EP 4193378 A1 20230614 - COATING APPARATUS AND COATING METHOD HAVING DIVIDED PULSES
Title (en)
COATING APPARATUS AND COATING METHOD HAVING DIVIDED PULSES
Title (de)
BESCHICHTUNGSVORRICHTUNG UND BESCHICHTUNGSVERFAHREN MIT UNTERTEILTEN PULSEN
Title (fr)
APPAREIL DE REVÊTEMENT ET PROCÉDÉ DE REVÊTEMENT AYANT DES IMPULSIONS DIVISÉES
Publication
Application
Priority
- DE 102020124032 A 20200915
- EP 2021074470 W 20210906
Abstract (en)
[origin: WO2022058193A1] The invention relates to a coating method and to a coating apparatus for coating a body (40). A magnetron-cathode (22a, 22b, 22c, 22d) having a target (24a, 24b, 24c, 24h) is arranged in the vacuum chamber (12). Electrical power is supplied to the magnetron-cathode (22a, 22b, 22c, 22d) such that a plasma is generated and the target (24a, 24b, 24c, 24h) is atomized in order to deposit a coating (44) on the body (40). The electrical power is periodically supplied within a period duration T according to the HIPIMS method as a cathode pulse (60), wherein each cathode pulse (60) comprises at least two cathode sub-pulses (62) and an intermediate cathode sub-pulse break (64). In order to be able to deposit coatings (44) having favorable properties, using the chopped HIP IMS method in a particularly favorable manner, a bias voltage is applied to the substrate (40) to be coated with bias voltage pulses (66), wherein each bias voltage pulse (66) comprises at least two bias sub-pulses (68) and an intermediate bias sub-pulse break (70).
IPC 8 full level
H01J 37/32 (2006.01); C23C 14/34 (2006.01); H01J 37/34 (2006.01)
CPC (source: EP US)
C23C 14/345 (2013.01 - EP); C23C 14/3485 (2013.01 - EP US); C23C 14/35 (2013.01 - US); C23C 14/352 (2013.01 - EP); C23C 14/54 (2013.01 - US); H01J 37/32706 (2013.01 - EP); H01J 37/3467 (2013.01 - EP)
Citation (search report)
See references of WO 2022058193A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
Designated validation state (EPC)
KH MA MD TN
DOCDB simple family (publication)
DE 102020124032 A1 20220317; CN 116438623 A 20230714; EP 4193378 A1 20230614; JP 2023540624 A 20230925; US 2023340658 A1 20231026; WO 2022058193 A1 20220324
DOCDB simple family (application)
DE 102020124032 A 20200915; CN 202180073013 A 20210906; EP 2021074470 W 20210906; EP 21777418 A 20210906; JP 2023516133 A 20210906; US 202118026575 A 20210906