(19)
(11)EP 3 377 941 B1

(12)EUROPEAN PATENT SPECIFICATION

(45)Mention of the grant of the patent:
24.06.2020 Bulletin 2020/26

(21)Application number: 16866881.2

(22)Date of filing:  10.11.2016
(51)International Patent Classification (IPC): 
G03F 1/82(2012.01)
H01L 21/02(2006.01)
G03F 7/20(2006.01)
H01L 21/027(2006.01)
(86)International application number:
PCT/US2016/061393
(87)International publication number:
WO 2017/087252 (26.05.2017 Gazette  2017/21)

(54)

APPARATUS FOR PHOTOMASK BACKSIDE CLEANING

VORRICHTUNG ZUR PHOTOMASKENRÜCKSEITENREINIGUNG

APPAREIL POUR LE NETTOYAGE DE LA FACE ARRIÈRE D'UN MASQUE PHOTOGRAPHIQUE


(84)Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

(30)Priority: 18.11.2015 US 201514945319

(43)Date of publication of application:
26.09.2018 Bulletin 2018/39

(73)Proprietor: Applied Materials, Inc.
Santa Clara, CA 95054 (US)

(72)Inventors:
  • RYE, Jason
    Kalispell, MT 59901 (US)
  • HANSON, Kyle Moran
    Kalispell, MT 59901 (US)

(74)Representative: Zimmermann & Partner Patentanwälte mbB 
Postfach 330 920
80069 München
80069 München (DE)


(56)References cited: : 
JP-A- H10 125 641
US-A- 5 513 594
US-A1- 2002 127 956
US-A1- 2008 041 760
US-B2- 8 578 953
JP-A- H10 308 337
US-A1- 2002 127 956
US-A1- 2008 041 429
US-A1- 2010 028 813
  
      
    Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).


    Description

    FIELD OF THE INVENTION



    [0001] The field of the invention is apparatus and methods for photomask backside cleaning.

    BACKGROUND OF THE INVENTION



    [0002] Photolithography is used in manufacturing microelectronic devices to form precise patterns on a substrate surface. A photo mask or reticle generally is a square plate of transparent material, such as glass or fused silica. The photomask is initially created with the pattern to be transferred to the substrate, such as a semiconductor wafer. With subsequent processing steps, the patterned substrate surface forms the desired micro or nano scale electronic devices or features. A photo mask may be repeatedly used to imprint thousands of substrates. In use the back side may become contaminated by scratches, burrs or particles, which degrades the photo mask. Techniques for cleaning the back side have been proposed. However, while cleaning the back side, it is necessary to avoid affecting the patterned front side of the photo mask. This presents various engineering challenges. According, improved apparatus and methods are needed for photo mask back side cleaning.

    [0003] US2008041429 discloses a rotor for holding a photo mask, comprising an assembly having a central opening, a resilient seal in the central opening; retractors and retractor frames to move the resilient mask seal into an open position or into a closed position.

    [0004] US2002127956 discloses a rotor for holding a wafer comprising a seal plate having a central opening and a resilient seal in the central opening.

    [0005] JP10308337 discloses a photo mask holder comprising a seal plate provided with a resilient mask seal in its central opening.

    SUMMARY OF THE INVENTION



    [0006] In a first aspect, apparatus for cleaning a photo mask includes a rotor in a head, with the rotor having a seal plate having a central opening, a resilient mask seal in the central opening, and retractors attached to the resilient mask seal and adapted to move the resilient mask seal into open and closed positions. A motor in the head rotates the rotor. A push plate may be provided in the head, with linear movement of the push plate adapted to operate the retractors. In the closed position the resilient mask seal seals against the sides of the photo mask. The back side of the photo mask can then be cleaned without affecting the patterned front side of the photo mask.

    BRIEF DESCRIPTION OF THE DRAWINGS



    [0007] 

    Fig. 1 is a side view of a photo mask back side cleaning apparatus.

    Fig. 2 is a bottom perspective view of the apparatus of Fig. 1.

    Fig. 3 is a top perspective view of the apparatus of Fig. 1.

    Fig. 4 is a section view of the head shown in Figs. 1 and 2.

    Fig. 5 is a top perspective view of the rotor shown in Fig. 4.

    Fig. 6 is a bottom perspective view of the rotor shown in Fig. 4.

    Fig. 7 is an enlarged section view of the rotor of Fig. 4 removed from the head.


