X-RAY GENERATION DEVICE AND METHOD, AND SAMPLE MEASUREMENT SYSTEM

Abstract

 Provided are: an X-ray generating device, an X-ray generating method, and a sample measurement system which have an extremely simple device configuration and are capable of selectively generating a linear or dot-like X-ray beam.
The X-ray generating device (10) comprises an electron generator (24) and a rotating anticathode (26) which are fixed arranged in a positional relationship in which an electron source (32) and a circumferential surface portion (38) face one another while a rotation axis (36) is tilted with respect to a first direction (Z direction) and a second direction (X direction).

Description

TECHNICAL FIELD

[0001] The present invention relates to an X-ray generating device and an X-ray generating method for generating X-rays using a so-called rotating anticathode style, and a sample measurement system including the X-ray generating device.

BACKGROUND ART

[0002] Conventionally, in the field of measurement, the method configured to generate selectively a linear or dot-like X-ray beam by irradiating an electron beam onto the outer circumferential surface of a rotating anticathode and forming long focal spots in a circumferential direction or a width direction has been known(See Patent Document 1).

PRIOR ART DOCUMENT

Patent Document

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 1994-020629 (FIG. 1, FIG. 6, etc.)

SUMMARY OF THE INVENTION

Problem to be Solved by the Invention

[0004] From the viewpoint of usability at the time of measurement, it is desirable to realize improvement in output performance and improvement in working efficiency with a device that selectively generates a linear or dot-like X-ray beam with as simple a device configuration as possible.

[0005] The present disclosure has been made in view of the above problems, and an object of the present disclosure is to provide an X-ray generating device, an X-ray generating method, and a sample measurement system method which are capable of selectively generating a linear or dot-like X-ray beam while having an extremely simple device configuration.

Means for Solving the Problem

[0006] According to a first aspect of the present invention, there is provided an "X-ray generating device" comprising: an electron generator having an electron source for emitting a linear electron beam, and a switching mechanism switching an extending direction of the electron source to either one of a first direction and a second direction perpendicular to the first direction while fixing a center position of the electron source; and a rotating anticathode with a disk shape or a columnar shape, having a circumferential surface portion being impinged by the electron beam from the electron source and emitting X-ray beams and configured to be rotatable about a rotation axis; wherein the electron generator and the rotating anticathode are fixedly arranged in a positional relationship in which the electron source and the circumferential surface portion face each other and the rotation axis is tilted with respect to the first direction and the second direction.

[0007] In this manner, since the switching mechanism is provided for switching the extension direction of the electron source to either one of the first direction and the second direction perpendicular to the first direction while fixing the center position of the electron source, and the electron generator and the rotating anticathode are fixedly arranged in the positional relationship in which the electron source and the circumferential surface portion face each other, a linear or dot-like X-ray beam can be selectively generated by simply switching the extending direction of the electron source without changing positions and attitudes of the electron generator and the rotating anticathode.

[0008] Further, since the rotating anticathode is in the positional relationship in which its rotation axis is tilted with respect to the first direction and the second direction, for two focal spots formed by emissions of the electron beams from the first direction and the second direction, a divergence amount of focal lengths traversing in a circumferential direction is smaller than when the rotation axis is not tilted. That is, instead of lowering the output efficiency on the highest side, by raising the output efficiency on the lowest side, the maximum amount (that is, the limit output amount of X-rays) that can be commonly output to both of the X-ray beams is raised.

[0009] Thus, it is possible to selectively generate a linear or dot-like X-ray beam while maintaining a very simple device configuration, and to improve the output performance of the entire device.

[0010] Further, it is preferable that the rotation axis be tilted within a range of 30 to 60 degrees with respect to the first direction. This makes it possible to suppress the divergence amount of the focal lengths traversing in the circumferential direction, more specifically the ratio of the focal lengths to less than about twice in general, thereby further reducing the gap between the output performances of both.

[0011] In addition, it is preferable that the rotation axis be tilted by 45 degrees with respect to the first direction. Since the focal lengths traversing in the circumferential direction become equal, the limit output amount common to both of the X-ray beams is maximized.

[0012] According to the first aspect of the present invention, there is also provided an "X-ray generation method" using an X-ray generation device,
the device comprising an electron generator having an electron source emitting a linear electron beam; and a rotating anticathode with a disk shape or a columnar shape, having a circumferential surface portion being impinged by the electron beam from the electron source and emitting X-ray beams and configured to be rotatable about a rotation axis;
the method comprising the steps of: fixedly arranging the electron generator and the rotating anticathode in a positional relationship in which the electron source and the circumferential surface portion face each other and the rotation axis is tilted with respect to a first direction and a second direction perpendicular to the first direction; and switching an extending direction of the electron source to either one of the first direction and the second direction while fixing a center position of the electron source.

[0013] According to the first aspect of the present invention, there is further provided a "sample measurement system" comprising: any one of the X-ray generating devices described above; an X-ray detecting device for detecting X-ray beams generated from the X-ray generating device and transmitted through or reflected a sample; and a measuring means for measuring a physical quantity relating to the sample, based on a detected amount of the X-ray beams detected by the X-ray detecting device.

[0014] According to a second aspect of the present invention, there is provided an "X-ray generating device" comprising: an electron generator configured to include an electron source for emitting a linear electron beam; a rotating anticathode configured to include a circumferential surface portion being impinged by the electron beam from the electron source and emitting X-ray beams; and a chamber housing the electron source and the rotating anticathode; wherein the electron generator and the rotating anticathode are fixedly arranged in the chamber in a positional relationship in which the electron source and the circumferential surface portion face each other, the electron generator comprising: a support base for supporting the electron source; and a rotation introducing mechanism being airtightly inserted and passed within the chamber and rotates the support base in accordance with an operation from the outside of the chamber.

[0015] In this manner, since the rotation introducing mechanism for rotating the support base for supporting the electron source in accordance with an operation from the outside of the chamber is provided, it is not necessary to replace the electron generator or the rotating anticathode and it is possible to change the extending direction of the electron source while maintaining the vacuum state within the chamber. Thus, it is possible to selectively generate a linear or dot-like X-ray beam with a simple device configuration, and to suppress deterioration of working efficiency due to this selection.

[0016] Further, it is preferable that the rotation introducing mechanism has a handle portion rotatably arranged outside the chamber, and the support base is rotated in accordance with an operation of rotating the handle portion. The operator can easily change the extending direction of the electron source by rotating the handle portion.

[0017] Also, it is preferable that the rotation introducing mechanism further includes an indication means for indicating rotating states of the handle portion in a visible way from the outside of the chamber. The operator can grasp the rotating state of the handle portion and the extending direction of the electron source at a glance by visually confirming a position indicated by the indicating means from the outside of the chamber.

[0018] In addition, it is preferable that the rotation introducing mechanism further includes rotation restricting means restricting a range of rotation of the handle portion. Thereby, it is possible to prevent the driven parts of the electron source from being excessively twisted and damaged.

