EP 4051829 A1 20220907 - SULFATE BASED, AMMONIUM FREE TRIVALENT CHROMIUM DECORATIVE PLATING PROCESS
Title (en)
SULFATE BASED, AMMONIUM FREE TRIVALENT CHROMIUM DECORATIVE PLATING PROCESS
Title (de)
VERFAHREN ZUR DEKORATIVEN PLATTIERUNG MIT SULFATBASIERTEM, AMMONIUMFREIEM TRIVALENTEM CHROM
Title (fr)
PROCÉDÉ DE PLACAGE DÉCORATIF AU CHROME TRIVALENT SANS AMMONIUM À BASE DE SULFATE
Publication
Application
Priority
- EP 19206651 A 20191031
- EP 20154909 A 20200131
- EP 2020080584 W 20201030
Abstract (en)
[origin: WO2021084103A1] The present invention refers to an electroplating bath for electroplating a chromium or chromium alloy layer, the bath comprising trivalent chromium ions, organic carboxylic acid, sulfate ions, sodium conductive ions, and additives in the form of inorganic sulfur compound and boric acid as well as a process using such an electroplating bath.
IPC 8 full level
C25D 3/06 (2006.01)
CPC (source: CN EP KR US)
C25D 3/06 (2013.01 - CN EP KR US); C25D 3/10 (2013.01 - EP KR); C25D 3/56 (2013.01 - CN EP KR US); C25D 5/00 (2013.01 - CN); C25D 5/627 (2020.08 - EP KR); C25D 9/08 (2013.01 - EP); C25D 17/10 (2013.01 - KR)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2021084103 A1 20210506; CA 3155524 A1 20210506; CA 3155524 C 20240227; CN 114729463 A 20220708; EP 4051829 A1 20220907; JP 2022551461 A 20221209; JP 7342253 B2 20230911; KR 20220119012 A 20220826; MX 2022004290 A 20220510; US 2022403538 A1 20221222
DOCDB simple family (application)
EP 2020080584 W 20201030; CA 3155524 A 20201030; CN 202080070306 A 20201030; EP 20796851 A 20201030; JP 2022521206 A 20201030; KR 20227017823 A 20201030; MX 2022004290 A 20201030; US 202017755503 A 20201030