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(11) |
EP 0 000 995 B1 |
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EUROPEAN PATENT SPECIFICATION |
| (45) |
Mention of the grant of the patent: |
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16.12.1981 Bulletin 1981/50 |
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Date of filing: 11.08.1978 |
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International Patent Classification (IPC)3: G03D 13/00 |
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Apparatus and method for the controlled processing of radiation sensitive devices
in dependence upon the temperature of the developer liquid
Apparat und Verfahren zur kontrollierten Behandlung von strahlungsempfindlichen Vorrichtungen
in Abhängigkeit von der Entwicklertemperatur
Appareil et procédé pour le traitement controlé de dispositifs sensibles aux radiations
en fonction de la température du liquide de développement
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| (84) |
Designated Contracting States: |
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BE CH DE FR LU NL SE |
| (30) |
Priority: |
18.08.1977 GB 3479677 02.03.1978 GB 840278 26.05.1978 GB 3479677
|
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Date of publication of application: |
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07.03.1979 Bulletin 1979/05 |
| (71) |
Applicant: Vickers Limited |
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London SW1P 4HA (GB) |
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| (72) |
Inventor: |
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- Lawson, Leslie Edward
Surbiton
Surrey (GB)
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| (74) |
Representative: Overbury, Richard Douglas et al |
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Haseltine Lake & Co.,
Imperial House,
15-19 Kingsway London WC2B 6UD London WC2B 6UD (GB) |
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| |
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| Note: Within nine months from the publication of the mention of the grant of the European
patent, any person may give notice to the European Patent Office of opposition to
the European patent
granted. Notice of opposition shall be filed in a written reasoned statement. It shall
not be deemed to
have been filed until the opposition fee has been paid. (Art. 99(1) European Patent
Convention).
|
[0001] This invention relates to the processing of radiation sensitive devices comprising
a radiation sensitive coating on a substrate and is concerned with the processing
of such devices using an apparatus comprising a container for developer liquid and
a means for contacting the devices with the liquid.
[0002] Such radiation sensitive devices are used in the production of, for example, printing
plates, in particular lithographic printing plates printed circuits; and integrated
circuits. Radiation sensitive devices for use in the production of lithographic printing
plates usually consist of a substrate in the form of a metallic support sheet, which
is mechanically and/or chemically treated to provide a suitable working surface and
which carries the radiation sensitive coating. In use, the device is image-wise exposed
to actinic radiation using either a negative or a positive transparency of an appropriate
subject. The effect of actinic radiation is to alter the solubility of the radiation-sensitive
coating. The image-wise exposed device is then processed. The processing step involves
contacting the image-wise exposed device with a developer liquid to selectively dissolve
unwanted areas of coating from the support sheet to leave an image constituted by
the areas of the coating remaining on the support sheet. Other types of printing plates
and printed and integrated circuits are produced in a similar manner.
[0003] The negative or positive transparency commonly comprises a silver halide layer which
forms and provides a line image or a half-tone image or a continuous tone image, or
any combination of such images. Of the numerous radiation sensitive coatings that
can be used for the devices, poly(vinyl cinnamate) and diazo resins are typical of
those that can be used in conjunction with negative transparencies, whilst quinone
diazides optionally in combination with novolak resins are representative of those
that can be used when exposure is carried out beneath a suitable positive transparency.
[0004] The precise processing routine, and the developer liquids used, depend on the solubility
and chemical characteristics of the radiation sensitive coating being processed. Whilst
the processing may be done manually it is increasingly being carried out automatically
using apparatus such as those described in British Patent Specifications No. 1,253,026
and No. 1,299,864 and United States Patent Specifications No. 3,552,293 and No. 4,001,854.
[0005] Some radiation sensitive coating/developer combinations are significantly affected
by the developer temperature and variation from the predetermined temperature results
in incorrect development and unsatisfactory reproductions of the transparency. Thus
in accordance with GB 1253026 the developer bath temperature is adjusted by heating
and cooling to ensure uniform development. It is also known from BE 771221 to determine
the temperature of the developer bath by means of thermistors and to vary the dwell
time of a photographic film in the bath in dependence on the temperature. DE 1271545
discloses a similar technique wherein the bath temperature is determined by measuring
its viscosity. As is well known, a measure of the ability of a radiation sensitive
plate to reproduce a transparency may be obtained by exposing the plate through an
exposure guide known as a "grey-scale" or "step-wedge". A typical example of such
an exposure guide consists of a number of steps of increasing optical density, the
first step being clear. The actual steps that are reproduced on the plate depend on
the particular radiation sensitive coating/developer conditions. However it is desirable
that for a given set of conditions the reproduction of the step-wedge is always the
same. Variation in the temperature of the developer could prevent such results being
obtained.