[0019] In addition, the rotation introducing mechanism is capable of changing the extending position of the electron source to a first direction and a second direction perpendicular to the first direction by an operation of rotating the support base, and a rotation axis of the rotating anticathode is tilted with respect to the first direction and the second direction. Regarding two focal spots formed by emissions of the electron beams from the first direction and the second direction, a divergence amount of focal lengths traversing in a circumferential direction is smaller than when the rotation axis is not tilted. That is, instead of lowering the output efficiency on the highest side, by raising the output efficiency on the lowest side, the maximum amount (that is, the limit output amount of X-rays) that can be outputted in common with both of the X-ray beams is raised.

[0020] According to a second aspect of the present invention, there is further provided a "sample measurement system" comprising: any one of the X-ray generating devices described above; an X-ray detecting device for detecting X-ray beams generated from the X-ray generating device and transmitted through or reflected by a sample; and a measuring means for measuring a physical quantity relating to the sample, based on a detected amount of the X-ray beams detected by the X-ray detecting device.

Effect of the Invention

[0021] According to the X-ray generating device and method and the sample measurement system of the present invention, it is possible to selectively generate a linear or dot-like X-ray beam while maintaining a very simple device configuration, and to improve the output performance and the work efficiency of the entire device.

BRIEF DESCRIPTION OF THE DRAWINGS

[0022] 

FIG. 1 is a perspective view of an X-ray generating device according to this embodiment.

FIG. 2 is a cross-sectional view taken along line II - II of FIG. 1.

FIG. 3 is a cross-sectional view taken along line III - III in FIG. 1.

FIG. 4 is a schematic view showing shapes of X-ray beams according to a switching operation between a first direction and a second direction.

FIG. 5 is a schematic view showing a formation position of a focal spot at a tilt angle of 0 degrees.

FIG. 6 is a schematic view showing a formation position of a focal spot at a tilt angle of 45 degrees.

FIG. 7 is a graph showing a relationship between a tilt angle and a circumferential focal length.

FIG. 8 is an overall configuration view of a sample measurement system incorporating the X-ray generating device of FIG. 1.

FIG. 9 is a perspective view of an X-ray generating device according to a second embodiment.

FIG. 10 is a cross-sectional view taken along line II - II of FIG. 9.

FIG. 11 is a side view of the X-ray generating device shown in FIG. 9.

FIG. 12 is a cross-sectional view taken along line IV - IV of FIG. 9.

FIG. 13 is a schematic view showing shapes of X-ray beams according to a switching operation between a first direction and a second direction.

FIG. 14 is a graph showing a relationship between a tilt angle and a circumferential focal length.

FIG. 15 is an overall configuration view of a sample measurement system incorporating the X-ray generating device of FIG. 9.

DETAILED DESCRIPTION OF EMBODIMENTS

[0023] For an X-ray generating device according to the present disclosure, embodiments preferred in relation to an X-ray generating method and a sample measurement system will be described below with reference to the accompanying drawings.

<First Embodiment>

[Configuration of X-ray Generating Device 10]

[0024] FIG. 1 is a perspective view of an X-ray generating device 10 according to a first embodiment, FIG. 2 is a sectional view taken along line II - II of FIG. 1, and FIG. 3 is a sectional view taken along line III - III of FIG. 1. For convenience of explanation, in these FIGS. 1 to 3, three axis directions (X direction, Y direction, and Z direction) indicating a three dimensional orthogonal coordinate system are defined.

[0025] As shown in FIG. 1, the X-ray generating device 10 is a device for generating X-rays using a so-called rotating anticathode system. The outward appearance is such that, the X-ray generating device 10 has a substantially rectangular chamber 12 made of a metal material having a low X-ray transmittance. In one corner portion on the side of one surface 14 of the chamber 12, a recessed portion 16 recessed in a triangular column shape is formed.

[0026] A circular opening portion 18 is provided on an tilted surface 17 forming the recessed portion 16 and a window portion 22 in which a beryllium thin film having a high X-ray transmittance is inserted is provided on an opposing surface 20 which faces the one surface 14. By mounting the lid portion 46 at a position covering the opening portion 18, an airtight state is maintained inside the chamber 12.

[0027] As shown in FIGS. 2 and 3, the X-ray generating device 10 includes an electron generator 24 configured to generate an linear electron beam B1, a rotating anticathode 26 having a disk shape or a columnar shape, and a cooling mechanism (not shown) configured to cool the rotating anticathode 26. The electron generator 24 and the rotating anticathode 26 are housed in a fixed state in a room 28 of the chamber 12, respectively.

[0028] The electron generator 24 is a thermoelectron type, electric field emission type, or Schottky type electron gun, and will be described by taking as an example the thermoelectron type. Specifically, the electron generator 24 includes a main body 30 having a substantially rectangular shape, an electron source 32 made of tungsten filament or the like, and a switching mechanism 34 for switching an extending direction of the electron source 32 to a plurality of directions. For example, it is noted that the main body portion 30 has a floating structure (not shown), and the electron source 32 is electrically insulated from the chamber 12.

[0029] The switching mechanism 34 has a disc portion which is rotatable around a rotation axis along the Y direction and to which the electron source 32 is fixed. In other words, the switching mechanism 34 rotates the disk portion integrally with the electron source 32, thereby making it possible to switch the extending direction of the electron source 32 to the X direction or Z Direction while fixing a center position O (FIG. 2) of the electron source 32.

[0030] The rotating anticathode 26 is configured to be rotatable in the A direction around the rotating axis 36 at a speed of, for example, 5000 to 12000 rpm. The rotating anticathode 26 has a circumferential surface portion 38 covered with a metal layer of molybdenum (Mo), copper (Cu) or the like, and a side surface portion 40 to which a rotation mechanism 42 of the rotating anticathode 26 is mounted.

[0031] The rotation mechanism 42 is configured to include a cylindrical axis portion 44 configured to pivotally support the rotating anticathode 26 and a disk-shaped lid portion 46 provided on the side of one end of the axis portion 44. The lid portion 46 has a main surface with a diameter larger than the opening portion 18 and is detachable at a position covering the opening portion 18 from the outside of the chamber 12.

[0032] As understood from FIG. 2, the rotating anticathode 26 is fixedly arranged under a positional relationship in which the rotation axis 36 is tilted with respect to the X direction and the Z direction. That is, when an angle formed by the radial direction of the rotating anticathode 26 and the Z direction is defined as "tilt angle ϕ" (0 ≦ ϕ ≦ 90, unit: degree), the relationship 0 <ϕ <90 is satisfied. In this embodiment, in particular, ϕ = 45 degrees is satisfied.

[0033] As understood from FIG. 3, since the electron source 32 and the circumferential surface portion 38 are in a positional relationship facing each other, a linear focal spot (first focal spot 51) by the electron beam B1 from the electron source 32 is formed on the circumferential surface portion 38. When a specific generation condition is satisfied at the time of collision of the electron beam B1, the circumferential surface portion 38 emits the X-ray beam B2 from the position of the first focal spot 51 or a nearby position thereof. As will be described later, the shape of the X-ray beam B2 emitted to the outside of the chamber 12 changes in accordance with the geometric relationship between the linear focal spot and the window 22.

