(19)
(11)EP 1 412 262 B1

(12)EUROPEAN PATENT SPECIFICATION

(45)Mention of the grant of the patent:
21.05.2008 Bulletin 2008/21

(21)Application number: 01984157.6

(22)Date of filing:  10.07.2001
(51)International Patent Classification (IPC): 
G03F 7/20(2006.01)
H01L 21/68(2006.01)
(86)International application number:
PCT/US2001/021684
(87)International publication number:
WO 2002/004311 (17.01.2002 Gazette  2002/03)

(54)

SMIF CONTAINER INCLUDING AN ELECTROSTATIC DISSIPATIVE RETICLE SUPPORT STRUCTURE

SMIF-BEHÄLTER MIT ELEKTROSTATISCHE LADUNGEN ABLEITENDER STÜTZKONSTRUKTION FÜR RETIKÜL

CONTENANT D'INTERFACE MECANIQUE NORMALISE (SMIF) COMPORTANT UNE STRUCTURE DE SUPPORT DE RETICULES ELECTROSTATIQUE DISSIPATIVE


(84)Designated Contracting States:
DE FR GB IT NL

(30)Priority: 10.07.2000 US 217177 P

(43)Date of publication of application:
28.04.2004 Bulletin 2004/18

(73)Proprietor: Entegris, Inc.
Chaska, MN 55318 (US)

(72)Inventors:
  • SMITH, Mark, V.
    Colorado Springs, CO 80918 (US)
  • WARTENBERGH, Robert, P.
    Woodside, CA 94062 (US)
  • PENNYBACKER, William, P.
    Tracy, CA 95376 (US)

(74)Representative: Dawson, Elizabeth Ann 
A.A. Thornton & Co. 235 High Holborn
London WC1V 7LE
London WC1V 7LE (GB)


(56)References cited: : 
WO-A-00/56633
US-A- 4 739 882
US-A- 5 577 610
US-A- 3 615 006
US-A- 4 776 462
  
      
    Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).


    Description

    BACKGROUND OF THE INVENTION


    Field of the Invention



    [0001] The present invention relates to a standardized mechanical interface (SMIF) container for transferring workpieces such as reticles in a semiconductor or reticle fab, and in particular to a container including a static dissipative support structure mounted to the container shell and grounded to the container door for dissipating static electric charge from contact points on the top side of the reticle.

    Description of the Related Art



    [0002] Semiconductor devices are made up of as many as fifty individual patterned layers of silicon, silicon compounds and metals. During fabrication of these devices, the pattern for each of these layers is contained on a mask called a reticle. A reticle is an optically clear quartz substrate on which a pattern has been formed by photolithography or other such processes. In particular, a layer ofphotoresist is applied on a chrome coated reticle blank. Thereafter, the pattern for a particular layer to be formed on a semiconductor wafer is transferred onto the reticle as for example by a laser pattern generator or e-beam. After pattern generation on the photoresist, the exposed portions of the photoresist are removed to leave the unwanted portions of the chrome layer exposed. These unwanted portions are then etched away. The remaining photoresist is then removed in a process which leaves the clean pattern on the surface on the reticle.

    [0003] In order to keep the surface of the reticle clean, a thin transparent sheet called a pellicle is mounted a short distance away from the surface of the reticle containing the pattern. This ensures that any microscopic dust that settles on the reticle will be out of focus during the exposure process so as not to affect the pattern formed on the silicon wafer.

    [0004] During fabrication of the reticle, it is important to minimize airborne particle fluxes onto the surface of the reticle on which the pattern is being formed, as any such particles can corrupt the pattern. Even after formation of the pattern and affixation of the pellicle, larger, or macro, contaminants can settle on the reticle which can interfere with pattern transference onto the semiconductor wafer. It would therefore be advantageous to shield the reticles from the external environment during reticle fabrication, during transfer of the reticle from the reticle fab to the semiconductor fab, and during usage of the reticle in the semiconductor fab.

    [0005] In addition to exposing the reticle to airborne particulates, physical handling of a reticle during transfer can also damage a reticle. Common causes of damage when handling reticles include scratches, electrostatic discharge onto the reticle, and cracking of the reticle and/or pellicle.