    DETAILED DESCRIPTION



    [0008] As shown in Figs. 1-3, a photo mask cleaning apparatus 10 includes a base plate 12 which may be mounted onto a deck of a processing system having multiple other processing apparatus or modules and one or more robots for moving work pieces among the modules. Pins 18 on a holder 16 are adapted to support a photo mask 22. The holder may be supported on a lifter 20 which is movable vertically and lifts and lowers the holder 16, as further discussed below. Referring now also to Fig. 4, a head 30 has a rotor housing 52 and an arm 48 attached to a lift/rotate 32. The lift/rotate 32 is operable to lift and lower the head 30, and also rotates the head 30 into the face-down position shown in Figs. 1-2 and into the face-up position shown in Figs. 3-4. A frame 34 supported at a fixed position above the base plate 12 has a chamber sidewall 28 which is cylindrical and has a diameter nominally larger than the diameter of the head 30. An inflatable seal 66 on the head 30, for example an inflatable seal, engages and seals against the chamber sidewall 28 during the cleaning process when the head is in the face-up position or process position to form a processing chamber. With the inflatable seal 66 engaged against the chamber sidewall 28, a chamber or vessel is temporarily provided around the rotor. Other forms of seals, including seals that do not inflate, and seals on the chamber sidewall rather than on the head, may alternatively be used. As shown in Fig. 3, a liquid spray nozzle 38, such as an ultrasonic nozzle, is mounted on a swing arm 40. A shield 36 may project up above the frame 34 to better contain cleaning liquid spray within the apparatus.

    [0009] As shown in Fig. 4, a shaft plate 70 of a rotor 50 in the head 30 is attached to a shaft 54 which is attached to a motor 56. A gas nozzle 68 may extend through the center of the shaft plate 70 to provide gas into the rotor. Alternatively the rotor 50 may have one or more gas ports at other positions. One or more actuators 60 in the head are positioned to move a push plate 58 in the axial direction AA in Fig. 4. Ramps 62 are attached to the top surface of the push plate 58. In the example shown, three pneumatic linear actuators 60 and four ramps 62 equally spaced apart are used. As used here, up or top refers to the apparatus in the processing position as shown in Figs. 3, 4 and 7.

    [0010] Referring to Figs. 4-7, the rotor 50 has a seal plate 72 attached to the shaft plate 70. The seal plate 72 has a central opening matching the shape of the photo mask 22, which is square in the example shown. A resilient mask seal 74 is positioned in the central opening and has an upper rim 75 forming a seal with the seal plate 72 and a lower rim 85 forming a seal with or to the shaft plate 70. The upper rim 75 may be clamped between the seal plate 72 and the shaft plate 70. The lower rim 85 may be attached to the shaft plate 70 via a lower seal frame 76.

    [0011] Turning to Figs. 4, 6 and 7, first, second, third and fourth retractors generally indicated at 80 are provided on the shaft plate 70, with each retractor 80 positioned to retract the first, second, third and fourth straight sides of the resilient mask seal 74. Each retractor frame 80 has an inner end and an outer end, and with a retractor bar at the inner end attached to the resilient mask seal, An inner end of a retractor bar 82 is attached to one side of the resilient mask seal 74. The resilient mask seal 74 may be a molded rubber seal, with the retractor bars 82 secured within a channel of the resilient mask seal, and/or with the retractor bars 20 adhered to or embedded in the resilient mask seal 74. The outer end of each retractor bar 82 is attached to or part of a retractor frame 84. As shown in Fig, 6, a roller 88 may be provided at the outer end of each retractor frame 84. The rollers 88 are adapted for engagement by the ramps 62 moving in an axial direction perpendicular to the radial direction. Alternatively, a complimentary ramp may be used on the retractor frames instead of the roller. The retractors 80 are movable radially inwardly or outwardly on the shaft plate 70, i.e. along a radial direction or axis through the center of the rotor, but are otherwise fixed in place on the shaft plate 70. As shown in Fig. 7, each retractor 80 includes a compression spring 86 which continuously urges the retractor frame 84 radially inward. Alternatively, the retractors may be moved via one or more actuators on the shaft plate 70 and the compression spring 86 may be omitted.

    [0012] Corner posts 64 may project up from the shaft plate 70 at the corners of the resilient mask seal 74.

