| (19) |
 |
|
(11) |
EP 0 565 006 A3 |
| (12) |
EUROPEAN PATENT APPLICATION |
| (88) |
Date of publication A3: |
|
23.02.1994 Bulletin 1994/08 |
| (43) |
Date of publication A2: |
|
13.10.1993 Bulletin 1993/41 |
| (22) |
Date of filing: 02.04.1993 |
|
| (51) |
International Patent Classification (IPC)5: B41N 3/03 |
|
| (84) |
Designated Contracting States: |
|
DE GB NL |
| (30) |
Priority: |
06.04.1992 JP 84181/92
|
| (71) |
Applicant: FUJI PHOTO FILM CO., LTD. |
|
Kanagawa-ken (JP) |
|
| (72) |
Inventor: |
|
- Takamiya, Shuichi,
c/o FUJI PHOTO FILM CO., LTD.
Haibara-gun,
Shizuoka-ken (JP)
|
| (74) |
Representative: Grünecker, Kinkeldey,
Stockmair & Schwanhäusser
Anwaltssozietät |
|
Maximilianstrasse 58
80538 München
80538 München (DE) |
|
| |
|
| (54) |
Method for preparing PS plate |
(57) A method for preparing a PS plate comprises the steps of treating an anodized aluminum
plate with an aqueous solution of an alkali metal silicate having a pH ranging from
10 to 13 as determined at 25 °C, then treating the aluminum plate with an aqueous
solution of an acid having a pH ranging from 1 to 6 and applying a light-sensitive
layer onto the aluminum plate thus treated. The aluminum substrate of the PS plate
is only slightly dissolved in an alkaline developer and this accordingly prevents
the formation of insoluble compounds or sludge effectively, during development.