Description | Claims | Drawing |
JP04128379A | [0012] |
USRE34861E | [0020] |
US4946547A | [0020] |
US5200022A | [0020] |
Semiconductors and Semimetals | [0002] |
Highly Uniform Growth on a Low-Pressure MOPVE Multiple Wafer System | [0007] |
Modeling of Chimney CVD Reactors | [0009] |
MOCVD in Inverted Stagnation Point Flow | [0011] |