[0006] It is an object of this invention to provide an apparatus for processing image-wise
exposed radiation sensitive devices which compensates for any changes in the operating
temperature of the developing liquid.
[0007] Because of the variations in the processing routines, there are problems in providing
apparatus capable of processing different radiation sensitive devices. Thus, a processing
apparatus with a developer bath length of, for example, 12 inches (about 31 cm) will
have an optimum plate speed of 35 inches (about 90 cm) per minute when used for developing
a negative working radiation sensitive plate with an organic solvent developer and
an optimum plate speed of 20 inches (about 51 cm) per minute when used for developing
a positive working radiation-sensitive plate with an alkaline developer.
[0008] It has been found that if an image-wise exposed positive working radiation sensitive
device is processed by including the step of giving it a brief overall uniform exposure
to actinic radiation before or during the development, the development time can be
decreased. When this exposure is given manually, it is difficult to obtain predictable
and repeatable results because the exposure conditions are difficult to control. This
problem can be solved by giving the device an overall exposure to relatively less
intense actinic radiation for a relatively longer time whilst the plate moves along
a path past the source of radiation. However, it has been found that the degree to
which a given device needs to be subjected to an overall exposure in order to obtain
a given result is dependent on the temperature of the developer liquid.
[0009] It is another object of the invention to provide an apparatus for processing an image-wise
exposed radiation sensitive device by giving the device an overall exposure, before
or during development, which overall exposure is controlled in dependence on the temperature
of the developer liquid.
[0010] According to the present invention there is provided an apparatus for processing
an image-wise exposed radiation sensitive device which apparatus comprises a container
for developer liquid, a means for contacting the device with the developer liquid,
and a temperature sensitive member for sensing the temperature of the developer liquid
and for producing an output signal in dependence on that temperature characterised
in that the apparatus additionally includes a roller for agitating the developer liquid
in contact with the device and a motor for driving the agitating roller, said temperature
sensitive member being operably connected to the motor for driving the agitator roller
so that said output signal controls the speed of the motor whereby the degree to which
the developer liquid is agitated in contact with the device is dependent on the temperature
of the developer liquid.
[0011] In one embodiment the apparatus includes a means of moving the device with respect
to the developer liquid, the output signal being used, in addition to controlling
the agitating roller motor, to control a motor for driving the device moving means.
In one form of this embodiment, the device moving means comprises a pair of rollers
for feeding the device at an appropriate speed along a path through the developer
liquid. In an alternative embodiment the device moving means comprises a mechanism
for dipping the device into the developer liquid in the container and for withdrawing
the same after an appropriate time interval. In either case not only the degree of
agitation but also the residence time of the device in the apparatus is dependent
upon the output signal i.e. upon the temperature of the developer liquid. In an alternative
embodiment the developer liquid is fed to the device for a period of time dependent
on the output signal, which of course is also used to control the speed of the agitator
roller motor. Thus in this case also the device and the developer liquid are in contact
for a time dependent on the temperature of the developer liquid.
[0012] In a further embodiment, the apparatus additionally includes a source of actinic
radiation arranged so that the processing also involves the step of subjecting the
device to an overall uniform exposure prior to or during its contact with developer
liquid. In this case, in addition to the degree of agitation, the degree to which
the device is subjected to radiation from said source may be controlled in dependence
on said output signal. This may conveniently be effected by interposing a variable
aperture between the source and the device and regulating the size of the aperture
in dependence on said output signal.
[0013] Positive working radiation-sensitive devices typified by quinone diazide sensitised
devices are used in the technique known as 'screen(ess lithography' i.e. the technique
in which the device is exposed directly through a continuous tone master, without
the use of the conventional half tone screen. Processing the plate by subjecting it
to an overall exposure before developing increases the range of tones that can be
obtained. Again, however, it is difficult to obtain predictable and repeatable results
when this is done manually. An apparatus of the invention including a source of actinic
radiation as aforesaid can be used to process these plates, variations in the tonal
range being produced by varying the duration or the intensity of the overall exposure.
Alternatively if it is desired to keep these parameters constant, the tonal range
can be varied by altering the speed at which the plates pass the radiation source.
Clearly, variation of exposure duration and intensity and variation of plate speed
can be combined to give better control of the tonal range.
