(19)
(11)EP 1 553 303 A3

(12)EUROPEAN PATENT APPLICATION

(88)Date of publication A3:
30.12.2009 Bulletin 2009/53

(43)Date of publication A2:
13.07.2005 Bulletin 2005/28

(21)Application number: 04257576.1

(22)Date of filing:  06.12.2004
(51)Int. Cl.: 
F04D 19/04  (2006.01)
H01L 21/00  (2006.01)
F04D 25/16  (2006.01)
(84)Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL BA HR LV MK YU

(30)Priority: 31.12.2003 US 750309

(71)Applicant: Edwards Vacuum, Inc.
Tewksbury, MA 01876 (US)

(72)Inventors:
  • Bailey, Christopher Mark
    Shoreham West Sussex BN43 6PB (GB)
  • Boger, Michael Stephen
    Corvallis Oregon 97333 (US)

(74)Representative: Clark, Charles Robert et al
Edwards Limited Manor Royal
Crawley, West Sussex RH10 2LW
Crawley, West Sussex RH10 2LW (GB)

  


(54)Apparatus for evacuating a plurality of vacuum chambers


(57) The present invention is an apparatus (100) and method for controlling pressure, pumping a vacuum and providing abatement for a plurality of vacuum processing chambers (110,115,120,125). The system may be used in semiconductor manufacture. Multiple vacuum processing chambers (110,115,120,125) are exhausted by turbo pumps (111,116,121,126) into a common abatement chamber (131), which is maintained at sub-atmospheric pressure by a backing pump (140). Pressure in the processing chambers (110,115,120,125) is independently controlled. The internal volume of the abatement device (131) provides a buffer that reduces the effect of pressure changes in one processing chamber affecting pressure in the other chambers.