[Operation of X-ray Generating Device 10]

[0034] Subsequently, the operation of the X-ray generating device 10 according to the first embodiment will be described with reference to the respective views in FIGS. 1 to 3 and the schematic view in FIG. 4.

(1) Fixed-Arrangement Step

[0035] First, a user places the electron generator 24 and the rotating anticathode 26 within the room 28 of the chamber 12, and then mounts the lid portion 46 at a position covering the opening 18. Thereby, the electron generator 24 and the rotating anticathode 26 are fixedly arranged in the positional relationship in which the electron source 32 and the circumferential surface portion 38 face each other and the rotation axis 36 is tilted with respect to the first direction and the second direction.

[0036] The first direction and the second direction are orthogonal to each other and cross respectively with a direction (that is, the Y direction) separating the electron source 32 from the circumferential surface portion 38. Here, the first direction corresponds to the "Z direction" and the second direction corresponds to the "X direction."

(2) Switching Step

[0037] The switching mechanism 34 switches the extending direction of the electron source 32 according to the user's selection operation. Specifically, when it is desired to use a linear X-ray beam B2 (see FIG. 4), the extending direction of the electron source 32 is switched to the "first direction," and when it is desired to use a dot-like X-ray beam B3 (see FIG. 4), the extending direction of the electron source 32 is switched to the "second direction."

(3) Generating Step

[0038] A vacuum pump (not shown) is used to evacuate the interior of the chamber 28 and the rotating anticathode 26 is rotated in the A direction at a predetermined speed. After various preparations for satisfying the X-ray generation conditions are completed, the electron generator 24 generates the linear electron beam B1 according to the user's operation instruction. As a result, the X-ray beams B2, B3 are emitted to the outside of the X-ray generating device 10 via the window section 22.

[0039] FIG. 4 is a schematic view showing the shapes of the X-ray beams B2, B3 according to the switching operation between the first direction and the second direction. According to the extending direction of the electron source 32 (FIGS. 2 and 3), the first focal spot 51 curved along the first direction or a second focal spot 52 curved along the second direction is selectively formed.

[0040] In the former case, the circumferential surface portion 38 emits the X-ray beam B2 from the position of the first focal spot 51 of linear shape on which the electron beam B1 is incident. At this time, since the first focal spot 51 is in a relationship substantially parallel with the plane formed by the window section 22, the linear X-ray beam B2 is emitted.

[0041] In the latter case, the circumferential surface portion 38 emits the X-ray beam B3 from the position of the second focal spot 52 of linear shape on which the electron beam B1 is incident. At this time, since the second focal spot 52 is in a relationship substantially perpendicular to the plane formed by the window section 22, the dot-like X-ray beam B3 is emitted.

[0042] As described above, the electron generator 24 is provided with the switching mechanism 34 for switching the extending direction of the electron source 32, and the electron generator 24 and the rotating anticathode 26 are fixedly arranged in a positional relationship in which the electron source 32 and the circumferential surface portion 38 face each other. Thus, by simply switching the extension direction of the electron source 32 without changing the positions/attitudes of the electron generator 24 and the rotating anticathode 26 at all, the linear or dot-like X-ray beam B2, B3 can be selectively generated.

[Effects of X-Ray Generating Device 10]

[0043] Subsequently, the effect of the X-ray generating device 10 will be described in detail with reference to FIGS. 5 to 7.

[0044] FIG. 5 is a schematic view showing a formation position of a focal spot at a tilt angle ϕ of 0 degree (ϕ = 0). More specifically, FIG. 5 (a) is a projection view of the first focal spot 51 formed on the circumferential surface portion 38 as viewed from the Y direction, and FIG. 5 (b) is a projection view showing the second focal spot 52 formed on the circumferential surface portion 38 as viewed from the Y direction.

[0045] As shown in FIG. 5 (a), the first focal spot 51 has a rectangular shape having a width of W [mm] and a height of H [mm] (H> W) in a plan view from the Y direction. A line segment 53 shown by a broken line corresponds to a focal length traversed in a circumferential direction. Hereinafter, the length of the line segment 53 at the first focal spot 51 is referred to as "circumferential focal length L1." In the example of this figure, since the height direction of the first focal spot 51 coincides with the circumferential direction of the circumferential surface portion 38, L1 = H [mm].

[0046] As shown in FIG. 5 (b), the second focal spot 52 has substantially the same shape as the first focal spot 51 shown in FIG. 5 (a) in a plan view from the Y direction. Hereinafter, the length of the line segment 53 at the second focal spot 52 is referred to as "circumferential focal length L2." In the example of this figure, since a width direction of the second focal spot 52 coincides with the circumferential direction of the circumferential surface portion 38, L2 = W [mm].

[0047] With respect to this X-ray generation method, as the circumferential focal lengths L1, L2 become larger, the thermal load received by the rotating anticathode 26 tends to increase. As the thermal load increases, the metal provided on the circumferential surface portion 38 becomes more difficult to cool, so there is a phenomenon whereby the output efficiency of the X-ray decreases. That is, in FIG. 5 (a), the output efficiency is relatively low because L1 is large, and in FIG. 5 (b), the output efficiency is relatively high since L2 is small. From the viewpoint of usability at the time of measurement, it is not preferable that a difference in output efficiency occurs due to the selection of the X-ray beams B2, B3.

[0048] FIG. 6 is a schematic view showing a formation position of a focal spot at a tilt angle ϕ of 45 degrees (ϕ = 45). More specifically, FIG. 6 (a) is a projection view of the first focal spot 51 formed on the circumferential surface portion 38 as viewed from the Y direction, and FIG. 6 (b) is a projection view showing the second focal spot 52 formed on the circumferential surface portion 38 as viewed from the Y direction.

[0049] As shown in FIG. 6 (a), the first focal spot 51 has substantially the same shape as the first focal spot 51 shown in FIG. 5 (a) in a plan view from the Y direction. In the example of this figure, since the height direction of the first focal spot 51 is tilted by 45 degrees with respect to the circumferential direction of the circumferential surface portion 38, L1= √2·W [mm].

[0050] As shown in FIG. 6 (b), the second focal spot 52 has substantially the same shape as the second focal spot 52 shown in FIG. 5 (a) in a plan view from the Y direction. In the example of this figure, since the width direction of the second focal spot 52 is tilted by 45 degrees with respect to the circumferential direction of the circumferential surface portion 38, L2=√2·W [mm].

[0051] FIG. 7 is a graph showing a relationship between the tilt angle ϕ and the circumferential focal lengths L1, L2. The horizontal axis of the graph is the tilt angle ϕ (unit: degree), and the vertical axis of the graph is the circumferential focal lengths L1, L2 (unit: mm). In addition, the solid line shows a function of L1 and the alternate long and short dash line shows a function of L2.