    [0013] In use, a photo mask 22 to be cleaned is placed onto the pins 18 of the holder 16 as shown in Fig. 1. The patterned or front side of the photo mask 22 is face up. As shown in Fig. 2, initially the head 30 is face-down. The rotor 50 is moved into the open position via the actuators 60 moving the push plate 58 towards the rotor 50. The ramps 62 pass through ramp slots 90 in the shaft plate 70 and push the rollers 88 simultaneously radially outwardly. This moves the retractor frames radially outwardly which stretches the resilient mask seal 74 outwardly, typically from 0.5 to 5 mm. The inside dimensions of the resilient mask seal 74, in the stretched or open position, are then nominally larger than the photo mask 22, so that the photo mask 22 can fit within the resilient mask seal 74.

    [0014] The motor 56 rotates the rotor 50 as needed to align the resilient mask seal 74 with the photo mask 22. After proper alignment is detected by a sensor, the lifter 20 lifts the holder 16 up vertically to position the photo mask 22 for transferring to the rotor by positioning the photo mask 22 within the resilient mask seal 74, while the rotor 50 is in the open position. The rotor 50 is moved into the closed position by returning the push plate 58 back to its original retracted position. This causes the ramps 62 to withdraw from the rollers 88 on the retractor frames 84. The compression springs 86 force the retractor frames 84 and the resilient mask seal 74 back to the closed position. The resilient mask seal 74 presses in and seals against the sides of the photo mask 22, without touching the front or back of the photo mask 22. The integrity of the seal formed between the resilient mask seal 74 and the edges of the photo mask 22 may be tested by monitoring gas flow into the sealed space between the resilient mask seal 74 and the photo mask 22, from the gas nozzle 68 or other gas line in the rotor 50.

    [0015] The lifter is reversed moving the holder 16 back to its load/unload position shown in Fig. 3. The lift/rotate 32 then rotates the head 30 into the head-up position and lifts the head 30 up so that the inflatable seal 66 is within the chamber sidewall 28, as shown in Fig. 3. The inflatable seal 66 is inflated and seals against the chamber sidewall 28. The swing arm 40 moves the liquid spray nozzle 38 over the now up-facing back of the photo mask 22, with the liquid spray nozzle 38 spraying a cleaning liquid onto the back of the photo mask 22. The resilient mask seal 74 prevents any cleaning liquid or vapors from contacting the patterned front of the photo mask 22. An inert gas, such as nitrogen, may be supplied under pressure to the gas nozzle 68 to further prevent any cleaning liquid or vapors from reaching the front of the photo mask 22. The back of the photo mask is typically also rinsed via a rinse liquid from a rinse nozzle on the swing arm, and dried via a drying gas sprayed from a drying gas nozzle on the swing arm. The motor 56 rotates the rotor 50 during cleaning to better distribute the cleaning liquid. During drying the motor 56 may rotate the rotor 50 at higher speed to centrifugally remove liquid from the back of the mask. Drain openings in the chamber sidewall 28 collect and remove used liquids.

    [0016] After the back of the photo mask has been cleaned and dried, the inflatable seal 66 is deflated, the lift/rotate 32 lowers the head 30 down and out of the chamber sidewall 28, and then rotates the head 30 back to the face-down position. The lifter 20 lifts the holder 16 up to receive the clean photo mask 22. The supply of inert gas via the gas nozzle 68 may continue. The actuators 60 move the push plate 58 towards the rotor 50 with the ramps 62 driving the retractor frames 84 radially outward returning the rotor 50 to the open position wherein the photo mask is released from the resilient mask seal 74.

    [0017] The actuators 60 may move the resilient mask seal 74 from the closed position to the open position over 5 to 20, 40 or 60 seconds to facilitate drying of the sides of the photo mask via gas flow from the gas nozzle 68. The photo mask is released onto the pins 18. The lifter lowers the holder 16 holding the clean photo mask 22 back down to the load/unload position shown in Fig. 3, where the clean photo mask 22 may be accessed by a robot for loading and unloading the apparatus 10, i.e., for receiving the photo mask from, or transferring the photo mask to, a robot. As used here, attached means rigidly attached, directly or via one or more intermediate elements.


