(19)
(11)EP 3 444 376 A3

(12)EUROPEAN PATENT APPLICATION

(88)Date of publication A3:
26.06.2019 Bulletin 2019/26

(43)Date of publication A2:
20.02.2019 Bulletin 2019/08

(21)Application number: 18189051.8

(22)Date of filing:  14.08.2018
(51)International Patent Classification (IPC): 
C23C 16/40(2006.01)
C23C 16/517(2006.01)
C23C 16/455(2006.01)
H01J 37/32(2006.01)
(84)Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME
Designated Validation States:
KH MA MD TN

(30)Priority: 14.08.2017 KR 20170103137

(71)Applicant: Samsung Display Co., Ltd.
Gyeonggi-do 17113 (KR)

(72)Inventors:
  • KO, Dong Kyun
    Gyeonggi-Do (KR)
  • KIM, Woo Jin
    Gyeonggi-Do (KR)
  • KIM, In Kyo
    Gyeonggi-Do (KR)
  • PARK, Keun Hee
    Seoul (KR)
  • JUNG, Suk Won
    Sejong-si (KR)

(74)Representative: Taor, Simon Edward William 
Venner Shipley LLP 200 Aldersgate
London EC1A 4HD
London EC1A 4HD (GB)

  


(54)METHOD FOR FORMING METAL OXIDE LAYER, AND PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION DEVICE


(57) A method and a device for forming a highly dielectric metal oxide layer. The method includes repeatedly causing a plasma-off period and a plasma-on period while an organic metal compound and an oxidizing agent are continuously injected into a chamber. One cycle includes one plasma-off period and one plasma-on period. During the plasma-off period, a physical and chemical adsorption layer including an organic metal compound and a plurality of atomic layers is formed on a substrate. During the plasma-on period, a metal oxide layer that is thicker than two atomic layers is formed by a chemical reaction of metal atoms in the physical and chemical adsorption layer and oxygen atoms in the oxidizing agent.







Search report
























Search report