(19)
(11) EP 1 439 563 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
11.07.2007 Bulletin 2007/28

(43) Date of publication A2:
21.07.2004 Bulletin 2004/30

(21) Application number: 04000787.4

(22) Date of filing: 15.01.2004
(51) International Patent Classification (IPC): 
H01J 9/48(2006.01)
H01J 9/24(2006.01)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
Designated Extension States:
AL LT LV MK

(30) Priority: 16.01.2003 JP 2003007793

(71) Applicant: NGK INSULATORS, LTD.
Nagoya-City, Aichi Pref. 467-8530 (JP)

(72) Inventor:
  • Aoki, Michiro
    Nagoya-city Aichi-prefecture, 467-8530 (JP)

(74) Representative: TBK-Patent 
Bavariaring 4-6
80336 München
80336 München (DE)

   


(54) Heat treatment method and heat treatment furnace for plasma display panel substrate


(57) A heat treatment method for performing a uniform heat treatment on the whole substrate (22), by carrying out temperature control in such a manner that the temperatures of each of the respective heating means (14) provided in the heating chamber (25,26,27) are set at different values in the transporting direction of the object (22) to be thermally treated, and maintaining temperatures in the chamber (25,26,27) larger in deviation in temperature distribution than a target temperature distribution within the substrate (22) by using a heat treatment furnace. The furnace comprises a plurality of sectioned heating chambers (25,26,27); transporting means (20) for transporting the substrate (22) to the next heating chamber (25,26,27); and separated heating means (14) provided in each heating chamber (25,26,27) in the transporting direction; each heating means (14) being capable of separately controlling a temperature by an independent control system; and a radiant heating means for selectively heating the portion lower in atmosphere temperature.







Search report