EP 4341751 A1 20240327 - METHOD FOR CREATING A THREE-DIMENSIONAL TARGET STRUCTURE IN A LITHOGRAPHIC MATERIAL BY MEANS OF A LASER LITHOGRAPHY APPARATUS
Title (en)
METHOD FOR CREATING A THREE-DIMENSIONAL TARGET STRUCTURE IN A LITHOGRAPHIC MATERIAL BY MEANS OF A LASER LITHOGRAPHY APPARATUS
Title (de)
VERFAHREN ZUM ERZEUGEN EINER DREIDIMENSIONALEN ZIELSTRUKTUR IN EINEM LITHOGRAPHIEMATERIAL MITTELS EINER LASERLITHOGRAPHIE-VORRICHTUNG
Title (fr)
PROCÉDÉ DE CRÉATION D'UNE STRUCTURE CIBLE TRIDIMENSIONNELLE DANS UN MATÉRIAU DE GRAVURE AU MOYEN D'UN APPAREIL DE GRAVURE LASER
Publication
Application
Priority
- DE 102021113189 A 20210520
- EP 2022052687 W 20220204
Abstract (en)
[origin: WO2022242920A1] The invention relates to a method for creating a three-dimensional target structure (44) in a lithographic material (22) by means of a laser lithography apparatus, in which method: a substrate (40) comprising a lithographic material disposed thereon is provided; an interface (54) between the lithographic material and the substrate is located; the target structure is defined in that a focus area (28) of a write laser beam (14) is moved, according to specified write instructions, within a write area (34) on a scanning surface (36) by means of an optical device (16); in the focus area of the write laser beam, a write exposure dose is radiated into the lithographic material, and a structure area (46) is defined; in order to locate the interface, a focus area of a calibration laser beam is moved sequentially to a plurality of test positions within the write area on the scanning surface by means of the optical device; and at each test position, a test exposure dose is radiated into the lithographic material, and positional data of the interface (54) are determined from a response of the lithographic material and/or the substrate to the test exposure dose. The invention also relates to a laser lithography apparatus.
IPC 8 full level
G03F 7/20 (2006.01); B29C 64/135 (2017.01); B33Y 30/00 (2015.01); G03F 7/00 (2006.01)
CPC (source: EP)
B29C 64/135 (2017.07); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); G03F 7/0037 (2013.01); G03F 7/2053 (2013.01); G03F 7/70383 (2013.01); G03F 7/70416 (2013.01); G03F 7/7085 (2013.01)
Citation (search report)
See references of WO 2022242920A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
Designated validation state (EPC)
KH MA MD TN
DOCDB simple family (publication)
DE 102021113189 A1 20221124; EP 4341751 A1 20240327; JP 2024520257 A 20240524; WO 2022242920 A1 20221124
DOCDB simple family (application)
DE 102021113189 A 20210520; EP 2022052687 W 20220204; EP 22708412 A 20220204; JP 2023563856 A 20220204