Global Patent Index - EP 4249840 A1

EP 4249840 A1 20230927 - CONTINUOUS KILN AND THERMAL TREATMENT OR THERMAL CHEMICAL PROCESSING METHOD

Title (en)

CONTINUOUS KILN AND THERMAL TREATMENT OR THERMAL CHEMICAL PROCESSING METHOD

Title (de)

DURCHLAUFOFEN UND WÄRMEBEHANDLUNGS- ODER WÄRMEBEHANDLUNGSVERFAHREN

Title (fr)

FOUR CONTINU ET PROCÉDÉ DE TRAITEMENT THERMIQUE OU THERMOCHIMIQUE

Publication

EP 4249840 A1 20230927 (EN)

Application

EP 21899587 A 20210715

Priority

  • CN 202011388498 A 20201201
  • CN 202022859568 U 20201201
  • CN 2021106417 W 20210715

Abstract (en)

A continuous kiln and a thermal treatment or thermal chemical processing method, relating to the field of lithium-ion battery material processing. The continuous kiln comprises a kiln, an airflow supply and exhaust device, and an airflow control device. The airflow supply and exhaust device and the airflow control device work in conjunction to control an atmosphere in a furnace chamber of the kiln. Since air supply nozzles and air exhaust nozzles in the airflow supply and exhaust device are arranged opposite to each other, transverse airflow perpendicular to the length direction of the kiln may be formed, and the internal atmosphere may be kept stable.

IPC 8 full level

F27B 9/04 (2006.01); F27B 9/26 (2006.01); F27B 9/30 (2006.01); F27B 9/36 (2006.01)

CPC (source: EP KR)

F27B 9/04 (2013.01 - EP KR); F27B 9/10 (2013.01 - EP); F27B 9/26 (2013.01 - EP KR); F27B 9/30 (2013.01 - EP); F27B 9/3005 (2013.01 - EP); F27B 9/3011 (2013.01 - EP); F27B 9/36 (2013.01 - EP KR); F27D 19/00 (2013.01 - EP KR); F27D 21/0014 (2013.01 - KR); F27D 2019/0003 (2013.01 - KR); F27D 2019/0006 (2013.01 - EP); F27D 2021/0007 (2013.01 - KR)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

Designated validation state (EPC)

KH MA MD TN

DOCDB simple family (publication)

EP 4249840 A1 20230927; EP 4249840 A4 20240529; KR 20230093510 A 20230627; WO 2022116547 A1 20220609

DOCDB simple family (application)

EP 21899587 A 20210715; CN 2021106417 W 20210715; KR 20237018084 A 20210715