EP 4359845 A2 20240501 - HERMETICALLY ENCAPSULATED OPTICAL PROJECTION ARRANGEMENT AND METHOD FOR PRODUCING SAME
Title (en)
HERMETICALLY ENCAPSULATED OPTICAL PROJECTION ARRANGEMENT AND METHOD FOR PRODUCING SAME
Title (de)
HERMETISCH VERKAPSELTE, OPTISCHE PROJEKTIONSANORDNUNG UND VERFAHREN ZUM HERSTELLEN DERSELBEN
Title (fr)
DISPOSITIF DE PROJECTION OPTIQUE RECOUVERT HERMÉTIQUEMENT ET PROCÉDÉ DE PRODUCTION CORRESPONDANT
Publication
Application
Priority
- DE 102021206477 A 20210623
- EP 2022066987 W 20220622
Abstract (en)
[origin: WO2022268870A2] An optical projection arrangement (10) comprises a first assembly (10-1) arranged on a gastight first partial substrate (20-1), having an optoelectronic component (30) arranged on the first partial substrate (20-1), at least one portion of the transmission radiation (32) of the optoelectronic component (30) having a main emission direction in a range of ±30° with respect to a vertical of the first partial substrate (20-1), a gastight covering element (38) hermetically joined to the first partial substrate (20-1) in order to provide a hermetically tight housing for the optoelectronic component (30), the covering element (38) comprising a material transparent to the transmission radiation at least in the region of the main emission direction, a lens arrangement (40) arranged fixedly in relation to the covering element (38), for collimation of the transmission radiation (32) of the optoelectronic component (30), and a prism arrangement (50) configured to guide the collimated transmission radiation (32) of the optoelectronic component (30) and to couple it out at an output coupling surface (52), and furthermore comprises a second assembly (10-1) arranged on a second partial substrate (20-1), having a MEMS mirror arrangement (60) having a movably suspended and deflectable MEMS-based mirror element (62), the prism arrangement (50) and the MEMS mirror arrangement (60) being arranged geometrically with respect to one another such that the transmission radiation (32) coupled out impinges on the movably suspended MEMS-based mirror element (62) at an angle β of incidence, the angle β of incidence in the rest state of the MEMS-based mirror element (62) being in a range of between 30° and 50°.
IPC 8 full level
G02B 26/10 (2006.01); B81B 7/00 (2006.01); B81C 1/00 (2006.01); G02B 27/18 (2006.01)
CPC (source: EP)
B81C 1/00317 (2013.01); G02B 26/101 (2013.01); G02B 27/14 (2013.01); G02B 27/18 (2013.01); H01S 5/02255 (2021.01); H01S 5/02345 (2021.01); B81B 2201/042 (2013.01); B81C 2203/031 (2013.01); H01S 5/02208 (2013.01); H01S 5/02253 (2021.01); H01S 5/4012 (2013.01); H01S 5/4093 (2013.01)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
Designated validation state (EPC)
KH MA MD TN
DOCDB simple family (publication)
DE 102021206477 A1 20221229; DE 102021206477 B4 20230112; EP 4359845 A2 20240501; WO 2022268870 A2 20221229; WO 2022268870 A3 20230323
DOCDB simple family (application)
DE 102021206477 A 20210623; EP 2022066987 W 20220622; EP 22734955 A 20220622