[0052] As understood from this figure, the circumferential focal length L1 satisfies L1 = H [mm] when ϕ = 0 degree and L1 = W [mm] when ϕ = 90 degrees and monotonically decreases as the tilt angle ϕ increases. On the other hand, the circumferential focal length L2 satisfies L2 = W [mm] when ϕ = 0 degree and L2 = H [mm] when ϕ = 90 degrees, and monotonically decreases as the tilt angle ϕ increases.

[0053] That is, when the tilt angle ϕ satisfies ϕ = 0 degree or ϕ = 90 degrees, the value of |L1-L2| is maximized and when the tilt angle ϕ is set within the range of 0 < ϕ <90, the value of |L1-L2| becomes relatively small. It should be noted that the relationship of L1 = W/sin < ϕ and L2 = W/cos ϕ holds in the vicinity of ϕ = 45 degrees.

[0054] In the first embodiment, since the rotating anticathode 26 is in the positional relationship (0 <ϕ <90) in which the rotation axis 36 is tilted with respect to the first direction and the second direction, a divergence amount |L1-L2| of the circumferential focal lengths L1, L2 with respect to the first focal spot 51 and the second focal spot 52 formed by emissions of the electron beams B1 from the first direction and the second direction is smaller than when the rotation axis 36 is not tilted (ϕ = 0, 90). That is, by increasing the output efficiency on the lowest side instead of lowering the output efficiency on the highest side, the maximum amount (that is, the limit output amount of X-rays) that can be outputted in common to both of the X-ray beams B2, B3 is raised.

[0055] Further, the rotation axis 36 may be in a positional relationship (30 ≦ ϕ ≦ 60) in which the rotation axis 36 is tilted within a range of 30 to 60 degrees with respect to the first direction. This makes it possible to suppress the ratio (L1/L2 or L2/L1) of the circumferential focal lengths L1, L2 to approximately less than twice in general, thereby further reducing the gap between the output performances of both.

[0056] In addition, the rotation axis 36 may be in a positional relationship (ϕ = 45) in which the rotation axis 36 is tilted by 45 degrees with respect to the first direction. In this case, since the circumferential focal lengths are equal as L1 = L2 = √2 · W [mm], the limit output amount common to both of the X-ray beams B2, B3 is maximized.

[0057] As described above, the X-ray generating device 10 includes: [1] the electron generator 24 having the electron source 32 for emitting the linear electron beam B1, and the switching mechanism 34 for switching the extending direction of the electron source 32 to either one of the first direction (Z direction) or the second direction (X direction) while fixing the center position O of the electron source 32, [2] the rotating anticathode 26 which is a disk shape or a columnar shape, having the circumferential surface portion 38 for emitting the X-ray beams B2, B3 with the electron beam B1 impinged, and configured to be rotatable about the rotation axis 36. The electron generator 24 and the rotating anticathode 26 are fixedly arranged in the positional relationship in which the electron source 32 and the circumferential surface portion 38 face each other and the rotational axis 36 is tilted with respect to the first direction and the second direction.

[0058] The X-ray generating method using the X-ray generating device 10 includes the steps of: fixedly arranging the electron generator 24 and the rotating anticathode 26, and switching the extending direction of the electron source 32 to either one of the first direction or the second direction.

[0059] Thereby, it is possible to selectively generate the linear or dot-like X-ray beam B2, B3 while maintaining a very simple device configuration, and to improve the output performance of the entire device. For example, when the aspect ratio of the electron source 32 is H/W = 10, assuming that the thermal load in FIG. 5 (a) is the reference (100%), the thermal loads in FIGS. 5 (b), 6(a) and 6 (b) are estimated to be 32%, 84% and 84%, respectively. That is, by adopting the configuration of FIG. 6, although there is a loss of 16% compared to the maximum value, a similar high gain can be obtained.

[Configuration Example of Sample Measurement System 100]

[0060] Subsequently, a sample measurement system 100 incorporating the X-ray generating device 10 will be described with reference to FIG. 8. Here, an "X-ray diffraction apparatus" will be described as an example, but it is not limited to this configuration and measurement method.

[0061] The sample measurement system 100 includes the X-ray generating device 10 for generating the X-ray beams B2, B3, an X-ray detection device 102 for detecting the X-ray beams B2, B3 reflected from a sample S, a goniometer 104 for setting angles in θ1 and θ2 directions, and a controller 106 (measuring means) for controlling each portion.

[0062] The goniometer 104 includes a first arm 110 for grasping the X-ray generating device 10, a θ1 rotation mechanism 112 for rotating the first arm 110 in the θ1 direction, a second arm 114 for grasping a detector 126 of the X-ray detection device 102, and a rotation mechanism 116 for rotatingly driving the second arm 114 in the θ2 direction.

[0063] A sample table 118 for placing the sample S to be measured is fixedly arranged at the center of rotation of the first arm 110 and the second arm 114. A divergence slit 120 and the X-ray generating device 10 are fixed to the first arm 110 sequentially outward from the center of rotation. To the second arm 114, a scattering slit 122, a light receiving slit 124, and the detector 126 are fixed in order from the center of rotation toward the outside. In the case of using a focusing method, the positions of the first focal spot 51 and the light receiving slit 124 are adjusted so as to exist on a single circular orbit C, as shown in the drawing.

[0064] The X-ray detection device 102 includes the detector 126 for outputting detection signals corresponding to intensities of the X-ray beams B2, B3, and a detection circuit 128 for obtaining detected amounts of the X-ray beams B2, B3 based on the detection signals from the detector 126. The detector 126 is configured to include a single X-ray detection element or an X-ray detection element array arranged in a linear or planar manner.

[0065] The controller 106 controls the θ1 rotation mechanism 112 and θ2 rotation mechanism 116 to place the X-ray generating device 10, the sample S and the detector 126 under a proper positional relationship. In this measurement example, the first arm 110 and second arm 114 are set to the same angle (θ1 = θ2).

[0066] The controller 106 controls the X-ray generating device 10 to emit the electron beam B1 (FIG. 3) and to generate the X-ray beams B2, B3. The controller 106, based on the setting angle of the goniometer 104 and the detected amounts of the X-ray beams B2, B3 reflected by the sample S, measures a physical quantity related to the sample S. The output device 130, in response to an output instruction from the controller 106, outputs a measurement result of the sample S, including the lattice spacing, diffraction intensity, Miller indices, lamination cycle, stress, and identified material name.

[0067] Depending on a combination of type, property or physical quantity to be measured of the sample S, any one of the linear or dot-like X-ray beams B2, B3 is selected. The user adjusts the X-ray optical system which is suitable for the selected beam shape, in particular, replaces the divergence slit 120, the scattering slit 122 or the light receiving slit 124. Thereafter, the controller 106, in response to an operation of the user, transmits the instruction signal to rotate the electron source 32 to the switching mechanism 34. Accordingly, the extending direction of the electron source 32 is switched automatically and a desired X-ray measurement can be performed. Instead of the above configuration, the extending direction of the electron source 32 may be switched manually by a user.