[0014] For a better understanding of the invention and to show how the same may be carried
into effect, reference will now be made, by way of example, to the accompanying drawings,
in which:
Figure 1 is a schematic diagram of an apparatus in accordance with the present invention;
Figure 2 is a block diagram of the control circuit of the apparatus of Figure 1; and
Figure 3 is a circuit diagram of a part of the control circuit shown in Figure 2.
[0015] Referring to Figure 1, the apparatus includes a pair of rubber covered input rollers
20 and 20a, a pair of rubber covered output rollers 30 and 30a, and a d.c. electric
motor 40 for driving the rollers 20 and 20a. The apparatus includes a separate container
21 for developer liquid and a pump 25 for delivering developer liquid to a spray bar
26 located between a pair of plush covered rollers 23 and 23a driven by a separate
motor 24. A planar member 22 is located under the rollers 23 and 23a and bar 26 and
a catch tray 27 is provided to return developer liquid to the container 21. The apparatus
includes a temperature sensitive member in the form of a probe 28 containing a thermistor
and this is preferably located in the container 21 as shown. The apparatus also includes
an electrical control circuit as shown in Figures 2 and 3; the output from the servo
device of the circuit is fed to motor 24 and, optionally, to motor 40.
[0016] Referring to Figure 2, the electrical control circuit consists of a constant voltage
source 9 in the form of an integrated circuit voltage regulator, a temperature voltage
converter 10 incorporating the thermistor, and a servodevice 11 in the form of a d.c.
thyristor controller, the output of which controls the speed of the motor 24.
[0017] Referring to Figure 3, the regulated voltage from the source 9 (Figure 2) is fed
through the thermistor 12 to a pair of d.c. amplifiers 13 and 14. Variation in the
temperature of the thermistor 12 causes a change in its resistance which in turn produces
a change in the input voltage to the amplifier 13. The output of the amplifier 14
is connected to the servo device 11 (Figure 2). A variable resistor 15 is provided
to vary the gain of the amplifier 13.
[0018] In use of the apparatus shown in Figure 1, an image-wise exposed radiation sensitive
plate is fed face upwards along a path between the input rollers 20 and 20a, between
the rollers 23 and 23a and the member 22, and then between the output rollers 30 and
30a. The exposed radiation sensitive coating of the plate is contacted by the rollers
23 and 23a and development, i.e. removal of the more soluble areas of the image-wise
exposed radiation sensitive coating of the plate, is carried out by a combined scrubbing
and solvent action. The arrangement of the apparatus as shown is such that with increased
developer liquid temperature, (i) motor 24 (and hence rollers 23 and 23a) rotate slower
and hence the developer liquid on the exposed coating is subjected to a less severe
agitation; and (ii) motor 40 (and hence rollers 20 and 20a) rotate faster and hence
the residence time of the plate in the apparatus is shorter. The degree to which the
plate is processed is thus dependent on the temperature of the developer liquid. This
relationship can be adjusted as desired.
[0019] Clearly, the temperature compensation that will be suitable for one combination of
radiation sensitive coating and developer liquid will not necessarily be suitable
for another. Suitable variation of the change in motor speed with temperature may
be obtained by adjusting the variable resistor 15. Further, in the case of a given
radiation sensitive coating/developer liquid combination the variable resistor 15
may be adjusted to vary the contrast of the developed plate. Moreover, the setting
of the variable resistor 15 may be varied to allow for an alteration in the activity
of the developer liquid as a result of partial exhaustion.
[0020] The scope of the invention also includes a method of processing a radiation sensitive
device which comprises passing the device through an apparatus as defined above.
[0021] Devices which may be processed in the apparatus of the invention using particular
developers include for example positive working presensitised plates consisting of
a grained and anodised substrate such as aluminium coated with a radiation sensitive
mixture of a naphthoquinone diazide sulphonic acid ester and a novolak resin using
aqueous sodium metasilicate developer, optionally with polyethylene glycol; deep-etch
plates consisting of an anodised substrate having a radiation sensitive coating based
on dichromated gum arabic using aqueous calcium chloride developer; smooth surfaced
sheets of photoengraving zinc coated with positive working radiation sensitive compositions
using aqueous sodium metasilicate developer; negative working presensitised printing
plates consisting of a grained and anodised substrate having a radiation sensitive
coating comprising the cin- namylidene-malonic acid half ester of poly(2,3,- epoxy-propyl
methacrylate) using aqueous sodium silicate developer; film such as "alus X" panchromatic
film (Kodak Ltd) using "Microdol X" developer (Kodak Ltd); and silver halide diffusion
transfer materials such as exposed silver halide diffusion transfer negative paper
in conjunction with positive receiving sheet in the form of an ADT aluminium lithographic
plate (supplied by the Howson-Algraphy Group of Vickers Ltd) using ADT monobath developer/
fixer (Howson-Algraphy Group of Vickers Limited).
