Abrégé     Description     Revendications     Dessins  

Metallic Source and Drain Module for FDSOI MOSFETs Applications   [0003] 
Alternative process for thin layer etching :Application to nitride spacer etching stopping on silicon germanium   [0048] 
Advanced characterizations of fluorine-free tungsten film and its application as low résistance liner for PCRAM   [0079]