[0068] As described above, the sample measurement system 100 includes the X-ray generating device 10 described above, the X-ray detection device for detecting the X-ray beams B2, B3 generated from the X-ray generating device 10 and transmitted through or reflected by the sample S, and the controller 106 (measuring means) for measuring a physical quantity relating to the sample S on the basis of the detected amounts of the detected X-ray beams B2, B3. Thus, without performing the adjustment on the X-ray generating device 10, the X-ray measurement of switching the shape of the X-ray beam B2, B3 in a timely manner can be performed.

<Second Embodiment>

[Configuration of X-ray Generating Device 1010]

[0069] FIG. 9 is a perspective view of an X-ray generating device 1010 according to a second embodiment, FIG. 10 is a sectional view taken along line II-II of FIG. 9, FIG. 11 is a side view of the X-ray generating device 1010 shown in FIG. 9, and FIG. 12 is a sectional view taken along line IV-IV of FIG. 9. For convenience of explanation, in these FIGS. 9 to 12, three axis directions (X direction, Y direction, and Z direction) indicating a three dimensional orthogonal coordinate system are defined.

[0070] As shown in FIG. 9, the X-ray generating device 1010 is a device for generating X-rays using a so-called rotating anticathode system. The X-ray generating device 1010 has a substantially rectangular chamber 1012 made of a metal material having a low X-ray transmittance.

[0071] A circular first opening portion 1016 is provided on the side of a first surface 1014 of the chamber 1012. In one corner portion on the side of a second surface 1018 of the chamber 1012, a recessed portion 1020 recessed in a triangular column shape is formed. A circular second opening portion 1024 is provided on an tilted surface 1022 forming the recessed portion 1020, and a window 1028 in which a beryllium thin film having a high X-ray transmittance is inserted is provided on a third surface 1026 which faces the second surface 1018.

[0072] By inserting an electron generator 1030 through the first opening portion 1016, and mounting a lid portion 1032 in a position to cover the second opening portion 1024, an airtight state is maintained inside a room 1034 (FIGS. 10 and 12) of the chamber 1012. The electron generator 1030 is a thermoelectron type, electric field emission type, or Schottky type electron gun, and will be described by taking as an example the thermoelectron type.

[0073] As shown in FIG. 10, the electron generator 1030 includes an electron source 1036 for emitting a linear electron beam B1, a columnar-shape supporting base 1038 for supporting the electron source 1036, a holding portion 1040 for holding the support base 1038, a rotation introducing mechanism 1042 for introducing a rotating movement from the outside of the chamber 1012, and a housing case 1044 for accommodating components required for various operations of the electron generator 1030. The necessary components include, for example, a power supply of a heater for heating the electron source 1036 and a high-pressure introducing portion for introducing a high voltage into the chamber 1012.

[0074] The electron source 1036 made of, for example, tungsten filament, has a coil shape extending in one direction. The holding portion 1040 which is substantially cylindrical is made of an insulating material comprising ceramic. Thus, the electron source 1036, in a state electrically insulated from the chamber 1012, is disposed within the room 1034.

[0075] The rotation introducing mechanism 1042 is a mechanism for introducing a rotating movement along a T direction, around an axis of the cathode side (hereinafter, cathode axis Ac), and is connected to the base end side of the holding portion 1040. Thus, the rotation introducing mechanism 1042 integrally rotates the holding portion 1040 and the supporting base 1038, and it is capable of changing the extending direction of the electron source 1036 while fixing a center position O (FIG. 4) of the electron source 1036.

[0076] Here, the rotation introducing mechanism 1042 is capable of changing the extending direction of the electron source 1036 by an operation of rotating the support base 1038 to either one of the first and second directions. While the first direction corresponds to the "Z direction," the second direction corresponds to the "X direction." In this case, the first and second directions are orthogonal to each other and also perpendicular to the cathode axis Ac (Y-direction), respectively.

[0077] Specifically, the rotation introducing mechanism 1042 includes a rotating axis portion 1046 of which one end side is connected to the holding portion 1040, a columnar-shape sealing portion 1047 which seals the first opening portion 1016, a connecting flange 1048 for connecting the chamber 1012, and a handle portion 1050 engaged with the other end of the rotating axis portion 1046.

[0078] At the outer circumferential wall of the sealing portion 1047 is provided an O-ring (not shown), and low pressure air in chamber 1034 is prevented from flowing out by the O-ring. The connecting flange 1048 which has a main surface of a large diameter compared to the first opening portion 1016, is detachable at a position covering the first opening portion 1016 from the outside of the chamber 1012. The handle portion 1050, according to the rotating movement along the T direction, gives a rotating force with respect to the rotating axis portion 1046 by a bellows or magnetic coupling.

[0079] As shown in FIG. 11, as viewed from the side of the first surface 1014, in order from those having a smaller diameter, the housing case 1044, the handle portion 1050 and the connecting flange 1048 are coaxially arranged. On the side surface of the handle portion 1050 which is an annular shape, a linear first protrusion 1052 (indicating means) that extends and protrudes radially is formed. On the side of the connecting flange 1048 which is an annular shape, two marks 1054, 1055 are formed.

[0080] The mark 1054 comprises "L" in the alphabet, and a single short line arranged on the lower side of the "L." The mark 1055 comprises "P" in the alphabet, and a single short line arranged on the left side of the "P." Further, on the outer circumferential surface of the housing case 1044, a second protrusion 1056 (rotation restricting means) in the vicinity of the marks 1054, and a second protrusion 1057 in the vicinity of the mark 1055 (rotation restricting means) are formed, respectively.

[0081] As shown in FIGS. 10 and 12, the X-ray generating device 1010, in addition to the chamber 1012 and the electron generator 1030, further includes a rotating anticathode 1060 which is a disk shape or a columnar shape, and a cooling mechanism (not shown) for cooling the rotating anticathode 1060.

[0082] The rotating anticathode 1060 is configured to be rotatable in a R direction around an axis of the anode side (hereinafter, anode axis Aa) at a speed of, for example, 5000 to 12000 rpm. The rotating anticathode 1060 has a circumferential surface portion 1062 covered with a metal layer of molybdenum (Mo), copper (Cu) or the like, and a side surface portion 1064 to which a rotation mechanism 1066 of the rotating anticathode 1060 is mounted.

[0083] The rotation mechanism 1066 is configured to include a cylindrical rotation axis portion 1068 for axially supporting the rotating anticathode 1060 and a disk-shaped lid portion 1032 provided on the side of one end of the rotation axis portion 1068 (FIG. 9). The lid portion 1032 has a main surface with a diameter larger than the second opening portion 1024 and is detachable at a position covering the second opening portion 1024 from the outside of the chamber 1012.

[0084] As understood from FIG. 12, the rotating anticathode 1060 is fixedly arranged under a positional relationship in which the anode axis Aa is tilted with respect to the X direction and the Z direction. That is, when an angle formed by the radial direction of the rotating anticathode 1060 and the Z direction is defined as "tilt angle ϕ" (0 ≦ ϕ ≦ 90, unit: degree), the relationship 0 <ϕ <90 is satisfied. In this embodiment, in particular, ϕ = 45 degrees is satisfied.

