EP 4259854 A1 20231018 - METHOD FOR ELECTRODEPOSITING A DARK CHROMIUM LAYER ON A SUBSTRATE AND SUBSTRATE HAVING AT LEAST ONE SIDE FULLY COVERED WITH A DARK CHROMIUM LAYER
Title (en)
METHOD FOR ELECTRODEPOSITING A DARK CHROMIUM LAYER ON A SUBSTRATE AND SUBSTRATE HAVING AT LEAST ONE SIDE FULLY COVERED WITH A DARK CHROMIUM LAYER
Title (de)
VERFAHREN ZUM GALVANISCHEN ABSCHEIDEN EINER DUNKLEN CHROMSCHICHT AUF EINEM SUBSTRAT UND SUBSTRAT MIT MINDESTENS EINER VOLLSTÄNDIG MIT EINER DUNKLEN CHROMSCHICHT BEDECKTEN SEITE
Title (fr)
PROCÉDÉ DE DÉPÔT ÉLECTROLYTIQUE D'UNE COUCHE DE CHROME SOMBRE SUR UN SUBSTRAT ET SUBSTRAT AYANT AU MOINS UN CÔTÉ ENTIÈREMENT RECOUVERT D'UNE COUCHE DE CHROME SOMBRE
Publication
Application
Priority
- EP 20213572 A 20201211
- EP 20213575 A 20201211
- EP 2021085213 W 20211210
Abstract (en)
[origin: WO2022123019A1] The present invention relates to a method for electrodepositing a dark chromium layer on a substrate and a substrate having at least one side fully covered with a dark chromium layer. The method includes utilizing an aqueous trivalent chromium electroplating bath comprising colloidal particles and a step of treating the substrate with a rinse liquid having a temperature of 50°C or more.
IPC 8 full level
C25D 3/06 (2006.01); C25D 3/08 (2006.01); C25D 5/00 (2006.01); C25D 5/48 (2006.01); C25D 5/50 (2006.01); C25D 15/00 (2006.01)
CPC (source: EP US)
C25D 3/06 (2013.01 - EP US); C25D 3/08 (2013.01 - EP US); C25D 3/10 (2013.01 - EP US); C25D 5/12 (2013.01 - US); C25D 5/48 (2013.01 - EP); C25D 5/50 (2013.01 - EP); C25D 5/627 (2020.08 - EP US); C25D 15/00 (2013.01 - EP US); C25D 21/08 (2013.01 - US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
Designated validation state (EPC)
KH MA MD TN
DOCDB simple family (publication)
WO 2022123019 A1 20220616; CN 115803479 A 20230314; EP 4259854 A1 20231018; EP 4259855 A1 20231018; JP 2023531317 A 20230721; JP 2023553966 A 20231226; JP 3242417 U 20230615; JP 7467758 B2 20240415; TW 202231930 A 20220816; US 2023193496 A1 20230622; US 2024011178 A1 20240111; WO 2022123023 A1 20220616
DOCDB simple family (application)
EP 2021085213 W 20211210; CN 202180048786 A 20211210; EP 2021085219 W 20211210; EP 21834798 A 20211210; EP 21834800 A 20211210; JP 2023000502 U 20230220; JP 2023501840 A 20211210; JP 2023535571 A 20211210; TW 110146220 A 20211210; US 202118000221 A 20211210; US 202118256691 A 20211210