CN EP KR US); C22C 27/00 (2013.01 - CN); C22C 28/00 (2013.01 - CN); C22C 29/005 (2013.01 - US); C22C 29/16 (2013.01 - US); C22C 30/00 (2013.01 - CN EP); C22C 32/0068 (2013.01 - US); C23C 14/3407 (2013.01 - CN KR); C23C 14/3414 (2013.01 - CN EP US); H01J 37/3429 (2013.01 - EP KR US); B22F 3/14 (2013.01 - EP); B22F 3/15 (2013.01 - EP); B22F 9/082 (2013.01 - EP); B22F 2003/1051 (2013.01 - EP US); B22F 2003/247 (2013.01 - US); B22F 2009/0824 (2013.01 - US); B22F 2201/20 (2013.01 - US); B22F 2202/13 (2013.01 - US); B22F 2301/052 (2013.01 - US); B22F 2302/20 (2013.01 - US); B22F 2998/10 (2013.01 - US); B22F 2999/00 (2013.01 - US)
Citation (search report)
- [E] WO 2021247813 A1 20211209 - MATERION CORP [US]
- [X] WO 2018169998 A1 20180920 - MATERION CORP [US]
- [X] JP 2000328242 A 20001128 - KOBE STEEL LTD
- [A] EP 3467142 A1 20190410 - JX NIPPON MINING & METALS CORP [JP]
- See also references of WO 2021019990A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
EP 4006196 A1 20220601; EP 4006196 A4 20231004; CN 114127328 A 20220301; CN 114127329 A 20220301; CN 114127330 A 20220301; EP 4006197 A1 20220601; EP 4006197 A4 20230816; EP 4006198 A1 20220601; EP 4006198 A4 20231018; KR 20220016977 A 20220210; KR 20220018547 A 20220215; KR 20220018548 A 20220215; TW 202108793 A 20210301; TW 202108794 A 20210301; US 2022275499 A1 20220901; US 2022356558 A1 20221110; US 2024043986 A1 20240208; WO 2021019990 A1 20210204; WO 2021019991 A1 20210204; WO 2021019992 A1 20210204
DOCDB simple family (application)
EP 20846815 A 20200626; CN 202080049429 A 20200626; CN 202080050071 A 20200626; CN 202080050074 A 20200626; EP 20847766 A 20200626; EP 20848288 A 20200626; JP 2020025277 W 20200626; JP 2020025279 W 20200626; JP 2020025281 W 20200626; KR 20227000278 A 20200626; KR 20227000279 A 20200626; KR 20227000283 A 20200626; TW 109123918 A 20200715; TW 109123919 A 20200715; US 202017623354 A 20200626; US 202017623943 A 20200626; US 202017625399 A 20200626