EP 4302399 A1 20240110 - METHOD FOR IMPEDANCE MATCHING, IMPEDANCE MATCHING ARRANGEMENT AND PLASMA SYSTEM
Title (en)
METHOD FOR IMPEDANCE MATCHING, IMPEDANCE MATCHING ARRANGEMENT AND PLASMA SYSTEM
Title (de)
VERFAHREN ZUR IMPEDANZANPASSUNG, IMPEDANZANPASSUNGSANORDNUNG UND PLASMASYSTEM
Title (fr)
PROCÉDÉ D'ADAPTATION D'IMPÉDANCE, AGENCEMENT D'ADAPTATION D'IMPÉDANCE ET SYSTÈME À PLASMA
Publication
Application
Priority
- DE 102021201937 A 20210301
- EP 2022055151 W 20220301
Abstract (en)
[origin: WO2022184713A1] The invention relates to a method for impedance matching using an impedance matching network (2) comprising an input (3) for connecting an RF power generator (5) and an output (4) for connection to a load (6) that has at least one first and one second series-connected matching stage (10, 12) each having a variable reactance (XP, XS), the method comprising the following steps: a) measuring an input impedance (Zin), b) ascertaining an intermediate impedance (Zinter) from the measured input impedance (Zin) and at least one current state value of at least one of the matching stages, c) ascertaining a target change value (dXP, dXS) for at least one reactance (XP, XS) of a matching stage (10, 12) from the intermediate impedance (Zinter) and a model of the impedance matching network (2), d) changing the state of at least one of the matching stages (10, 12) based on the target change value (dXP, dXS), e) repeating steps a) to d).
IPC 8 full level
H03H 7/40 (2006.01); G05B 13/04 (2006.01); H01J 37/32 (2006.01)
CPC (source: EP KR US)
H01J 37/32174 (2013.01 - EP); H01J 37/32183 (2013.01 - EP KR US); H01J 37/32926 (2013.01 - US); H03H 7/40 (2013.01 - EP KR)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
Designated validation state (EPC)
KH MA MD TN
DOCDB simple family (publication)
DE 102021201937 A1 20220901; CN 116918252 A 20231020; EP 4302399 A1 20240110; JP 2024508031 A 20240221; KR 20230145182 A 20231017; US 2024006156 A1 20240104; WO 2022184713 A1 20220909
DOCDB simple family (application)
DE 102021201937 A 20210301; CN 202280018122 A 20220301; EP 2022055151 W 20220301; EP 22712893 A 20220301; JP 2023553127 A 20220301; KR 20237031501 A 20220301; US 202318458177 A 20230830