    Claims

    1. A rotor for holding a photo mask, comprising:

    a seal plate (72) having a central opening;

    a resilient mask seal (74) in the central opening, with the resilient mask seal having first, second, third and fourth sides; and

    first, second, third and fourth retractors (80) at the first, second, third and fourth sides, respectively, with the first, second, third and fourth retractors each including a retractor frame (84) attached to the first, second, third and fourth sides of the resilient mask seal, respectively, and with each retractor moveable outwardly in a radial direction to move the resilient mask seal into an open position, and with each retractor moveable in a radial direction inwardly to move the resilient mask seal into a closed position.


     
    2. The rotor of claim 1 with each retractor including a spring (86) which continuously urges the retractor frame in the inward radial direction.
     
    3. The rotor of claim 1 with the first and third sides of the resilient mask seal have equal lengths and are perpendicular to the second and fourth sides of the resilient mask seal.
     
    4. The rotor of claim 3 with the first, second, third and fourth retractor frames each having an inner end and an outer end, and with first, second, third and fourth retractor bars (82) at the inner end of the first, second, third and fourth retractor frames, respectively, and the inner end of each retractor bar attached to the resilient mask seal, and a roller (88) at the outer end of each retractor frame adapted for engagement by a ramp (62) moving in an axial direction perpendicular to the radial direction.
     
    5. The rotor of claim 4 further including a shaft plate (70) attached to the seal plate, and with each retractor supported on the shaft plate and moveable on the shaft plate in a radial direction inwardly and outwardly.
     
    6. The rotor of claim 5 with the resilient mask seal having a upper rim (75) attached to the seal plate and a lower rim (85) attached to the shaft plate, and with the first, second, third and fourth retractor bars in between the upper rim and the lower rim of the resilient mask seal.
     
    7. The rotor of claim 6 further including a gas nozzle (68) at a center of the shaft plate.
     
    8. Apparatus for cleaning a photo mask, comprising:

    a head (30);

    a rotor (50) in the head, with the rotor having a seal plate (72) having a central opening, a resilient mask seal (74) in the central opening, and retractors (80) attached to the resilient mask seal and adapted to move the resilient mask seal into open and closed positions;

    a motor (56) in the head to rotate the rotor;

    a push plate (58) in the head adapted to operate the retractors; and

    one or more actuators (60) in the head attached to the push plate, for moving the push plate into first and second positions, wherein with the push plate in the first position, the resilient mask seal is closed, and wherein with the push plate in the second position, the resilient mask seal is open.


     
    9. The apparatus of claim 8 further including a lift/rotate (32) attached to the head, with the lift/rotate operable to move the head into a process position wherein the head is engaged with a chamber sidewall (28) for cleaning a photo mask in the rotor, and with the lift/rotate operable to move the head into a load/unload position, below the process position, for loading and unloading a photo mask into and out of the rotor.
     
    10. The apparatus of claim 9 further including a holder (16) having pins (18) and with the holder supported on a lifter (20) and movable vertically via operation of the lifter into an up position for transferring the photo mask to the rotor while the head is in the load/unload position, and with the holder movable vertically via operation of the lifter into a down position, for receiving the photo mask from, or transferring the photo mask to, a robot.
     
    11. The apparatus of claim 9 with the head including a rotor housing (52) and further including a seal (66) on the rotor housing forming a seal against the chamber sidewall, when the head is in the process position.
     
    12. The apparatus of claim 11 further including a nozzle (38) on a swing arm (40) movable over the rotor when the head is in the process position.
     
    13. The apparatus of claim 9 further including a shaft plate (70) attached to the motor and to a seal plate (72) in the head, and with the push plate having ramps (62) moveable through openings in the shaft plate to operate the retractors.
     
    14. The apparatus of claim 13 with the resilient seal having first, second, third and fourth straight sides, and with movement of the push plate in an axial direction from the first position to the second position causing the first, second, third and fourth sides to simultaneously move outwardly by 0.5 to 5 mm.
     
    15. The apparatus of claim 9 with the resilient mask seal forming a seal against the sides of the photo mask, and with the resilient mask seal not touching the front or back surfaces of the photo mask, when the resilient mask seal is in the closed position.
     


