Description     Claims     Drawing  

US6312768B1   [0004] 
US6552301B2   [0005] 
US60818289B   [0008] 
DE4229399A1   [0009] 
US7113327B   [0054] 
US437057A   [0054] 
US11798114B   [0081] 
US20080187864A   [0081] 

Cluster emission under femtosecond laser ablation of silicon   [0003]  [0004] 
Synthesis of nanoparticles with femtosecond laser pulses   [0003] 
Generation of silicon nanoparticles via femtosecond laser ablation in vacuum   [0003] 
Ultrafast ablation with high pulse rate lasers, Part I: Theoretical considerations   [0004] 
Ultrafast ablation with high pulse rate lasers, Part II: Experiments on laser deposition of amorphous carbon films   [0004] 
Picosecond high repetition rate pulsed laser ablation of dielectric: the effect of energy accumulation between pulses   [0004] 
Pulsed laser deposition with a high average power free electron laser: Benefits of subpicosecond pulses with high repetition rate   [0007] 
Nanoparticle generation in ultrafast pulsed laser ablation of nickel   [0008] 
Molecular-dynamics study of ablation of solids under femtosecond laser pulses   [0071] 
Femtosecond laser ablation of nickel in vacuum   [0071] 
Propagation of a femtosecond pulsed laser ablation plume into a background atmosphere   [0071] 
Anatase TiO2 thin films grown on lattice-matched LaAlO3 substrate by laser molecular-beam epitaxy   [0082] 
A transparent metal: Nb-doped anatase TiO   [0084]