    [0006] In a semiconductor wafer fab, it is therefore known to store and transfer workpieces such as semiconductorwafers using a standard mechanical interface, or SMIF, system. The SMIF system was developed by the Hewlett-Packard Company and disclosed in U.S. Patent Numbers 4,532,970 and 4,534,389. The purpose of a SMIF system is to reduce particle fluxes onto workpieces such as reticles and semiconductor wafers during storage and transport of the workpieces through the fabrication process. This purpose is accomplished, in part, by mechanically ensuring that during storage and transport, the gaseous media (such as air or nitrogen) surrounding the workpieces is essentially stationary relative to the workpieces and by ensuring that particles from the ambient environment do not enter the immediate workpiece environment.

    [0007] The SMIF system provides a clean environment for articles by using a small volume of particle-free gas which is controlled with respect to motion, gas flow direction and external contaminants. Further details of one proposed system are described in the paper entitled "SMIF: A TECHNOLOGY FOR WAFER CASSETTE TRANSFER IN VLSI MANUFACTURING," by Mihir Parikh and Ulrich Kaempf, Solid State Technology, July 1984, pp. 111-115.

    [0008] A SMIF system has three main components: (1) sealed containers, having a minimal volume, used for storing and transporting workpieces and/or cassettes which hold the workpieces; (2) enclosures placed over access ports and workpiece processing areas of processing equipment so that the environments inside the containers and enclosures (after having clean air sources) become miniature clean spaces; and (3) a transfer mechanism to load/unload workpieces and/or workpiece cassettes from a sealed container without contamination of the workpieces from external environments.

    [0009] US-A-4 739 882 discloses a transportable SMIF container for storing articles, such as semiconductor wafers, in a clean state. The container provides a box which defines an interior space for containing the articles. The box includes a box top and box base which supports the box tip and includes a box door for opening and closing the container. The box door provides a region for supporting the articles in the interior space, and a liner is insertable into the interior space and surrounds the region. The box door is retractable from the box space, and the articles in the region are retractable with the box door.

    [0010] Electrostatic buildup on and discharge from recticles can damage or destroy the recticles, and concern about electrostatic damage has been increasing in recent years as device geometries get finer and the requirements for reliability become more stringent. In conventional SMIF pods, it is known to have conductive contacts on the reticle support in the pod door to dissipate electrostatic charge from the bottom surface of the reticle. The charge is then grounded through the pod door. Similarly, conductive contacts are provided on the reticle retainer in the pod shell to dissipate electrostatic charge from the top surface of the reticle. The charge from the top surface is then grounded through the pod shell.

    [0011] WO 00/56633 discloses a SMIF container including a reticle support structure.

    [0012] A drawback to convention recticle containers is that the shell must include static dissipative materials to provide a path to ground for the static charge from the top surface of the reticle. It is desirable that the shell be transparent so that the reticle can be viewed from the outside. However, the agents that make the shell statically dissipative cloud the shell and reduce its transparency.

    [0013] The present invention provides an apparatus for supporting an object within a SMIF pod, as claimed in claim 1.

    [0014] In another aspect, the invention provides a SMIF pod as claimed in claim 6.

    BRIEF DESCRIPTION OF THE DRAWINGS



    [0015] The present invention will now be described with reference to the drawings in which:

    FIGURE 1 is a perspective view showing a container and reticle support mechanism according to the present invention;

    FIGURE 2 is an enlarged perspective view showing a tab on the reticle retaining structure and tab receiver on the reticle support structure for dissipating an electrostatic charge from the top surface of the reticle through the pod door; and

    FIGURE 3 is a perspective view of an embodiment of the present invention illustrating the mechanical interlock between the support structure in the form of a column, and the retaining structure.


    DETAILED DESCRIPTION



    [0016] The present invention will now be described with reference to Figs. 1 and 2, which in general relate to a container including an electrostatic dissipative (ESD) support structure for supporting a reticle. While the present invention is described with respect to a SMIF container, it is understood the present invention may be used with any of various containers for storing and transferring reticles or similar workpieces, and is limited only by the scope of the claims. Additionally, a preferred embodiment of the present invention complies with, and allows compliance with, all applicable SEMI standards.