    Ansprüche

    1. Rotor zum Halten einer Photomaske, umfassend:

    eine Dichtungsplatte (72) mit einer zentralen Öffnung;

    eine elastische Maskendichtung (74) in der zentralen Öffnung, wobei die elastische Maskendichtung erste, zweite, dritte und vierte Seiten aufweist; und

    erste, zweite, dritte und vierte Retraktoren (80) jeweils an den ersten, zweiten, dritten und vierten Seiten, wobei die ersten, zweiten, dritten und vierten Retraktoren jeder einen Retraktorrahmen (84) enthalten, der jeweils an den ersten, zweiten, dritten und vierten Seiten der elastischen Maskendichtung angebracht ist, und wobei jeder Retraktor nach außen in einer radialen Richtung zum Bewegen der elastischen Maskendichtung in eine offene Position beweglich ist, und wobei jeder Retraktor in einer radialen Richtung nach innen zum Bewegen der elastischen Maskendichtung in eine geschlossene Position beweglich ist.


     
    2. Rotor nach Anspruch 1, wobei jeder Retraktor eine Feder (86) enthält, die den Retraktorrahmen fortlaufend in die nach innen verlaufende, radiale Richtung drängt.
     
    3. Rotor nach Anspruch 1, wobei die ersten und dritten Seiten der elastischen Maskendichtung gleiche Längen aufweisen und senkrecht zu den zweiten und vierten Seiten der elastischen Maskendichtung stehen.
     
    4. Rotor nach Anspruch 3, wobei die ersten, zweiten, dritten und vierten Retraktorrahmen jeder ein inneres Ende und ein äußeres Ende aufweisen, und mit ersten, zweiten, dritten und vierten Retraktorstangen (82) jeweils am inneren Ende der ersten, zweiten, dritten und vierten Retraktorrahmen, und wobei das innere Ende von jedem Retraktor an der elastischen Maskendichtung angebracht ist, und einer Rolle (88) am äußeren Ende von jedem Retraktorrahmen, die zur Ineingriffnahme durch eine Rampe (62) geeignet ist, welche sich in einer axialen Richtung senkrecht zur radialen Richtung bewegt.
     
    5. Rotor nach Anspruch 4, ferner enthaltend eine Schaftplatte (70), die an der Dichtungsplatte angebracht ist, und wobei jeder Retraktor auf der Schaftplatte gestützt ist und auf der Schaftplatte in einer radialen Richtung nach innen und außen beweglich ist.
     
    6. Rotor nach Anspruch 5, wobei die elastische Maskendichtung einen oberen Rand (75), der an der Dichtungsplatte angebracht ist, und einen unteren Rand (85) aufweist, der an der Schaftplatte angebracht ist, und wobei sich die ersten, zweiten, dritten und vierten Retraktorstangen zwischen dem oberen Rand und dem unteren Rand der elastischen Maskendichtung befinden.
     
    7. Rotor nach Anspruch 6, ferner enthaltend eine Gasdüse (68) an einem Zentrum der Schaftplatte.
     
    8. Vorrichtung zur Reinigung einer Photomaske, umfassend:

    einen Kopf (30);

    einen Rotor (50) im Kopf, wobei der Rotor eine Dichtungsplatte (72) mit einer zentralen Öffnung, eine elastische Maskendichtung (74) in der zentralen Öffnung und Retraktoren (80) aufweist, die an der elastischen Maskendichtung angebracht sind und zum Bewegen der elastischen Maskendichtung in offene und geschlossene Positionen geeignet sind;

    einen Motor (56) im Kopf zum Drehen des Rotors;

    eine Schubplatte (58) im Kopf, die zum Betreiben der Retraktoren geeignet ist; und

    ein oder mehr Stellglieder (60) im Kopf, die an der Schubplatte angebracht sind, zum Bewegen der Schubplatte in erste und zweite Positionen, wobei, wenn die Schubplatte in der ersten Position ist, die elastische Maskendichtung geschlossen ist, und, wenn die Schubplatte in der zweiten Position ist, die elastische Maskendichtung offen ist.


     
    9. Vorrichtung nach Anspruch 8, ferner enthaltend eine Hebe-/Dreheinrichtung (32), die am Kopf angebracht ist, wobei die Hebe-/Dreheinrichtung zum Bewegen des Kopfs in eine Prozessposition betriebsfähig ist, in der der Kopf mit einer Kammerseitenwand (28) zum Reinigen einer Photomaske in dem Rotor in Eingriff steht, und wobei die Hebe-/Dreheinrichtung zum Bewegen des Kopfs in eine Lade-/Entladeposition, unterhalb der Prozessposition, zum Laden und Entladen einer Photomaske in den und aus dem Rotor betriebsfähig ist.
     
