EP 4199027 A1 20230621 - CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING CHARGED-PARTICLE APPARATUS AND CONTROL METHOD
Title (en)
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING CHARGED-PARTICLE APPARATUS AND CONTROL METHOD
Title (de)
LADUNGSTEILCHENEINRICHTUNG, MEHRFACHVORRICHTUNGSEINRICHTUNG, VERFAHREN ZUR VERWENDUNG EINER LADUNGSTEILCHENEINRICHTUNG UND STEUERUNGSVERFAHREN
Title (fr)
APPAREIL À PARTICULES CHARGÉES, APPAREIL À DISPOSITIFS MULTIPLES, PROCÉDÉ D'UTILISATION DE L'APPAREIL À PARTICULES CHARGÉES ET PROCÉDÉ DE COMMANDE
Publication
Application
Priority
EP 21215703 A 20211217
Abstract (en)
A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array. The charged-particle-optical lens compensates for variations in distance between the emitter and the aperture array.
IPC 8 full level
H01J 37/04 (2006.01)
CPC (source: EP)
H01J 37/04 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/065 (2013.01); H01J 2237/083 (2013.01); H01J 2237/1501 (2013.01)
Citation (applicant)
- EP 1602121 A2 20051207 - MAPPER LITHOGRAPHY IP BV [NL]
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- US 2010276606 A1 20101104 - BAARS NORMAN HENDRIKUS RUDOLF [NL], et al
- EP 2702595 A1 20140305 - MAPPER LITHOGRAPHY IP BV [NL]
- EP 2715768 A2 20140409 - MAPPER LITHOGRAPHY IP BV [NL]
- EP 21183803 A 20210705
Citation (search report)
- [XI] WO 2021104991 A1 20210603 - ASML NETHERLANDS BV [NL]
- [XI] US 2018254167 A1 20180906 - ZHAO YAN [US], et al
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Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
Designated validation state (EPC)
KH MA MD TN
DOCDB simple family (publication)
DOCDB simple family (application)
EP 21215703 A 20211217; EP 2022082751 W 20221122