    [0017] Referring now to Fig. 1, there is shown a container 100 comprising a shell 102 capable of mating with a door 104 to define a sealed environment within the container for storing and transporting a reticle 105. Although not critical to the present invention, door 104 preferably includes a latch mechanism for allowing the shell 102 to be removably coupled to the door. Such a latch mechanism comprises four independent latches 106 which may be moved outward by laterally actuating pins (not shown) on a load port on which the pod is seated. Such a latching mechanism may additionally include a locking mechanism to prevent unwanted opening of the pod. This locking mechanism is disclosed in U.S. Patent No. 6,536,813, entitled, "SMIF CONTAINER LATCH MECHANISM", to Smith et al., owned by the owner of the present invention. Details relating to an alternative latching mechanism are shown for example in U.S. PatentNo. 4,995,430, entitled "SEALABLE TRANSPORTABLE CONTAINER HAVING IMPROVED LATCH MECHANISM", to Bonora et al., which patent is assigned to the owner of the present application.

    [0018] The container door is preferably formed of a static disapative, durable polymer, such as for example carbon fiber-filled polycarbonate. The container shell is preferably formed of a durable polymer, such as polycarbonate, and is clear to allow the viewing of the reticle as explained hereinafter. As an alternative to polycarbonate, the door and/or shell may further be formed of flame retardant polyetherimide. It is understood that the door and shell may be formed of other materials in alternative embodiments. However, it is a feature of the present invention that the shell 102 need not include static dissipative materials. The door and shell are preferably formed by injection molding, but other known methods of manufacture are contemplated.

    [0019] Container 100 further includes a reticle support mechanism 110 mounted within an interior of the container 100. Reticle support mechanism 110 includes four reticle support structures 112 mounted to or formed on door 104 and a pair of reticle retaining structures 114 mounted to shell 102. Support structures 112 and retaining structures 114 of the reticle support mechanism 110 allow areticle to be quickly and easily positioned within and removed from container 100, prevent movement of the reticle within the container during container transport, and provide a path to ground for electrostatic dissipation from the top and bottom surface of the reticle.

    [0020] In a preferred embodiment, the reticle support structures 112 and retaining structures 114 are formed of a substantially rigid, low particulating and electrostatically dissipative material such as for example carbon fiber-filled polyetheretherkeytone ("PEEK). It is understood that various other materials including polycarbonate, polyetherimide, or other compositions may be used.

    [0021] Reticle support structures 112 may support the reticle any number of ways. A chamfer is conventionally provided around a lower edge of reticle 105. In a preferred embodiment, the four support structures 112 support the reticle along the lower edge chamfer, at the corners of the reticle. It is understood that other known mechanisms may be used for contacting and supporting the reticle on the pod door in alternative embodiments. For example, the reticle support structures may contact the reticle along its edges as opposed or in addition to at its corners, and/or may contact the bottom side of the reticle. When seated on a load port, stand alone station or other support structure, the pod is typically supported on registration pins that mate in corresponding slots on a bottom surface of the pod door. Other registration features for supporting the pod on a support surface are known. When seated on a support surface, electrostatic charges are dissipated from the bottom surface of the reticle along a path through the reticle support structures 112, through the pod door 104, through the registration features supporting the pod, and from the registration features to ground.

    [0022] In addition to structure for supporting the reticle 105, each reticle support structure 112 further includes a tab receiver 116 for receiving a tab formed on the reticle retaining structures 114 as explained in greater detail below. As best seen in Fig. 3, the tab receiver 116 comprises a detent defined by inwardly sloping sidewalls 117.

    [0023] Referring now to Figs. 1-3, reticle retaining structures 114 may retain the reticle in position any number of ways upon mating the pod shell with the pod door. In one embodiment, the two retaining structures 114 each include a base portion 118 which is mounted to container shell 102 by one or more bosses 120 on the upper surface of the reticles. A chamfer is conventionally provided around an upper edge of reticle 105. Each reticle retaining structure further includes two end portions 122 provided for contacting the upper chamfer of reticle 105, at the corners of the reticle, when the pod shell is mated to the pod door to hold the reticle in place when the pod is sealed. It is understood that other known mechanisms may be used for contacting and retaining the reticle in position when the pod is sealed in alternative embodiments. For example, the reticle retaining structures may contact the reticle along its edges as opposed or in addition to at its corners, and/or may contact the top side of the reticle.

    [0024] The reticle retaining structures further provide a current flow path for the electrostatic charge away from the top surface of the reticle. In particular, the reticle retaining structures further include dissipative tabs 124 mounted to one or both reticle retaining structures, which tabs extend down over the sides of the reticle and into contact with the respective tab receivers 116 on the pod door. In a preferred embodiment, there are two such dissipative tabs 124, one each on the ends of one of the reticle retaining structures. When seated on a support surface, electrostatic charges are dissipated from the top surface of the reticle along a path through the ends of the reticle retaining structure 114 in contact with the reticle, through the dissipative tabs 124 on the reticle retaining structures to the tab receivers 116 on the reticle support structures, through the reticle support structures to the pod door, through the pod door 104 to the registration features supporting the pod, and through the registration features to ground.

