(19)
(11) EP 1 693 117 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
17.06.2009 Bulletin 2009/25

(43) Date of publication A2:
23.08.2006 Bulletin 2006/34

(21) Application number: 06001286.1

(22) Date of filing: 21.01.2006
(51) International Patent Classification (IPC): 
B05C 11/10(2006.01)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL BA HR MK YU

(30) Priority: 18.02.2005 US 906406

(71) Applicant: NORDSON CORPORATION
Westlake, OH 44145-1119 (US)

(72) Inventors:
  • Forti, Michael S.
    Franklin, Massachusetts 02038 (US)
  • Vivari Jr., John A.
    Greenville, Rhode Island 02828 (US)

(74) Representative: Eisenführ, Speiser & Partner 
Patentanwälte Rechtsanwälte Postfach 10 60 78
28060 Bremen
28060 Bremen (DE)

   


(54) Deposition device having a thermal control system


(57) An apparatus for depositing a material onto a substrate under thermally controlled conditions includes an enclosure (64) defining an interior (68) and having an opening (84), and a deposition device (10) having an orifice (12) and capable of depositing the material (14) onto the substrate (16). The deposition device (10) is positioned within the interior (68) and the opening (84) allows the orifice (12) to communicate with an environment outside the enclosure (64). The apparatus further includes a thermal control unit (66) operatively coupled with the enclosure (64). The thermal control unit (66) includes a vortex tube (86) having an inlet (90) adapted to be coupled with a pressurized gas supply (92), a cold gas outlet (98) in fluid communication with the interior (68) and adapted to deliver cold gas thereto, and a hot gas outlet (100) also in fluid communication with the interior (68) and adapted to deliver hot gas thereto. The cold and hot gases from the vortex tube (86) are adapted to control the temperature of the deposition device (10).







Search report