    10. Vorrichtung nach Anspruch 9, ferner enthaltend einen Halter (16) mit Stiften (18), und wobei der Halter auf einem Hebegerät (20) gestützt ist und vertikal über den Betrieb des Hebegeräts in eine Aufwärtsposition zum Überführen der Photomaske zum Rotor beweglich ist, während der Kopf in der Lade-/Entladeposition ist, und wobei der Halter vertikal über den Betrieb des Hebegeräts in eine Abwärtsposition zum Aufnehmen der Photomaske von einem oder Überführen der Photomaske zu einem Roboter beweglich ist.
     
    11. Vorrichtung nach Anspruch 9, wobei der Kopf ein Rotorgehäuse (52) enthält und ferner eine Dichtung (66) am Rotorgehäuse enthält, die eine Abdichtung an der Kammerseitenwand ausbildet, wenn der Kopf in der Prozessposition ist.
     
    12. Vorrichtung nach Anspruch 11, ferner enthaltend eine Düse (38) an einem Schwenkarm (40), der über dem Rotor beweglich ist, wenn der Kopf in der Prozessposition ist.
     
    13. Vorrichtung nach Anspruch 9, ferner enthaltend eine Schaftplatte (70), die am Motor und an einer Dichtungsplatte (72) im Kopf angebracht ist, und wobei die Schubplatte Rampen (62) aufweist, die durch Öffnungen in der Schaftplatte zum Betreiben der Retraktoren beweglich sind.
     
    14. Vorrichtung nach Anspruch 13, wobei die elastische Dichtung erste, zweite, dritte und vierte gerade Seiten aufweist, und wobei Bewegung der Schubplatte in einer axialen Richtung von der ersten Position zur zweiten Position bewirkt, dass sich die ersten, zweiten, dritten und vierten Seiten simultan um 0,5 bis 5 mm nach außen bewegen.
     
    15. Vorrichtung nach Anspruch 9, wobei die elastische Maskendichtung eine Abdichtung an den Seiten der Photomaske ausbildet, und wobei die elastische Maskendichtung die Rück- oder Vorderfläche der Photomaske nicht berührt, wenn die elastische Maskendichtung in der geschlossenen Position ist.
     


    Revendications

    1. Rotor pour tenir un masque photographique, comprenant :

    une plaque de joint (72) ayant une ouverture centrale ;

    un joint de masque résilient (74) dans l'ouverture centrale, le joint de masque résilient ayant des premier, deuxième, troisième et quatrième côtés ; et

    des premier, deuxième, troisième et quatrième rétracteurs (80) sur les premier, deuxième, troisième et quatrième côtés, respectivement, les premier, deuxième, troisième et quatrième rétracteurs incluant chacun un cadre de rétracteur (84) fixé aux premier, deuxième, troisième et quatrième côtés du joint de masque résilient, respectivement, et chaque rétracteur étant mobile vers l'extérieur dans une direction radiale pour déplacer le joint de masque résilient jusqu'à une position ouverte, et chaque rétracteur étant mobile dans une direction radiale vers l'intérieur pour déplacer le joint de masque résilient jusqu'à une position fermée.


     
    2. Rotor de la revendication 1, chaque rétracteur incluant un ressort (86) qui pousse de manière continue le cadre de rétracteur dans la direction radiale vers l'intérieur.
     
    3. Rotor de la revendication 1, les premier et troisième côtés du joint de masque résilient ayant des longueurs égales et étant perpendiculaires aux deuxième et quatrième côtés du joint de masque résilient.
     
    4. Rotor de la revendication 3, les premier, deuxième, troisième et quatrième cadres de rétracteur ayant chacun une extrémité intérieure et une extrémité extérieure, et avec des première, deuxième, troisième et quatrième barrettes de rétracteur (82) à l'extrémité intérieure des premier, deuxième, troisième et quatrième cadres de rétracteur, respectivement, et l'extrémité intérieure de chaque barrette de rétracteur étant fixée au joint de masque résilient, et un galet (88) à l'extrémité extérieure de chaque cadre de rétracteur, adapté pour un engagement par une rampe (62) se déplaçant dans une direction axiale perpendiculaire à la direction radiale.
     
