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(11) | EP 1 693 117 A3 |
(12) | EUROPEAN PATENT APPLICATION |
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(54) | Deposition device having a thermal control system |
(57) An apparatus for depositing a material onto a substrate under thermally controlled
conditions includes an enclosure (64) defining an interior (68) and having an opening
(84), and a deposition device (10) having an orifice (12) and capable of depositing
the material (14) onto the substrate (16). The deposition device (10) is positioned
within the interior (68) and the opening (84) allows the orifice (12) to communicate
with an environment outside the enclosure (64). The apparatus further includes a thermal
control unit (66) operatively coupled with the enclosure (64). The thermal control
unit (66) includes a vortex tube (86) having an inlet (90) adapted to be coupled with
a pressurized gas supply (92), a cold gas outlet (98) in fluid communication with
the interior (68) and adapted to deliver cold gas thereto, and a hot gas outlet (100)
also in fluid communication with the interior (68) and adapted to deliver hot gas
thereto. The cold and hot gases from the vortex tube (86) are adapted to control the
temperature of the deposition device (10).
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