(19)
(11)EP 4 235 277 A3

(12)EUROPEAN PATENT APPLICATION

(88)Date of publication A3:
06.09.2023 Bulletin 2023/36

(43)Date of publication A2:
30.08.2023 Bulletin 2023/35

(21)Application number: 23169552.9

(22)Date of filing:  22.05.2018
(51)International Patent Classification (IPC): 
G02F 1/035(2006.01)
G02F 1/365(2006.01)
(52)Cooperative Patent Classification (CPC):
G02F 1/035
(84)Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

(62)Application number of the earlier application in accordance with Art. 76 EPC:
18920077.7 / 3798718

(71)Applicant: NGK Insulators, Ltd.
Nagoya-shi, Aichi 467-8530 (JP)

(72)Inventors:
  • TAI, Tomoyoshi
    Nagoya-shi, 467-8530 (JP)
  • KONDO, Jungo
    Nagoya-shi, 467-8530 (JP)

(74)Representative: Müller-Boré & Partner Patentanwälte PartG mbB 
Friedenheimer Brücke 21
80639 München
80639 München (DE)

  


(54)COMPOSITE SUBSTRATE FOR ELECTRO-OPTICAL ELEMENT AND METHOD FOR MANUFACTURING SAME


(57) A composite substrate for an electro-optic element is disclosed. The composite substrate includes: an electro-optic crystal substrate having an electro-optic effect; a support substrate bonded to the electro-optic crystal substrate at least via an amorphous layer; and a low-refractive-index layer located between the electro-optic crystal substrate and the amorphous layer and having a lower refractive index than the electro-optical crystal substrate. The amorphous layer is constituted of one or more elements that constitute a layer or a substrate contacting the amorphous layer from one side and one or more elements that constitute a layer or a substrate contacting the amorphous layer from another side and has a thickness of 0.1 nanometer or more and 100 nanometers or less.





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