    [0025] The manner of contact between the dissipative tabs 124 and tab receivers 116 may vary in alternative embodiments. In one embodiment, each tab 124 is slightly flexible so as to deflect in a direction substantially perpendicular to its length. In such an embodiment, a slight interference, on the order of about 0.010 inches, may be provided between the tabs and one of the sidewalls 117 of the tab receivers so that, when the pod shell is mated with the pod door, each tab slides against one of the sidewalls 117. Contact between each tab 124 and a sidewall 117 slightly deflects the tab. This interference ensures contact between the tabs and the tab receivers upon closing the pod. In this embodiment, the tabs 124 do not contact the bottom of the detent where the two sidewalls 117 defining each tab receiver meet. The reticle support structure and/or reticle retaining structure may include a low friction material, such as Teflon7 (RTM) to prevent the generation of particulates upon contact between the tabs and tab receivers.

    [0026] It is understood that other known schemes may be provided for electrically coupling the reticle retaining structures 114 to the reticle support structures 112 upon closure of the pod to provide a path to ground off of the top surface of the reticle through the pod door. For example, instead of sliding against a sidewall 117, the tabs may exert a force straight down on a receiving surface (not shown) of the receiving tab, which surface is capable of deflection. Thus, when the pod shell is mated to the pod door, the tab contacts the receiving surface to establish an electrical coupling between the tab and tab receiver. The deflection of the receiving surface prevents the contact between the tab and tab receiver from interfering with the support of the reticle between the reticle support structures 112 and reticle retaining structures 114.

    [0027] Although the present invention has been described thus far as supporting a square or rectangular reticle, it is understood that the present invention may be used to firmly support and electrostatically dissipate other workpieces within a container during storage and transport. Additionally, it is understood that the workpiece may be round or curvilinear. In such an embodiment, the respective reticle support structures and retaining structures would be modified to replace the angled sidewalls with continuously curved sidewalls configured to match the outer circumference of the workpiece.

    [0028] Although the invention has been described in detail herein, it should be understood that the invention is not limited to the embodiments herein disclosed. Various changes, substitutions and modifications may be made thereto by those skilled in the art without departing from the scope of the invention as defined in the claims.


    Claims

    1. An apparatus for supporting an obj ect within a SMIF pod, comprising:

    a first support structure and a second support structure for supporting the object; and

    a retaining structure for engaging said support structure, including:

    means for preventing movement of the object within the SMIF pod during SMIF pod transport,

    characterised in that the retaining structure includes first and second tabs, each first and second tab engaging said support structures, creating a discharge path between said retaining structure and said support structures.


     
    2. The apparatus as claimed in claim 1, wherein said first and second support structures are mechanically interconnected with the SMIF pod door.
     
    3. The apparatus as claimed in claim 1 or 2, wherein said retaining structure is mechanically interconnected with the SMIF pod shell.
     
    4. The apparatus as claimed in claim 1, wherein said support structures and said retaining structure are formed of a substantially rigid, low particulating and electrostatically dissipative material.
     
    5. The apparatus as claimed in claim 3 or 4, wherein
    said first and second tabs are arranged to engage said support structures when the SMIF pod shell forms a seal with the SMIF pod door, preventing movement of the object within the SMIF pod during SMIF pod transport.
     
    6. A SMIF pod for supporting an object, comprising:

    a pod door having an interior surface, said interior surface having at least two support structures to support the object; and

    a pod shell having an interior surface, having at least one retaining structure mechanically interconnected with said interior surface and engaging the support structures,

    characterised in that each support structure comprises an electrically conductive column mechanically interconnected with said interior surface,

    the retaining structure comprises an electrically conductive arm having tabs for engaging said columns; and

    the SMIF pod further comprises a discharge path, created between said columns and said arm when said pod shell engages said pod door.


     
    7. The SMIF pod as claimed in claim 6, wherein said arm further retains the object when said pod shell engages said pod door.
     
    8. The SMIF pod as claimed in claim 6, wherein
    the interior surface of the pod door has four electrically conductive columns,
    the interior surface of the pod shell has a plurality of electrically conductive arms, each arm having a first and second tab;
    and the discharge path is created between said columns and said arms when said first and second tab of each arm engages said columns.
     