    5. Rotor de la revendication 4, incluant en outre une plaque de tige (70) fixée à la plaque de joint, et chaque rétracteur étant supporté sur la plaque de tige et mobile sur la plaque de tige dans une direction radiale vers l'intérieur et vers l'extérieur.
     
    6. Rotor de la revendication 5, le joint de masque résilient ayant un rebord supérieur (75) fixé à la plaque de tige et un rebord inférieur (85) fixé à la plaque de tige, et les première, deuxième, troisième et quatrième barrettes de rétracteur se trouvant entre le bord supérieur et le bord inférieur du joint de masque résilient.
     
    7. Rotor de la revendication 6, incluant en outre une buse de gaz (68) à un centre de la plaque de tige.
     
    8. Appareil pour nettoyer un masque photographique, comprenant :

    une tête (30) ;

    un rotor (50) dans la tête, le rotor ayant une plaque de joint (72) ayant une ouverture centrale, un joint de masque résilient (74) dans l'ouverture centrale, et des rétracteurs (80) fixés au joint de masque résilient et adaptés pour déplacer le joint de masque résilient jusqu'à des positions ouvertes et fermées ;

    un moteur (56) dans la tête pour faire tourner le rotor ;

    une plaque de poussée (58) dans la tête, adaptée pour faire fonctionner les rétracteurs ; et

    un ou plusieurs actionneurs (60) dans la tête, fixés à la plaque de poussée, pour déplacer la plaque de poussée jusqu'à des première et deuxième positions, dans lequel avec la plaque de poussée dans la première position, le joint de masque résilient est fermé, et dans lequel avec la plaque de poussée dans la deuxième position, le joint de masque résilient est ouvert.


     
    9. Appareil de la revendication 8, incluant en outre un mécanisme de soulèvement/rotation (32) fixé à la tête, le mécanisme de soulèvement/rotation étant apte à déplacer la tête jusqu'à une position de traitement dans laquelle la tête est engagée avec une paroi latérale de chambre (28) pour nettoyer un masque photographique dans le rotor, et le mécanisme de soulèvement/rotation étant apte à déplacer la tête jusqu'à une position de chargement/déchargement, au-dessous de la position de traitement, pour charger un masque photographique dans le rotor et le décharger de celui-ci.
     
    10. Appareil de la revendication 9, incluant en outre un support (16) ayant des broches (18), et le support étant supporté sur un mécanisme de soulèvement (20) et mobile verticalement via le fonctionnement du mécanisme de soulèvement jusqu'à une position haute pour transférer le masque photographique dans le rotor tandis que la tête est dans la position de chargement/déchargement, et le support étant mobile verticalement via le fonctionnement du mécanisme de soulèvement jusqu'à une position basse, pour recevoir le masque photographique depuis un robot ou le transférer dans celui-ci.
     
    11. Appareil de la revendication 9, la tête incluant un boîtier de rotor (52) et incluant en outre un joint (66) sur le boîtier de rotor, formant une étanchéité contre la paroi latérale de chambre quand la tête est dans la position de traitement.
     
    12. Appareil de la revendication 11, incluant en outre une buse (38) sur un bras oscillant (40) mobile au-dessus du rotor quand la tête est dans la position de traitement.
     
    13. Appareil de la revendication 9, incluant en outre une plaque de tige (70) fixée au moteur et à une plaque de joint (72) dans la tête, et la plaque de poussée ayant des rampes (62) mobiles à travers des ouvertures dans la plaque de tige pour faire fonctionner les rétracteurs.
     
    14. Appareil de la revendication 13, le joint résilient ayant des premier, deuxième, troisième et quatrième côtés rectilignes, et le déplacement de la plaque de poussée dans une direction axiale de la première position à la deuxième position faisant se déplacer les premier, deuxième, troisième et quatrième côtés simultanément de 0,5 à 5 mm vers l'extérieur.
     
    15. Appareil de la revendication 9, le joint de masque résilient formant une étanchéité contre les côtés du masque photographique, et le joint de masque résilient ne touchant pas les surfaces avant ou arrière du masque photographique quand le joint de masque résilient est dans la position fermée.
     




    Drawing




















    Cited references

    REFERENCES CITED IN THE DESCRIPTION



    This list of references cited by the applicant is for the reader's convenience only. It does not form part of the European patent document. Even though great care has been taken in compiling the references, errors or omissions cannot be excluded and the EPO disclaims all liability in this regard.

    Patent documents cited in the description