[0022] The apparatus of the present invention provides several advantages over conventional
processors. It is possible to obtain repeatable plate processing accurately without
having to monitor and adjust the working temperature of the developer, which thus
can always be at the ambient temperature. Time is saved when the developer temperature
is low e.g. at the start of processing in a cold environment, as it is not necessary
to wait until the developer is heated to the normal working temperature as is the
case with conventional developers. Further, in the case where the ambient temperature
is higher than the normal working temperature, there is no need to provide a means
of cooling the developer. This is particularly important in the case of large processors
containing 30 or 40 litres of developer.
1. An apparatus for processing an image-wise exposed radiation sensitive device which
apparatus comprises a container (21) for developer liquid a means (20, 20a, 25, 26)
for contacting the device with the developer liquid, and a temperature sensitive member
(28) for sensing the temperature of the developer liquid and for producing an output
signal in dependence on that temperature characterised in that the apparatus additionally
includes a roller (23, 23a) for agitating the developer liquid in contact with the
device and a motor (24) for driving the agitating roller (23, 23a), said temperature
sensitive member (28) being operably connected to the motor (24) for driving the agitator
roller (23, 23a) so that said output signal controls the speed of the motor (24) whereby
the degree to which the developer liquid is agitated in contact with the device is
dependent on the temperature of the developer liquid.
2. An apparatus as claimed in claim 1 wherein the means for contacting the device
with the developer liquid comprises a means (20, 20a) for moving the device along
a path through the developer liquid.
3. An apparatus as claimed in claim 2 and additionally including a motor (40) for
driving the device moving means (20, 20a) characterised in that said temperature sensitive
member (28) which is operably connected to the motor (24) for driving the agitating
roller (23, 23a) is also operably connected to said motor (40) for driving the device
moving means (20, 20a) so that said output signal also controls the speed of said
motor (40) whereby the residence time of the device in the apparatus is also dependent
on the temperature of the developer liquid.
4. An apparatus as claimed in any one of claims 1 to 3 characterised in that it additionally
comprises a source of actinic radiation arranged so that the processing effected by
the apparatus includes subjecting the device to an overall exposure prior to or during
its contact with the developer liquid, said temperature sensitive member (28) which
is operably connected to the motor (24) for driving the agitating roller (23, 23a)
also being operably connected to said source so that the output signal also controls
the source whereby the degree to which the device is subjected to said overall exposure
is also dependent on the temperature of the developer liquid.
5. An apparatus as claimed in claim 4 characterised in that it additionally includes
a variable aperture between the source and the device and a means of opening and closing
the aperture, said temperature sensitive member (28) which is operably connected to
the motor (24) for driving the agitating roller (23, 23a) also being operably connected
to said means of opening and closing the aperture so that said output signal controls
the size of the aperture whereby the degree to which the device is subjected to said
overall exposure is dependent on the temperature of the developer liquid.
6. An apparatus as claimed in claim 1 wherein the means for contacting the device
with the developer liquid comprises a means of feeding developer liquid to the device,
characterised in that the apparatus additionally includes a means for regulating said
feeding means, and said temperature sensitive member (28) which is operably connected
to the motor (24) for driving the agitating roller (23, 23a), is also operably connected
to said means for regulating said feeding means so that said output signal also controls
the feeding means whereby the developer liquid is fed to the device for a period of
time dependent on the temperature of the developer liquid.
7. A method of processing an image-wise exposed radiation sensitive device characterised
in that it comprises processing the device using an apparatus as claimed in any one
of claims 1 to 6.