    9. The SMIF pod as claimed in claim 8, wherein said arms further retain the object when said pod shell engages said pod door.
     
    10. The SMIF pod claimed in claim 8, wherein said columns further remove electrostatic charges from a bottom surface of the object.
     
    11. The SMIF pod as claimed in claim 8 or 10, wherein said arms further remove electrostatic charges from a top surface of the object.
     
    12. The SMIF pod as claimed in claim 6 or 8, wherein said columns and said arm(s) are formed of a substantially rigid, low particulating and electrostatically dissipative material.
     


    Ansprüche

    1. Vorrichtung zum Tragen eines Objekts innerhalb eines SMIF-Behälters, umfassend:

    eine erste Tragstruktur und eine zweite Tragstruktur zum Tragen des Objekts und eine Haltestruktur zum Eingreifen in die Tragstruktur, enthaltend:

    Mittel zum Verhindern von Bewegung des Objekts im Inneren des SMIF-Behälters während des Transports des SMIF-Behälters,

    und dadurch gekennzeichnet, dass die Haltestruktur eine erste und eine zweite Klaue umfasst, wobei jede mit den Haltestrukturen in Eingriff stehende erste und zweite Klaue einen Entladungspfad zwischen der Haltestruktur und den Tragstrukturen erzeugt.


     
    2. Vorrichtung nach Anspruch 1, wobei die erste und die zweite Tragstruktur mechanisch mit der SMIF-Behältertür verbunden sind.
     
    3. Vorrichtung nach Anspruch 1 oder 2, wobei die Haltestruktur mechanisch mit dem SMIF-Behältergehäuse verbunden ist.
     
    4. Vorrichtung nach Anspruch 1, wobei die Tragstrukturen und die Haltestruktur aus einem im Wesentlichen steifen, langsam zerfallenden und elektrostatisch dissipativen Material sind.
     
    5. Vorrichtung nach Anspruch 3 oder 4, wobei
    die erste und die zweite Klaue eingerichtet sind, um mit den Tragstrukturen in Eingriff zu stehen, wenn die SMIF-Behälterschale mit der SMIF-Behältertür eine Dichtung bildet, wodurch Bewegung des Objekts im Inneren des SMIF-Behälters während des Transports des SMIF-Behälters verhindert wird.
     
    6. SMIF-Behälter zum Tragen eines Objekts, umfassend:

    eine Behältertür mit einer Innenfläche, wobei die Innenfläche wenigstens zwei Tragstrukturen zum Tragen des Objekts aufweist, und

    ein Behältergehäuse mit einer Innenfläche, die wenigstens eine Haltestruktur aufweist, die mechanisch mit der Innenfläche verbunden ist und mit den Tragstrukturen in Eingriff steht,

    dadurch gekennzeichnet, dass jede Tragstruktur eine elektrisch leitfähige Säule umfasst, die mechanisch mit der Innenfläche verbunden ist,

    die Haltestruktur einen elektrisch leitfähigen Arm umfasst, der Klauen aufweist, um mit den Säulen in Eingriff zu stehen, und

    der SMIF-Behälter des Weiteren einen Entladungspfad umfasst, der zwischen den Säulen und dem Arm erzeugt wird, wenn das Behältergehäuse mit der Behältertür in Eingriff steht.


     
    7. SMIF-Behälter nach Anspruch 6, wobei der Arm des Weiteren das Objekt hält, wenn das Behältergehäuse mit der Behältertür in Eingriff steht.
     
    8. SMIF-Behälter nach Anspruch 6, wobei
    die Innenfläche der Behältertür vier elektrisch leitfähige Säulen hat und
    die Innenfläche des Behältergehäuses eine Vielzahl von elektrisch leitfähigen Armen hat, wobei jeder Arm eine erste und eine zweite Klaue aufweist und
    der Entladungspfad zwischen den Säulen und den Armen erzeugt wird, wenn die erste und die zweite Klaue jeder der Arme mit den Säulen in Eingriff steht.
     
    9. SMIF-Behälter nach Anspruch 8, wobei die Arme des Weiteren das Objekt halten, wenn das Behältergehäuse mit der Behältertür in Eingriff steht.
     
    10. SMIF-Behälter nach Anspruch 8, wobei die Säulen des Weiteren elektrostatische Ladungen von einer Bodenfläche des Objekts beseitigen.
     
