EP 4217324 A1 20230802 - METHOD FOR APPLYING A MATERIAL COMPRISING A STACK WITH ABSORBENT METALLIC LAYER AND DIELECTRIC TOPCOAT, AND THIS MATERIAL
Title (en)
METHOD FOR APPLYING A MATERIAL COMPRISING A STACK WITH ABSORBENT METALLIC LAYER AND DIELECTRIC TOPCOAT, AND THIS MATERIAL
Title (de)
VERFAHREN ZUM AUFBRINGEN EINES MATERIALS MIT EINEM STAPEL MIT ABSORBIERENDER METALLSCHICHT UND DIELEKTRISCHER DECKSCHICHT SOWIE DIESES MATERIAL
Title (fr)
PROCEDE DE DEPOT D'UN MATERIAU COMPORTANT UN EMPILEMENT A COUCHE METALLIQUE ABSORBANTE ET SURCOUCHE DIELECTRIQUE ET CE MATERIAU
Publication
Application
Priority
- FR 2009588 A 20200922
- FR 2021051608 W 20210921
Abstract (en)
[origin: WO2022064129A1] The invention concerns a method for applying a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metallic functional layer (140) and an anti-reflection coating (160) situated above said functional layer (140) on the opposite side from said substrate (30) which finishes with: - a metallic layer (168), said metallic layer (168) having a physical thickness of between 1.0 and 8.0 nm, or even between 1.5 and 5.0 nm, or even between 1.8 and 2.5 nm; and then - a dielectric topcoat (169) which is situated on and in contact with said absorbent metallic layer (168).
IPC 8 full level
C03C 17/36 (2006.01)
CPC (source: EP)
C03C 17/36 (2013.01); C03C 17/3644 (2013.01); C03C 17/3652 (2013.01); C03C 17/366 (2013.01)
Citation (search report)
See references of WO 2022064129A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
Designated validation state (EPC)
KH MA MD TN
DOCDB simple family (publication)
FR 3114264 A1 20220325; EP 4217324 A1 20230802; WO 2022064129 A1 20220331
DOCDB simple family (application)
FR 2009588 A 20200922; EP 21790948 A 20210921; FR 2021051608 W 20210921