[0085] As understood from FIG. 10 and FIG. 12, since the electron source 1036 and the circumferential surface portion 1062 are in a positional relationship in which they face each other, a linear focal spot (first focal spot 1071) is formed on the circumferential surface portion 1062 by the electron beam B1 from the electron source 1036. When a specific generation condition is satisfied at the time of collision of the electron beam B1, the circumferential surface portion 1062 emits the X-ray beam B2 from the position of the first focal spot 1071 or a nearby position thereof. As will be described later, the shape of the X-ray beam B2 emitted to the outside of the chamber 1012 varies in accordance with the geometric relationship between the linear focal spot and the window 1028.

[Operation of X-ray Generating Device 1010]

[0086] Subsequently, the operation of the X-ray generating device 1010 according to the second embodiment will be described with reference to the respective views in FIGS. 9 to 12 and the schematic view in FIG. 13.

(1) Fixed-Arrangement Step

[0087] The user, while grasping the connecting flange 1048 of the electron generator 1030, inserts the electron source 1036 through the first opening portion 1016 into the chamber 1012. Then, the user mounts the connecting flange 1048 at a predetermined position on the first surface 1014 (that is, a position for covering the first opening portion 1016). Thereby, the electron source 1036 is fixedly arranged in the chamber 1012.

[0088] In addition, the user, while grasping the lid portion 1032, inserts the rotating anticathode 1060 through the second opening portion 1024 into the chamber 1012. Then, the user mounts the lid portion 1032 at a predetermined position on the tilted surface 1022 (that is, a position for covering the second opening portion 1024). Thereby, the rotating anticathode 1060 is fixedly arranged in the chamber 1012.

[0089] Thus, the airtight state is maintained in the room 1034 of the chamber 1012. Further, it is noted that the electron source 1036 and the circumferential surface portion 1062 face each other, and that the anode axis Aa is in a positional relationship in which it is tilted with respect to the first direction (Z direction) and second direction (X direction).

(2) Setting Step

[0090] The user sets the shape of the X-ray beam B2, B3 by rotating the handle portion 1050 along the T direction. More specifically, by aligning the first protrusion 1052 on the position of the mark 1054 ("L" means "Line"), with the support base 1038 interlocked with the handle portion 1050, the extending direction of the electron source 1036 is set to "the first direction." In contrast, by aligning the first protrusion 1052 on the position of the mark 1055 ("P" means "Point"), with the support base 1038 interlocked with the handle portion 1050, the extending direction of the electron source 1036 is set to "the second direction."

[0091] Thus, the rotation introducing mechanism 1042 may adopt a structure in which it has the handle portion 1050 that is disposed rotatably in the outside of the chamber 1012, and in which the support base 1038 is rotated in accordance with an operation of rotating the handle portion 1050. By rotating the handle portion 1050, it is possible for an operator to easily change the extending direction of the electron source 1036.

[0092] Further, an indicating means (specifically, the first protrusion 1052) for indicating the rotating state of the handle portion 1050 to be visible from the outside of the chamber 1012 may be provided on the rotation introducing mechanism 1042. By viewing a position indicated by the first protrusion 1052 from the outside of the chamber 1012, the rotating state of the handle portion 1050 and the extending direction of the electron source 1036 can be grasped at a glance by the operator.

[0093] Further, the marks 1054, 1055 indicating the relationship between the rotating position of the handle portion 1050 and the shape of the X-ray beam B2, B3 may be provided to a member (the connecting flange 1048 or the housing case 1044) different from the handle portion 1050. Accordingly, a target position of the rotating operation becomes clear, and it is convenient for the operator.

(3) Generating Step

[0094] A purging operation by a vacuum pump (not shown) is performed to evacuate the interior of the chamber 1034 and the rotating anticathode 1060 is rotated in the R direction at a predetermined speed. After various preparations for satisfying the X-ray generation conditions are completed, the electron generator 1030 generates a linear electron beam B1 according to the operation indicated by the user.

[0095] FIG. 13 is a schematic view showing the shapes of the X-ray beams B2, B3 according to the switching operation between the first direction and the second direction. According to the extending direction of the electron source 1036 (FIGS. 10 and 12), the first focal spot 1071 curved along the first direction or a second focal spot 1072 curved along the second direction is selectively formed.

[0096] In the former case, the circumferential surface portion 1062 emits the X-ray beam B2 from the position of the first focal spot 1071 of linear shape on which the electron beam B1 is incident. At this time, since the first focal spot 1071 is in a relationship substantially parallel with the plane formed by the window 1028, the linear X-ray beam B2 is emitted.

[0097] In the latter case, the circumferential surface portion 1062 emits the X-ray beam B3 from the position of the second focal spot 1072 of linear shape on which the electron beam B1 is incident. At this time, since the second focal spot 1072 is in a relationship substantially perpendicular to the plane formed by the window 1028, the dot-like X-ray beam B3 is emitted.

(4) Changing Step

[0098] According to the same operating procedure as the above "setting step," the user changes the shape of the X-ray beam B2, B3 to "the linear shape from the dot-like shape" or "the dot-like shape from the linear shape." By adopting the configuration in which the support base 1038 can be rotated in accordance with the operation (specifically, the operation of the handle portion 1050) from the outside of the chamber 1012, the extending direction of the electron source 1036 can be changed without replacing the electron generator 1030 or the rotating anticathode 1060.

[0099] Since the second protrusions 1056, 1057 are arranged on an orbit of the first protrusion 1052, an operation of rotating the first protrusion 1052 is permitted only within the interval of the second protrusions 1056,1057 (here, within the rotation range of 90 degrees). Thus, the rotation restricting means (specifically, the second protrusions 1056, 1057) for restricting the rotation range of the handle portion 1050 may be provided on the rotation introducing mechanism 1042. Thus, the driven parts of the electron source 1036 can be prevented from being damaged excessively twisted.

[Effects of X-ray Generating Device 1010]

[0100] As described above, the X-ray generating device 1010 includes [1] the electron generator 1030 configured to include the electron source 1036 which emits the linear electron beam B1, [2] the rotating anticathode 1060 configured to include the circumferential surface portion 1062 which emits the X-ray beams B2, B3 with the electron beam B1 from the electron source 1036 impinged, and [3] the chamber 1012 housing the electron source 1036 and the rotating anticathode 1060.

[0101] Further, the electron generator 1030 and the rotating anticathode 1060 are fixedly arranged in the chamber 1012 in a position relationship in which the electron source 1036 and the circumferential surface portion 1062 face each other, and the electron generator 1030 includes the support base 1038 which supports the electron source 1036 and the rotation introducing mechanism 1042 which is airtightly inserted and passed within the chamber 1012, and which rotates the support base 1038 in response to an operation from outside the chamber 1012.

