Abstract  Description  Claims  Drawing  Search report  Cited references 

US5660895A   [0007] 
US7019159B   [0008] 
US7064083B   [0008] 
US8153832B   [0009] 
US20090209081A   [0010] 
US7077904B   [0011] 
US20130109155A   [0012] 
US7446217B   [0013] 
US7531679B   [0013] 
US7713346B   [0013] 
US7786320B   [0013] 
US7887883B   [0013] 
US7910765B   [0013] 

Disilanyl-amines - Compounds Comprising the Structure Unit Si-Si-N, as Single-Source Precursors for Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) of Silicon Nitride   [0005] 
1,2-Disilanediyl Bis(triflate), F3CSO3-SiH2-SiH2-O3SCF3, as the Key Intermediate for a Facile Preparation of Open-Chain and Cyclic 1,1- and 1,2-Diaminodisilanes   [0006] 
CHEMICAL ABSTRACTS   [0013] 
CHEMICAL ABSTRACTS   [0013] 
CHEMICAL ABSTRACTS   [0013] 
Inorg. Chem.   [0091]