EP 4348352 A1 20240410 - METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN
Title (en)
METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN
Title (de)
VERFAHREN ZUR VERWENDUNG EINER ZUSAMMENSETZUNG MIT EINER ORGANISCHEN SÄUREVERBINDUNG, LITHOGRAFIEZUSAMMENSETZUNG MIT EINER ORGANISCHEN SÄUREVERBINDUNG UND VERFAHREN ZUR HERSTELLUNG EINER RESISTSTRUKTUR
Title (fr)
PROCÉDÉ D'UTILISATION D'UNE COMPOSITION COMPRENANT UN COMPOSÉ D'ACIDE ORGANIQUE, COMPOSITION DE LITHOGRAPHIE COMPRENANT UN COMPOSÉ D'ACIDE ORGANIQUE ET PROCÉDÉ DE FABRICATION D'UN MOTIF DE RÉSERVE
Publication
Application
Priority
- JP 2021093090 A 20210602
- EP 2022064670 W 20220531
Abstract (en)
[origin: WO2022253787A1] [Problem] A method for reducing standing wave in a lithography process is provided. [Means for Solution] A method for using a composition comprising an organic acid compound (AA) having a certain structure to reduce standing wave in a lithography process. The distance between the antinode (3) and the node (4) in the direction parallel to the substrate (2) is referred to as the internode distance (5). The internode distance (5) / desired pattern width is referred to as the standing wave index. By reducing standing wave that appears in the resist pattern (1), pattern collapse, which is caused due to undesired shape or formation of a notch, is suppressed and stable formation of a finer pattern is facilitated.
IPC 8 full level
G03F 7/038 (2006.01); G03F 7/09 (2006.01); G03F 7/40 (2006.01)
CPC (source: EP KR)
G03F 7/0045 (2013.01 - KR); G03F 7/0382 (2013.01 - EP KR); G03F 7/0392 (2013.01 - KR); G03F 7/091 (2013.01 - KR); G03F 7/2004 (2013.01 - KR); G03F 7/34 (2013.01 - KR); G03F 7/38 (2013.01 - KR); G03F 7/038 (2013.01 - EP); G03F 7/091 (2013.01 - EP); G03F 7/40 (2013.01 - EP)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
Designated validation state (EPC)
KH MA MD TN
DOCDB simple family (publication)
WO 2022253787 A1 20221208; CN 117501179 A 20240202; EP 4348352 A1 20240410; KR 20240014531 A 20240201; TW 202302530 A 20230116
DOCDB simple family (application)
EP 2022064670 W 20220531; CN 202280039763 A 20220531; EP 22734155 A 20220531; KR 20237045353 A 20220531; TW 111120425 A 20220601