Abstract     Description     Claims     Drawing  

US5376409A   [0010] 
US5451260A   [0010] 
US20030056728A   [0012] 
US20040079286A   [0013] 

MOCVD of very thin films of lead lanthanum titanata   [0010] 
Structure stability of metallorganic chemical vapor deposited (Ba, Sr)RuO3 electrodes for integration of high dielectric constant thin films   [0010] 
Metallorganic CVD of high-quality PZT thin films at low temperature with new Zr and Ti precursors having mmp ligands   [0010] 
Atomic layer deposition (ALD) of Bismuth Titanium oxide thin films using direct liquid injection (DLI) method   [0011]