1. Vorrichtung zum Behandeln von bildgerecht exponierten strahlungsempfindlichen Gegenständen,
mit einem Behälter (21) für Entwicklerflüssigkeit, einer Einrichtung (20, 20a, 25,
26) zum Inberührungbringen des Gegenstandes mit der Entwicklerflüssigkeit und einem
temperaturempfindlichen Glied (28) zum Erfassen der Temperatur der Entwicklerflüssigkeit
und zum Erzeugen eines Ausgangssignals in Abhängigkeit von dieser Temperatur, dadurch
gekennzeichnet, daß die Vorrichtung weiters eine Walze (23, 23a) zum Bewegen der mit
dem Gegenstand in Berührung stehenden Entwicklerflüssigkeit und einen Motor (24) zum
Antreiben der die Entwicklerflüssigkeit bewegenden Walzen (23, 23a) aufweist und daß
das temperaturempfindliche Glied (28) so mit dem Motor (24) zum Antreiben der die
Entwicklerflüssigkeit bewegenden Walzen (23, 23a) in Wirkverbindung steht, daß das
Ausgangssignal die Drehzahl des Motors (24) steuert, wodurch das Ausmaß zu welchem
die mit dem Gegenstand in Berührung stehende Entwicklerflüssigkeit bewegt wird von
der Temperatur der Entwicklerflüssigkeit abhängig ist.
2. Vorrichtung nach Anspruch 1, worin die Einrichtung zum Inberührungbringen des Gegenstandes
mit der Entwicklerflüssigkeit eine Einrichtung (20, 20a) zum Bewegen des Gegenstandes
entlang eines durch die Entwicklerflüssigkeit führenden Pfades aufweist.
3. Vorrichtung nach Anspruch 2 mit einem zusätzlichen Motor (40) zum Antreiben der
den Gegenstand bewegenden Einrichtung (20, 20a), dadurch gekennzeichnet, daß das temperaturempfindliche
Glied (28), welches mit dem Motor (24) zum Antreiben der die Entwicklerflüssigkeit
bewegenden Walzen (23, 23a) in Wirkverbindung steht, auch mit dem Motor (40) zum Antreiben
der den Gegenstand bewegenden Einrichtung (20, 20a) in Wirkverbindung steht, sodaß
das Ausgangssignal auch die Drehzahl dieses Motors (40) steuert, wodurch die Verweilzeit
des Gegenstandes in der Vorrichtung ebenfalls von der Temperatur der Entwicklerflüssigkeit
abhängig ist.
4. Vorrichtung nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß sie zusätzlich
eine solcherart angeordnete Quelle aktinischer Strahlung aufweist, daß im Zuge der
von der Vorrichtung bewirkten Behandlung der Gegenstand vor dem oder während des Inberührungbringens
mit der Entwicklerflüssigkeit über seine gesamte Ausdehnung exponiert wird und daß
das temperaturempfindliche Glied (28), welches mit dem Motor (24) zum Antreiben der
die Entwicklerflüssigkeit bewegenden Walzen (23, 23a) in Wirkverbindung steht, auch
mit der Strahlungsquelle in solcher Weise in Wirkverbindung steht, daß das Ausgangssignal
auch die Strahlungsquelle steuert, wodurch das Ausmaß zu welchem der Gegenstand über
seine gesamte Ausdehnung exponiert wird ebenfalls von der Temperatur der Entwicklerflüssigkeit
abhängig ist.
5. Vorrichtung nach Anspruch 4, dadurch gekennzeichnet, daß sie zwischen der Strahlungsquelle
und dem Gegenstand zusätzlich eine verstellbare Blende und eine Einrichtung zum Öffnen
und Schließen der Blende aufweist und daß temperaturempfindliche Glied (28), welches
mit dem Motor (24) zum Antreiben der die Entwicklerflüssigkeit bewegenden Walzen (23,
23a) in Wirkverbindung steht, auch mit der Einrichtung zum Öffnen und Schließen der
Blende solcherart in Wirkverbindung steht, daß das Ausgangssignal die Größe der Blende
steuert, wodurch das Ausmaß zu welchem der Gegenstand über seine gesamte Ausdehnung
exponiert wird von der Temperatur der Entwicklerflüssigkeit abhängig ist.
6. Vorrichtung nach Anspruch 1, worin die Einrichtung zum Inberührungbringen des Gegenstandes
mit der Entwicklerflüssigkeit eine Einrichtung zum Zuführen von Entwicklerflüssigkeit
zum Gegenstand aufweist, dadurch gekennzeichnet, daß die Vorrichtung zusätzlich eine
Einrichtung zum Regeln der die Entwicklerflüssigkeit zuführenden Einrichtung aufweist
und daß das temperaturempfindliche Glied (28), welches mit dem Motor (24) zum Antreiben
der die Entwicklerflüssigkeit bewegenden Walzen (23, 23a) in Wirkverbindung steht,
auch mit der Einrichtung zum Regeln der Zufuhreinrichtung für Entwicklerflüssigkeit
in solcher Weise in Wirkverbindung steht, daß das Ausgangssignal auch diese Zufuhreinrichtung
steuert, wodurch die Entwicklerflüssigkeit dem Gegenstand während einer Zeitspanne
zugeführt wird, die von der Temperatur der Entwicklerflüssigkeit abhängig ist.
