Global Patent Index - EP 4214575 A1

EP 4214575 A1 20230726 - OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

Title (en)

OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

Title (de)

OPTISCHES SYSTEM UND LITHOGRAPHIEANLAGE

Title (fr)

SYSTÈME OPTIQUE ET APPAREIL LITHOGRAPHIQUE

Publication

EP 4214575 A1 20230726 (DE)

Application

EP 21763312 A 20210816

Priority

  • DE 102020211691 A 20200917
  • EP 2021072693 W 20210816

Abstract (en)

[origin: WO2022058106A1] The invention relates to an optical system (200) for lithography apparatus (100A, 100B), comprising: a movable element (201), which is designed as an optical element or as a reference structure; and a functional element (202) having a first and a second portion (202a, 202b), wherein the first portion (202a) is fastened to the movable element (201) by a joining means along a fastening plane (204) and the second portion (202b) comprises a functional surface (203); wherein the functional element (202) comprises a decoupling device (207) for decoupling by deformation the first portion (202a) from the second portion (202b), wherein the decoupling device (207) is formed by a narrowing (205) of the functional element (202); the narrowing (205) is located laterally outside a region of the functional surface (203); and the functional surface (203) is a measurement surface which is suitable for acquisition for the purposes of positioning and/or orientating the movable element (201).

IPC 8 full level

G03F 7/20 (2006.01); G01B 11/02 (2006.01); G02B 7/00 (2021.01)

CPC (source: EP US)

G01B 9/02049 (2013.01 - US); G02B 7/003 (2013.01 - US); G02B 27/62 (2013.01 - US); G03F 7/20 (2013.01 - US); G03F 7/70258 (2013.01 - EP); G03F 7/70825 (2013.01 - EP); G03F 7/7085 (2013.01 - EP); G02B 7/00 (2013.01 - EP)

Citation (search report)

See references of WO 2022058106A1

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

Designated validation state (EPC)

KH MA MD TN

DOCDB simple family (publication)

WO 2022058106 A1 20220324; CN 116249922 A 20230609; DE 102020211691 A1 20220317; EP 4214575 A1 20230726; US 2023221646 A1 20230713

DOCDB simple family (application)

EP 2021072693 W 20210816; CN 202180063685 A 20210816; DE 102020211691 A 20200917; EP 21763312 A 20210816; US 202318183774 A 20230314