(19)
(11) EP 0 491 182 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
17.02.1993 Bulletin 1993/07

(43) Date of publication A2:
24.06.1992 Bulletin 1992/26

(21) Application number: 91119964.4

(22) Date of filing: 22.11.1991
(51) International Patent Classification (IPC)5: G03D 5/00, G03D 5/04
(84) Designated Contracting States:
DE FR GB IT

(30) Priority: 17.12.1990 US 628052

(71) Applicant: EASTMAN KODAK COMPANY
Rochester, New York 14650-2201 (US)

(72) Inventors:
  • Hall, Douglas Oliver, c/o EASTMAN KODAK COMPANY
    Rochester, New York 14650 - 2201 (US)
  • Muller, Bruce Robert, c/o EASTMAN KODAK COMPANY
    Rochester, New York 14650 - 2201 (US)

(74) Representative: Blickle, K. Werner, Dipl.-Ing. et al
KODAK AKTIENGESELLSCHAFT Patentabteilung
70323 Stuttgart
70323 Stuttgart (DE)


(56) References cited: : 
   
       


    (54) Processor for photosensitive material with laminar fluid flow wick


    (57) A processor for photosensitive material provides a processing fluid to a processing chamber (52) while the photosensitive material is advanced through the chamber. The processing fluid is drained from the chamber and passes through a chute (88,90) as it is returned to a sump for recirculation to the processing chamber. A laminar fluid flow wick (92,94) located in the chute avoids air entrapment that would be caused by fluid freely flowing through the chute.






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