Global Patent Index - EP 4153348 A1

EP 4153348 A1 20230329 - METHOD AND SYSTEM FOR TRANSFORMING A GAS MIXTURE USING PULSED PLASMA

Title (en)

METHOD AND SYSTEM FOR TRANSFORMING A GAS MIXTURE USING PULSED PLASMA

Title (de)

VERFAHREN UND SYSTEM ZUR UMWANDLUNG EINES GASGEMISCHS MIT GEPULSTEM PLASMA

Title (fr)

PROCEDE ET SYSTEME POUR TRANSFORMER UN MELANGE DE GAZ PAR PLASMA PULSES

Publication

EP 4153348 A1 20230329 (FR)

Application

EP 21734400 A 20210520

Priority

  • FR 2005313 A 20200520
  • FR 2021050900 W 20210520

Abstract (en)

[origin: WO2021234302A1] Method for transforming a gas mixture into a gas mixture of higher added value, comprising a step of injecting a gas mixture into a pulsed plasma reactor, a dissociation step using pulsed discharges to generate a shock wave between two electrodes to produce gases, and a step of releasing the produced gases to an area where they can be cooled down and/or separated and/or collected. The dissociation step is also designed to provide passive re-ignition of the plasma in the event that the latter is blown out by the continuous stream of gas in the reactor.

IPC 8 full level

B01J 19/08 (2006.01)

CPC (source: EP KR US)

B01J 19/088 (2013.01 - EP KR US); B01J 2219/00759 (2013.01 - US); B01J 2219/0801 (2013.01 - EP KR); B01J 2219/0809 (2013.01 - EP KR US); B01J 2219/0815 (2013.01 - EP KR US); B01J 2219/0824 (2013.01 - EP KR); B01J 2219/0841 (2013.01 - EP KR); B01J 2219/0845 (2013.01 - EP KR US); B01J 2219/0869 (2013.01 - EP KR US); B01J 2219/0875 (2013.01 - EP KR); B01J 2219/0883 (2013.01 - EP KR); B01J 2219/0894 (2013.01 - EP KR US)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

Designated validation state (EPC)

KH MA MD TN

DOCDB simple family (publication)

FR 3110461 A1 20211126; FR 3110461 B1 20240510; EP 4153348 A1 20230329; JP 2023526649 A 20230622; KR 20230050271 A 20230414; US 2023294065 A1 20230921; WO 2021234302 A1 20211125

DOCDB simple family (application)

FR 2005313 A 20200520; EP 21734400 A 20210520; FR 2021050900 W 20210520; JP 2022571267 A 20210520; KR 20227044239 A 20210520; US 202117999304 A 20210520