EP 4191337 A1 20230607 - A METHOD OF MONITORING A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUSES

Title (en)

A METHOD OF MONITORING A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUSES

Title (de)

VERFAHREN ZUR ÜBERWACHUNG EINES LITHOGRAPHISCHEN VERFAHRENS UND ZUGEHÖRIGE VORRICHTUNGEN

Title (fr)

PROCÉDÉ DE SURVEILLANCE D'UN PROCESSUS LITHOGRAPHIQUE ET APPAREILS ASSOCIÉS

Publication

EP 4191337 A1 20230607 (EN)

Application

EP 21211785 A 20211201

Priority

EP 21211785 A 20211201

Abstract (en)

Disclosed is a method of determining a placement metric relating to placement of one or more features on a substrate in a lithographic process. The method comprises obtaining setup data comprising placement error contributor data relating to a plurality of placement error contributor parameters and yield data representative of yield and defining a statistical model for predicting a yield metric, the statistical model being based on a placement metric, the placement metric being a function of said placement error contributor parameters, and associated model coefficients. The model coefficients are fitted based on said setup data; and the placement metric determined from said fitted model coefficients.

IPC 8 full level

G03F 7/20 (2006.01)

CPC (source: EP)

G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/706839 (2023.05)

Citation (applicant)

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US 2010328655 A1 20101230 - DEN BOEF ARIE JEFFREY [NL]
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Citation (search report)

[A] WO 2021037484 A1 20210304 - ASML NETHERLANDS BV [NL]
[A] WO 2020094389 A1 20200514 - ASML NETHERLANDS BV [NL]
[A] US 2021356874 A1 20211118 - SLACHTER ABRAHAM [NL], et al
[A] GUPTA PUNEET ET AL: "Modeling Edge Placement Error Sistribution in Standard Cell Library", SPIE, PO BOX 10 BELLINGHAM WA 98227-0010 USA, vol. 6156, 14 March 2006 (2006-03-14), SPIE, pages 61560S1 - 61560S12, XP040221740, DOI: 10.1117/12.658580

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

Designated validation state (EPC)

KH MA MD TN

DOCDB simple family (publication)

EP 4191337 A1 20230607; CN 117882011 A 20240412

DOCDB simple family (application)

EP 21211785 A 20211201; CN 202280058444 A 20220804