Global Patent Index - EP 4295408 A1

EP 4295408 A1 20231227 - SHIELD CONTACT LAYOUT FOR POWER MOSFETS

Title (en)

SHIELD CONTACT LAYOUT FOR POWER MOSFETS

Title (de)

ABSCHIRMUNGSKONTAKTANORDNUNG FÜR LEISTUNGS-MOSFETS

Title (fr)

AGENCEMENT DE CONTACT DE BLINDAGE POUR MOSFETS DE PUISSANCE

Publication

EP 4295408 A1 20231227 (EN)

Application

EP 22715957 A 20220323

Priority

  • US 202163166242 P 20210326
  • US 202217655579 A 20220321
  • US 2022071278 W 20220323

Abstract (en)

[origin: WO2022204691A1] A method includes defining a plurality of trenches (101, 101-1, 101-2, 102-3, 10-4, 101-c, 101-L, 101-M, 101-U) of a first type that extend in a longitudinal direction in a semiconductor substrate, and defining a trench (105, 105-1, 105-2, 105-3, 105-4) of a second type extending in a lateral direction and intersecting the plurality of trenches (101, 101-1, 101-2, 102-3, 10-4, 101-c, 101-L, 101-M, 101-U) of the first type. The trench (105, 105-1, 105-2, 105-3, 105-4) of the second type is in fluid communication with each of the intersected plurality of trenches (101, 101-1, 101-2, 102-3, 10-4, 101-c, 101-L, 101-M, 101-U) of the first type. The method further includes disposing a shield poly layer (111) in the plurality of trenches (101, 101-1, 101-2, 102-3, 10-4, 101-c, 101-L, 101-M, 101-U) of the first type and the trench (105, 105-1, 105-2, 105-3, 105-4) of the second type, disposing an inter-poly dielectric layer (112) and a gate poly layer (108) above the shield poly layer (111) in the plurality of trenches (101, 101-1, 101-2, 102-3, 10-4, 101-c, 101-L, 101-M, 101-U) of the first type and the trench (105, 105-1, 105-2, 105-3, 105-4) of the second type, and forming an electrical contact to the shield poly layer (111) through an opening (106, 16) in the inter-poly dielectric layer (112) and the gate poly layer (108) disposed in the trench of the second type.

IPC 8 full level

H01L 29/06 (2006.01); H01L 21/336 (2006.01); H01L 29/78 (2006.01)

CPC (source: EP KR)

H01L 29/0696 (2013.01 - EP KR); H01L 29/407 (2013.01 - EP KR); H01L 29/66734 (2013.01 - EP KR); H01L 29/7813 (2013.01 - EP KR)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

Designated validation state (EPC)

KH MA MD TN

DOCDB simple family (publication)

WO 2022204691 A1 20220929; EP 4295408 A1 20231227; JP 2024511470 A 20240313; KR 20230159452 A 20231121; TW 202249294 A 20221216

DOCDB simple family (application)

US 2022071278 W 20220323; EP 22715957 A 20220323; JP 2023558958 A 20220323; KR 20237033363 A 20220323; TW 111111248 A 20220325