EP 4127275 B1 20240306 - METHOD FOR THE TREATMENT OF A METAL SUBSTRATE FOR THE PREPARATION OF ELECTRODES
Title (en)
METHOD FOR THE TREATMENT OF A METAL SUBSTRATE FOR THE PREPARATION OF ELECTRODES
Title (de)
VERFAHREN ZUR BEHANDLUNG EINES METALLSUBSTRATS ZUR HERSTELLUNG VON ELEKTRODEN
Title (fr)
PROCÉDÉ DE TRAITEMENT D'UN SUBSTRAT MÉTALLIQUE POUR LA PRÉPARATION D'ÉLECTRODES
Publication
Application
Priority
- IT 202000006187 A 20200324
- EP 2021057498 W 20210323
Abstract (en)
[origin: WO2021191241A1] The present invention concerns a method for surface treatment of a metal substrate, suitable for use as electrode support in electrochemical processes, comprising the following steps: (a) immersion of said metal substrate and of at least one counter electrode in an electrolyte selected from hydrochloric acid, nitric acid, boric acid or sulfuric acid at a weight concentration of between 10-40%; (b) application of an anodic current density to said metal substrate of between 0,1 and 30 A/dm2 for a time of between 0.5 and 120 minutes. The invention also concerns an electrode for gas evolution in electrochemical processes obtained from a correspondingly treated substrate.
IPC 8 full level
C25F 3/02 (2006.01); C23C 18/08 (2006.01); C23G 1/00 (2006.01); C23G 1/10 (2006.01); C25B 11/03 (2021.01); C25B 11/061 (2021.01); C25B 11/093 (2021.01); C25F 3/06 (2006.01)
CPC (source: EP IL KR US)
C23C 18/08 (2013.01 - EP IL); C23G 1/00 (2013.01 - EP IL); C23G 1/10 (2013.01 - EP IL); C25B 1/04 (2013.01 - IL KR US); C25B 1/34 (2013.01 - IL US); C25B 1/46 (2013.01 - IL KR); C25B 9/19 (2021.01 - IL KR US); C25B 11/03 (2013.01 - EP IL KR); C25B 11/061 (2021.01 - EP IL KR US); C25B 11/093 (2021.01 - EP IL KR US); C25D 1/00 (2013.01 - IL US); C25D 17/12 (2013.01 - IL US); C25F 3/02 (2013.01 - EP IL KR); C25F 3/06 (2013.01 - EP IL KR)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2021191241 A1 20210930; AR 121638 A1 20220622; AU 2021243591 A1 20220929; BR 112022019176 A2 20221101; CA 3175062 A1 20210930; CL 2022002604 A1 20230421; CN 115335556 A 20221111; EP 4127275 A1 20230208; EP 4127275 B1 20240306; EP 4127275 C0 20240306; ES 2975497 T3 20240708; IL 296656 A 20221101; IL 296656 B1 20240101; IL 296656 B2 20240501; JP 2023523690 A 20230607; KR 20220158061 A 20221129; MX 2022011840 A 20221020; TW 202206653 A 20220216; US 2023151503 A1 20230518; ZA 202210124 B 20240131
DOCDB simple family (application)
EP 2021057498 W 20210323; AR P210100715 A 20210322; AU 2021243591 A 20210323; BR 112022019176 A 20210323; CA 3175062 A 20210323; CL 2022002604 A 20220923; CN 202180023751 A 20210323; EP 21713951 A 20210323; ES 21713951 T 20210323; IL 29665622 A 20220920; JP 2022557086 A 20210323; KR 20227037070 A 20210323; MX 2022011840 A 20210323; TW 110110285 A 20210323; US 202117906429 A 20210323; ZA 202210124 A 20220912