(19)
(11) EP 0 565 006 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
23.02.1994 Bulletin 1994/08

(43) Date of publication A2:
13.10.1993 Bulletin 1993/41

(21) Application number: 93105536.2

(22) Date of filing: 02.04.1993
(51) International Patent Classification (IPC)5B41N 3/03
(84) Designated Contracting States:
DE GB NL

(30) Priority: 06.04.1992 JP 84181/92

(71) Applicant: FUJI PHOTO FILM CO., LTD.
Kanagawa-ken (JP)

(72) Inventor:
  • Takamiya, Shuichi, c/o FUJI PHOTO FILM CO., LTD.
    Haibara-gun, Shizuoka-ken (JP)

(74) Representative: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät 
Maximilianstrasse 58
80538 München
80538 München (DE)


(56) References cited: : 
   
       


    (54) Method for preparing PS plate


    (57) A method for preparing a PS plate comprises the steps of treating an anodized aluminum plate with an aqueous solution of an alkali metal silicate having a pH ranging from 10 to 13 as determined at 25 °C, then treating the aluminum plate with an aqueous solution of an acid having a pH ranging from 1 to 6 and applying a light-sensitive layer onto the aluminum plate thus treated. The aluminum substrate of the PS plate is only slightly dissolved in an alkaline developer and this accordingly prevents the formation of insoluble compounds or sludge effectively, during development.





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