(19)
(11)EP 1 795 962 A3

(12)EUROPEAN PATENT APPLICATION

(88)Date of publication A3:
06.06.2012 Bulletin 2012/23

(43)Date of publication A2:
13.06.2007 Bulletin 2007/24

(21)Application number: 06025355.6

(22)Date of filing:  07.12.2006
(51)International Patent Classification (IPC): 
G03F 7/039(2006.01)
G03F 7/20(2006.01)
G03F 7/004(2006.01)
(84)Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL BA HR MK RS

(30)Priority: 09.12.2005 JP 2005356719
17.03.2006 JP 2006075070
22.09.2006 JP 2006257553

(71)Applicant: Fujifilm Corporation
Minato-ku Tokyo (JP)

(72)Inventors:
  • Yamamoto, Kei
    Haibara-gun, Shizuoka (JP)
  • Kanna, Shinichi
    Haibara-gun, Shizuoka (JP)
  • Kanda, Hiromi
    Haibara-gun, Shizuoka (JP)

(74)Representative: HOFFMANN EITLE 
Patent- und Rechtsanwälte Arabellastraße 4
81925 München
81925 München (DE)

  


(54)Positive resist composition and pattern for forming method using the same


(57) A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (C) a resin having at least one repeating unit selected from fluorine atom-containing repeating units represented by the following formulae (1-1), (1-2) and (1-3), the resin being stable to an acid and insoluble in an alkali developer, and (D) a solvent:





wherein R1 represents a hydrogen atom or an alkyl group; R2 represents a fluoroalkyl group; R3 represents a hydrogen atom or a monovalent organic group; R4 to R7 each independently represents a hydrogen atom, a fluorine atom, an alkyl group, a fluoroalkyl group, an alkoxy group or a fluoroalkoxy group, provided that at least one of R4 to R7 represents a fluorine atom, and R4 and R5, or R6 and R7 may combine to form a ring; R8 represents a hydrogen atom, a fluorine atom or a monovalent organic group; Rf represents a fluorine atom or a fluorine atom-containing monovalent organic group; L represents a single bond or a divalent linking group; Q represents an alicyclic structure; and k represents an integer of 0 to 3.







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