    11. SMIF-Behälter nach Anspruch 8 oder 10, wobei die Arme des Weiteren elektrostatische Ladungen von einer Oberseitenfläche des Objekts beseitigen.
     
    12. SMIF-Behälter nach Anspruch 6 oder 8, wobei die Säulen und der Arm/die Arme aus einem im Wesentlichen steifen, langsam zerfallenden und elektrostatisch dissipativen Material sind.
     


    Revendications

    1. Appareil pour supporter un objet à l'intérieur d'un module SMIF, comprenant :

    une première structure de support et une deuxième structure de support destinées à supporter l'objet ; et une structure de rétention pour engager ladite structure de support, incluant :

    un moyen permettant d'empêcher le déplacement de l'objet à l'intérieur du module SMIF pendant le transport du module SMIF,

    caractérisé en ce que la structure de rétention inclut des premières et deuxièmes pattes, chaque première et deuxième patte engageant lesdites structures de support, et créant un chemin de décharge entre ladite structure de rétention et lesdites structures de support.


     
    2. Appareil selon la revendication 1, dans lequel lesdites première et deuxième structures de support sont interconnectées mécaniquement avec la porte du module SMIF.
     
    3. Appareil selon la revendication 1 ou 2, dans lequel ladite structure de rétention est interconnectée mécaniquement au boîtier du module SMIF.
     
    4. Appareil selon la revendication 1, dans lequel lesdites structures de support et ladite structure de rétention sont formées d'un matériau sensiblement rigide, faiblement particulaire et dissipatif sur le plan électrostatique.
     
    5. Appareil selon la revendication 3 ou 4, dans lequel
    lesdites première et deuxième pattes sont agencées pour engager lesdites structures de support lorsque le boîtier du module SMIF forme une fermeture étanche avec la porte du module SMIF, empêchant le déplacement de l'objet à l'intérieur du module SMIF pendant le transport du module SMIF.
     
    6. Module SMIF pour supporter un objet, comprenant :

    une porte de module ayant une surface intérieure, ladite surface intérieure ayant au moins deux structures de support pour supporter l'objet ; et

    un boîtier de module ayant une surface intérieure, ayant au moins une structure de rétention interconnectée mécaniquement avec ladite surface intérieure et engageant les structures de support,

    caractérisé en ce que chaque structure de support comprend une colonne électriquement conductrice qui est interconnectée mécaniquement avec ladite surface intérieure,

    la structure de rétention comprend un bras électriquement conducteur ayant des pattes destinées à engager lesdites colonnes ; et

    le module SMIF comprend en outre un trajet de décharge, créé entre lesdites colonnes et ledit bras lorsque ledit boîtier du module engage ladite porte du module.


     
    7. Module SMIF selon la revendication 6, dans lequel ledit bras retient en outre l'objet lorsque ledit boîtier de module engage ladite porte de module.
     
    8. Module SMIF selon la revendication 6, dans lequel
    la surface intérieure de la porte de module a quatre colonnes électriquement conductrices,
    la surface intérieure du boîtier de module a une pluralité de bras électriquement conducteurs, chaque bras ayant une première et une deuxième patte ;
    et le trajet de décharge est créé entre lesdites colonnes et lesdits bras lorsque lesdites première et deuxième pattes de chaque bras engagent lesdites colonnes.
     
    9. Module SMIF selon la revendication 8, dans lequel lesdits bras retiennent en outre l'objet lorsque ledit boîtier de module engage ladite porte de module.
     
    10. Module SMIF selon la revendication 8, dans lequel lesdites colonnes enlèvent en outre les charges électrostatiques d'une surface inférieure de l'objet.
     
    11. Module SMIF selon la revendication 8 ou 10, dans lequel lesdits bras enlèvent en outre les charges électrostatiques d'une surface supérieure de l'objet.
     
    12. Module SMIF selon la revendication 6 ou 8, dans lequel lesdites colonnes et le(s) dit(s) bras sont formés d'un matériau sensiblement rigide, faiblement particulaire et dissipatif sur le plan électrostatique.
     




    Drawing














    Cited references

    REFERENCES CITED IN THE DESCRIPTION



    This list of references cited by the applicant is for the reader's convenience only. It does not form part of the European patent document. Even though great care has been taken in compiling the references, errors or omissions cannot be excluded and the EPO disclaims all liability in this regard.

    Patent documents cited in the description




    Non-patent literature cited in the description