(19)
(11)EP 0 276 979 A3

(12)EUROPEAN PATENT APPLICATION

(88)Date of publication A3:
06.12.1989 Bulletin 1989/49

(43)Date of publication A2:
03.08.1988 Bulletin 1988/31

(21)Application number: 88300624.9

(22)Date of filing:  26.01.1988
(51)International Patent Classification (IPC)4A61B 5/04, G01N 27/00, H01L 21/00
(84)Designated Contracting States:
AT BE CH DE ES FR GB GR IT LI LU NL SE

(30)Priority: 30.01.1987 GB 8702066
01.12.1987 GB 8728102

(71)Applicant: UNIVERSITY COLLEGE CARDIFF CONSULTANTS LTD.
Cardiff, CF1 1XL (GB)

(72)Inventors:
  • Wall, Peter, Dr.
    Ogmore Valley Mid Glamorgan (GB)
  • Pickard, Robert S., Prof.
    Cyncoed Cardiff CF2 6LP (GB)
  • Ensell, Graham, Dr.c/oUniversity College Cardiff
    Cardiff, Wales (GB)
  • Leong, David,c/o University College Cardiff
    Cardiff, Wales (GB)

(74)Representative: Arthur, Bryan Edward et al
Withers & Rogers 4 Dyer's Buildings Holborn
London EC1N 2JT
London EC1N 2JT (GB)


(56)References cited: : 
  
      


    (54)Microenvironmental sensors


    (57) A method of making a microenvironmental sensor for neurological use in which the sensor is formed on a silicon wafer (7) by the use of known integrated circuit techniques. A mask is applied to define the outline of the sensor, trenches are etched surrounding the sensor by the use of an anisotropic etchant and the sensor is separated by etching surplus silicon from the rear surface of the wafer.







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