[0102] Thus, since the rotation introducing mechanism 1042 to rotate the support base 1038 supporting the electron source 1036 in accordance with an operation from the outside of the chamber 1012 is provided, it is not necessary to replace the electron generator 1030 or the rotating anticathode 1060, so that the extending direction (first direction/second direction) of the electron source 1036 can be switched while maintaining the vacuum state within the chamber 1012. Thus, it is possible to selectively generate a linear or dot-like X-ray beam B2, B3 with an extremely simple device configuration, and to suppress deterioration of working efficiency due to this selection.

[0103] Further, the rotation introducing mechanism 1042 is capable of changing the extending direction of the electron source 1036 by the operation of rotating the support base 1038 in first and second directions, and the anode axis Aa of the rotating anticathode 1060 may be tilted with respect to the first direction and the second direction. The effects obtained by this configuration will be described. Hereinafter, it is assumed that each of the first focal spot 1071 and the second focal spot 1072 (FIG. 13) has, in a plan view, a rectangular shape having a width of W [mm] and a height of H [mm] (H>W). Also, if a focal length across the circumferential direction of the circumferential surface portion 1062 is defined as a "circumferential focal length," circumferential focal lengths of the first focal spot 1071 and the second focal spot 1072 are L1 and L2, respectively.

[0104] Figure 14 is a graph showing a relationship between the tilt angle ϕ and the circumferential focal lengths L1, L2. The horizontal axis of the graph is the tilt angle ϕ: (unit: degree), and the vertical axis of the graph is the circumferential focal length L1, L2 (unit: mm). In addition, the solid line shows a function of L1 and the alternate long and short dash line shows a function of L2.

[0105] As understood from this figure, the circumferential focal length L1 satisfies L1 = H [mm] when ϕ = 0 degree and L1 = W [mm] when ϕ = 90 degrees and monotonously decreases as the tilt angle ϕ increases. On the other hand, the circumferential focal length L2 satisfies L2 = W [mm] when ϕ = 0 degree and L2 = H [mm] when ϕ = 90 degrees, and monotonically increases as the tilt angle ϕ increases.

[0106] That is, when the tilt angle ϕ satisfies ϕ = 0 degree or ϕ = 90 degrees, the value of |L1-L2| is maximized and when the tilt angle ϕ is set within the range of 0 <ϕ <90, the value of |L1-L2| becomes relatively small. It should be noted that the relationship of L1 = W/sin ϕ and L2 = W/cos ϕ holds in the vicinity of ϕ = 45 degrees.

[0107] In the second embodiment, since the rotating anticathode 1060 is in the positional relationship (0 <ϕ <90) in which the anode axis Aa is tilted with respect to the first direction and the second direction, a divergence amount |L1-L2| of the circumferential focal lengths L1, L2 with respect to the first focal spot 1071 and the second focal spot 1072 formed by emissions of the electron beams B1 from the first direction and the second direction is smaller than when the anode axis Aa is not tilted (ϕ = 0, 90).

[0108] That is, by increasing the output efficiency on the lowest side instead of lowering the output efficiency on the highest side, the maximum amount (that is, the limit output amount of X-rays) that can be outputted in common to both of the X-ray beams B2, B3 is raised. In particular, if the anode axis Aa is tilted by 45 degrees with respect to the first direction (ϕ = 45), since the circumferential focal lengths are equal as L1 = L2 = √2 · W [mm], the limit output amount common to both of the X-ray beams B2, B3 is maximized.

[0109] [Configuration Example of Sample Measurement System 1100] Subsequently, a sample measurement system 1100 incorporating the above X-ray generating device 1010 will be described with reference to FIG. 15. Here, an "X-ray diffraction apparatus" will be described as an example, but is not limited to this configuration and measurement method.

[0110] The sample measurement system 1100 includes the X-ray generating device 1010 generating the X-ray beams B2, B3, an X-ray detection device 1102 detecting the X-ray beams B2, B3 reflected from a sample S, a goniometer 1104 setting angles in θ1 and θ2 directions, and a controller 1106 (measuring means) controlling each portion.

[0111] The goniometer 1104 includes a first arm 1110 grasping the X-ray generating device 1010, a θ1 rotation mechanism 1112 rotatingly driving the first arm 1110 in the θ1 direction, a second arm 1114 grasping a detector 1126 of the X-ray detection device 1102, and a rotation mechanism 1116 rotatingly driving the second arm 1114 in the θ2 direction.

[0112] A sample table 1118 placing the sample S to be measured is fixedly arranged at the center of rotation of the first arm 1110 and the second arm 1114. A divergence slit 1120 and the X-ray generating device 1010 are fixed to the first arm 1110 sequentially outward from the center of rotation. In the second arm 1114, a scattering slit 1122, a light receiving slit 1124, and the detector 1126 are fixed in order from the center of rotation toward the outside. When using a Bragg-Brentano parafocusing method, the positions of the first focal spot 1051 and the light receiving slit 1124 are adjusted so as to exist on a single circular orbit C, as shown in the drawing.

[0113] The X-ray detection device 1102 includes the detector 1126 outputting detection signals corresponding to intensities of the X-ray beams B2, B3, and a detection circuit 1128 obtaining detected amounts of the X-ray beams B2, B3 based on the detection signals from the detector 1126. The detector 1126 is configured to include a single X-ray detection element or an X-ray detection element array arranged in a linear or planar manner.

[0114] The controller 1106 controls the θ1 rotation mechanism 1112 and θ2 rotation mechanism 1116 to place the X-ray generating device 1010, the sample S and the detector 1126 under a proper positional relationship. In this measurement example, the first arm 1110 and second arm 1114 are set to the same angle (θ1 = 02).

[0115] The controller 1106 controls the X-ray generating device 1010 to emit the electron beam B1 (FIG. 3) and to generate the X-ray beams B2, B3. The controller 1106, based on the setting angle of the goniometer 1104 and the detected amounts of the X-ray beams B2, B3 reflected by the sample S, measures a physical quantity related to the sample S. The output device 1130, in response to an output instruction from the controller 1106, outputs a measurement result of the sample S, including the lattice spacing, diffraction intensity, Miller indices, lamination cycle, stress, and identified material name.

[0116] Depending on a combination of type, property or physical quantity to be measured of the sample S, any one of the linear or dot-like X-ray beams B2, B3 is selected. The user adjusts the X-ray optical system which is suitable for the selected beam shape, in particular, replaces the divergence slit 1120, the scattering slit 1122 or the light receiving slit 1124. The user further rotates the handle portion 1050 in the T direction. Accordingly, the extending direction of the electron source 1036 is switched manually, and the desired X-ray measurement can be performed. Instead of the above configuration, it may be configured that the controller 1106 transmits an instruction signal toward the X-ray generating device 1010, and the handle portion 1050 is driven by using an actuator not shown to switch the extending direction of the electron source 1036 automatically.

[0117] As described above, the sample measurement system 1100 includes the X-ray generating device 1010 described above, the X-ray detection device 1102 detecting the X-ray beams B2, B3 generated from the X-ray generating device 1010 and transmitted through or reflected by the sample S, and the controller 1106 (measuring means) measuring a physical quantity relating to the sample S on the basis of the detected amounts of the detected X-ray beams B2, B3. Thus, while maintaining the vacuum state in the chamber 1012, the X-ray measurement of switching the shape of the X-ray beam B2, B3 in a timely manner can be performed.