7. Verfahren zum Behandeln eines bildgerecht exponierten strahlungsempfindlichen Gegenstandes,
dadurch gekennzeichnet, daß der Gegenstand unter Verwendung einer Vorrichtung gemäß
einem der Ansprüche 1 bis 6 behandelt wird.
1. Appareil pour le traitment d'un système sensible aux radiations exposé à la façon
d'une image, comprenant un récipient (21) pour le liquide de développement et des
moyens (20, 20a, 25, 26) pour la mise en contact du système avec le liquide de développement,
et un organe (28) sensible à la température pour mesurer la température du liquide
de développement et pour produire un signal de sortie qui est fonction de cette température,
caractérisé en ce qu'il comprend, en outre, un rouleau (23, 23a) pour agiter le liquide
de développement en contact avec le système et un moteur (24) pour entraîner le rouleau
agitateur (23, 23a), ledit organe (28) sensible à la température étant lié cinématiquement
au moteur (24) d'entraînement du rouleau d'agitation (23, 23a), afin que ledit signal
de sortie contrôle la vitesse du moteur (24), de telle sorte que la valeur avec laquelle
le liquide de développement est agité au contact du système est fonction de la température
du liquide de développement.
2. Appareil selon la revendication 1, dans lequel les moyens pour assurer la mise
en contact du système avec le liquide de développement comprennent des moyens (20,
20a) pour déplacer le système le long d'un tronçon à travers le liquide de développement.
3. Appareil selon la revendication 2, comprenant en outre un moteur (40) pour l'entraînement
des moyens (20, 20a) de déplacement du système, caractérisé en ce que l'organe (28)
sensible à la température, qui est lié cinématiquement au moteur (24) pour entraîner
le rouleau agitateur (23, 23a), est également lié cinématiquement au moteur (40) d'entraînement
des moyens (20, 20a) de déplacement du système, de telle sorte que le signal de sortie
contrôle également la vitesse du moteur (40), afin que le temps pendant lequel le
système demeure dans l'appareil soit également dépendant de la température du liquide
de développement.
4. Appareil selon l'une quelconque des revendications 1 à 3, caractérisé en ce qu'il
comprend, en outre, une source de radiation actinique disposée de telle sorte que
le traitement effectué par l'appareil comprend une phase d'exposition uniforme du
système préalablement ou pendant la phase de contact avec le liquide de développement,
l'organe (28) sensible à la température, qui est lié cinématiquement au moteur (24)
d'entraînement du rouleau agitateur (23, 23a), étant également lié cinématiquement
à ladite source, de telle sorte que le signal de sortie contrôle également cette source,
afin que la valeur d'exposition uniforme du système à cette source soit également
fonction de la température du liquide de développement.
5. Appareil selon la revendication 4, caractérisé en ce qu'il comprend, en outre,
une ouverture variable entre la source et le système et des moyens pour ouvrir et
fermer cette ouverture, l'organe (28) sensible à la température, qui est lié cinématiquement
au moteur (24) d'entraînement du rouleau d'agitation (23, 23a), étant également lié
cinématiquement aux moyens d'ouverture et de fermeture de ladite ouverture, de telle
sorte que le signal de sortie contrôle la taille de l'ouverture, afin que la valeur
d'exposition uniforme du système dépende de la température du liquide de développement.
6. Appareil selon la revendication 1, dans lequel les moyens pour la mise en contact
du système avec le liquide de développement comprennent des moyens d'amenée du liquide
de développement au système, caractérisé en ce qu'il comprend, en outre, des moyens
de régulation des dits moyens d'amenée de liquide, l'organe (28) sensible à la température,
qui est lié cinématiquement au moteur (24) d'entraînement du rouleau d'agitation (23,
23a) étant également lié cinématiquement aux moyens de régulation de l'amenée de liquide,
de telle sorte que le signal de sortie contrôle également les moyens d'amenée de liquide,
afin que le liquide de développement soit amené au système pendant une péroide de
temps qui est fonction de la température du liquide de développement.
7. Procédé de traitement d'un système sensible aux radiations exposé à la façon d'une
image, caractérisé en ce qu'il consiste à traiter le système en utilisant un appareil
tel que revendiqué dans l'une des revendications 1 à 6.