[0118] Further, in the second embodiment, the handle portion 1050 (FIG. 11) is constituted by a rotating handle, but, instead of this, it may be a crank handle which is arranged rotatably at the outside of the chamber 1012.

[0119] In the second embodiment, the indicating means is constituted by one first protrusion 1052 (Fig. 11), but if it has a configuration in which the extending direction of the electron source 1036 which is not visible can be grasped from the outside of the chamber 1012, it does not matter what the form of the indicating means is. For example, an indication line may be printed on the side of the handle portion 1050 or the indicating means may be provided in a separate component from the handle portion 1050.

[0120] In the second embodiment, the rotation restricting means is constituted by two second protrusions 1056,1057 (FIG. 11), but if it has a configuration in which a rotating range of less than 360 degrees can be arbitrarily set, it does not matter what the form of the rotation restricting means is. For example, the number of members constituting the rotation restricting means may be one, or the rotation restricting means may be provided in a separate component from the housing case 1044.

[Note]

[0121] The present invention is not intended to be limited to the embodiments described above, and it is obvious that various changes and modifications may be made without departing from the scope of the invention.

DESCRIPTION OF REFERENCE NUMERALS

[0122] 

10, 1010 X-ray generating device

12, 1012 chamber

22, 1028 window

24, 1030 electron generator

26, 1060 rotating anticathode

28, 1034 room

32, 1036 electron source

34 switching mechanism

36 rotation axis

38, 1062 circumferential surface portion

42 rotation mechanism

51, 1071 first focal spot

52, 1072 second focal spot

53 line segment

100, 1100 sample measurement system

102, 1102 X-ray detection device

104, 1104 goniometer

106, 1106 controller (measuring means)

1016 first opening portion

1024 second opening portion

1038 support base

1040 holding portion

1042 rotation introducing mechanism

1044 housing case

1046 rotating axis portion

1047 sealing portion

1048 connecting flange

1050 handle portion

1052 first protrusion (instruction unit)

1054, 1055 mark

1056, 1057 second protrusion (rotation restricting means)

1064 side surface portion

Aa anode axis (rotation axis)

Ac cathode axis (rotation axis)

B1 electron beam

B2, B3 X-ray beam

L1, L2 circumferential focal length

S sample

Claims

1. An X-ray generating device (10) comprising:

an electron generator (24) having an electron source (32) emitting a linear electron beam (B1), and a switching mechanism (34) switching an extending direction of the electron source (32) to either one of a first direction and a second direction perpendicular to the first direction while fixing a center position of the electron source (32); and

a rotating anticathode (26) with a disk shape or a columnar shape, having a circumferential surface portion (38) being impinged by the electron beam (B1) from the electron source (32) and emitting X-ray beams (B2; B3), and configured to be rotatable about a rotation axis (36);

wherein the electron generator (24) and the rotating anticathode (26) are fixedly arranged in a positional relationship in which the electron source (32) and the circumferential surface portion (38) face each other and the rotation axis (36) is tilted with respect to the first direction and the second direction.

2. The X-ray generating device (10) according to claim 1, wherein the rotation axis (36) is tilted within a range of 30 to 60 degrees with respect to the first direction.

3. The X-ray generating device (10) according to claim 2, wherein the rotation axis (36) is tilted by 45 degrees with respect to the first direction.

4. An X-ray generating method using a device (10),
the device (10) comprising:

an electron generator (24) having an electron source (32) emitting a linear electron beam (B1); and

a rotating anticathode with a disk shape or a columnar shape, having a circumferential surface portion (38) being impinged by the electron beam (B1) from the electron source (32) and emitting X-ray beams (B2, B3) and configured to be rotatable about a rotation axis (36);

the method comprising the steps of:

fixedly arranging the electron generator (24) and the rotating anticathode (26) in a positional relationship in which the electron source (32) and the circumferential surface portion (38) face each other and the rotation axis (36) is tilted with respect to a first direction and a second direction perpendicular to the first direction; and

switching an extending direction of the electron source (32) to either one of the first direction and the second direction while fixing a center position of the electron source (32).

5. A sample measurement system (100) comprising:

an X-ray generating device (10) according to any one of claims 1 to 3;

an X-ray detecting device (102) detecting X-ray beams (B2, B3) generated from the X-ray generating device (10) and transmitted through or reflected by a sample; and

a measuring means measuring a physical quantity relating to the sample, based on detected amounts of the X-ray beams (B2, B3) detected by the X-ray detecting device (102).

6. An X-ray generating device (1010) comprising:

an electron generator (1030) configured to include an electron source (1036) emitting a linear electron beam (B1);

a rotating anticathode (1060) configured to include a circumferential surface portion (1062) being impinged by the electron beam (B1) from the electron source (1036) and emitting X-ray beams (B2; B3); and

a chamber (1012) housing the electron source (1036) and the rotating anticathode (1060);

wherein the electron generator (1030) and the rotating anticathode (1060) are fixedly arranged in the chamber (1012) in a positional relationship in which the electron source and the circumferential surface portion (1062) face each other,

the electron generator (1030) comprising:

a support base (1038) supporting the electron source (1036); and

a rotation introducing mechanism (1042) being airtightly inserted and passed within the chamber (1012) and rotates the support base (1038) in accordance with an operation from the outside of the chamber (1012).

7. The X-ray generating device (1010) according to claim 6, wherein the rotation introducing mechanism (1042) includes a handle portion (1050) rotatably arranged outside the chamber (1012), and rotates the support base (1038) in accordance with an operation of rotating the handle portion (1050).

8. The X-ray generating device (1010) according to claim 7, wherein the rotation introducing mechanism (1042) further includes an indication means (1052) indicating rotating states of the handle portion (1050) in a visible way from the outside of the chamber (1012).

9. The X-ray generating device (1010) according to claim 7 or 8, wherein the rotation introducing mechanism (1042) further includes a rotation restricting means (1056, 1057) restricting a rotation range of the handle portion (1050).

10. The X-ray generating device according to any one of claims 6 to 10,
wherein the rotation introducing mechanism (1042) is capable of changing an extension direction of the electron source to a first direction and a second direction perpendicular to the first direction by an operation of rotating the support base (1038), and
wherein a rotation axis (Aa, Ac) of the rotating anticathode (1060) is tilted with respect to the first direction and the second direction.

11. A sample measurement system (1100) comprising:

an X-ray generating device (1010) according to any one of claims 6 to 10;

an X-ray detecting device (1102) detecting X-ray beams (B2, B3) generated from the X-ray generating device (1010) and transmitted through or reflected by a sample (S); and

a measuring means (1106) measuring a physical quantity relating to the sample (S), based on detected amounts of the X-ray beams (B2, B3) detected by the X-ray detecting device (1102).

Drawing